Methods for manufacturing grating sheet and LCD panel

Patent metadata

Field	Value
Publication number	US-9423540-B2
Application number	US-201414528492-A
Country	US
Kind code	B2
Filing date	Oct 30, 2014
Priority date	Dec 31, 2010
Publication date	Aug 23, 2016
Grant date	Aug 23, 2016

Abstract

Methods for manufacturing the grating sheet and a liquid crystal display panel are provided. The grating sheet comprises a plurality of primary color gratings in parallel, each of which comprises a red R sub-grating, a green G sub-grating and a blue B sub-grating in parallel, and each sub-grating comprises an opening area and a reflective region disposed around the opening area and corresponds to a pixel unit on a sub-array substrate. The methods for manufacturing the grating sheet and a liquid crystal display panel may be applicable to a system with a liquid crystal display.

First claim

What is claimed is:

1. A method for manufacturing a grating sheet, comprising:
depositing a silicon nitride film on a base substrate, forming a red (R) sub-wire grating, a green (G) sub-wire grating and a blue (B) sub-wire grating by a patterning process;
coating a metal film on the base substrate to form a red (R) sub-grating, a green (G) sub-grating and a blue (B) sub-grating parallel with one another, wherein in each sub-grating, the metal film comprises a lower metal layer formed in an opening area for diffraction therein and an upper metal layer formed in a reflective region around the opening area, the lower and upper metal layers being made of same material; and
forming a reflective film on the upper metal layer by a patterning process.

2. The method according to claim 1 , wherein forming the reflective film which overlays the upper metal layer comprises:
depositing a reflective film on the upper metal layer;
spinning coating a photoresist film on the reflective film; and
exposing the opening area of each sub-grating by performing an exposure, developing and etching processes to the base substrate and then removing the remaining photoresist on the base substrate.

3. The method according to claim 2 , wherein before spinning coating the photoresist film on the reflective film, the method further comprises:
stamping the reflective film by a mold with prism patterns to form a prism type reflective film.

4. The method according to claim 1 , wherein the base substrate is a transparent substrate, an opposing substrate or an array substrate during the depositing the silicon nitride film on the base substrate.

5. The method according to claim 4 , wherein a transparent conductive film is formed on the opposing substrate.

6. The method according to claim 4 , wherein if the base substrate is the array substrate, the method further comprises depositing a transparent conductive film on the array substrate before depositing the silicon nitride film on the base substrate.

7. The method according to claim 1 , wherein
R sub-grating comprises: l=0.813 um, Φ=20%, t=80 nm, d=20 nm;
G sub-grating comprises: l=0.813 um, Φ=36%, t=60 nm, d=40 nm; and
B sub-grating comprises: l=0.813 um, Φ=47%, t=40 nm, d=60 nm;
wherein “l” is a period length of each sub-grating, Φ is a duty cycle and Φ=w/l, “w” is an opening width of each sub-grating opening area, “t” is a thickness of the lower metal layer for diffraction on the sub-grating, and “d” is an interval between the opening area and the reflective region.

8. The method according to claim 1 , wherein,
a thickness of the lower metal layer of the R sub-gratings is in the range of 75˜85 nm;
a thickness of the lower metal layer of the G sub-gratings is in the range of 55˜65 nm; and
a thickness of the lower metal layer of the B sub-gratings is in the range of 35˜45 nm.

9. A method for manufacturing a liquid crystal display panel, comprising:
forming an opposing substrate with only a transparent conductive film deposited thereon;
forming an array substrate on which a data line and a gate line are crosses with each other and define a pixel unit;
forming the grating sheet by the method according to claim 1 , wherein the grating sheet is formed on a glass substrate, the array substrate or the opposing substrate; and
attaching the array substrate and the grating sheet or attaching the opposing substrate and the grating sheet when the grating sheet is formed on the glass substrate; or attaching the array substrate and the opposing substrate when the grating sheet is formed on the array substrate or the opposing substrate.

Assignees

• Boe Technology Group Co Ltd
• Beijing Boe Optoelectronics Tech Co Ltd

Inventors

• Lu Linlin

Classifications

• H10D86/441

  Interconnections, e.g. scanning lines · CPC title

• H10D86/60

  wherein the TFTs are in active matrices · CPC title

• H10D86/021

  of multiple TFTs · CPC title

• G02F2001/133521

  Physics · mapped topic

• G02F1/133504

  Diffusing, scattering, diffracting elements (associated to illuminating devices G02F1/133606) · CPC title