Three-dimensional magnetic field measurement device and magnetic field mapping system
US-2024369649-A1 · Nov 7, 2024 · US
US9423425B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9423425-B2 |
| Application number | US-201313734695-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 4, 2013 |
| Priority date | May 31, 2012 |
| Publication date | Aug 23, 2016 |
| Grant date | Aug 23, 2016 |
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A side channel analysis apparatus based on a profile includes a waveform collection unit configured to collect leaked information from a target device of a side channel analysis; and a preprocessing unit configured to preprocess a waveform data correspond to the leaked information collected from the waveform collection unit before analyzing same. Further, the side channel analysis apparatus includes an analysis unit configured to analyze the waveform data preprocessed in the preprocessing unit; and a profile configuration unit configured to make each process of the waveform collection unit, the preprocessing unit, and the analysis unit into a process and configure a profile for managing each process by connection of each process.
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What is claimed is: 1. A side channel analysis apparatus based on a profile, comprising: a waveform collection unit configured to collect leaked information from a target device of a side channel analysis; a preprocessing unit configured to preprocess waveform data corresponding to the leaked information collected by the waveform collection unit before analyzing the waveform data; an analysis unit configured to analyze the waveform data preprocessed in the preprocessing unit; and a profile configuration unit configured to make each process of the waveform collection unit, the preprocessing unit, and the analysis unit into a process to make a profile for managing each process by connection of each process. 2. The side channel analysis apparatus of claim 1 , wherein the profile configuration unit makes a side channel analysis task about the target device of the side channel analysis into one project, makes a plurality of profiles in a lower level of the project, and makes a waveform collection process, preprocessing processes, and analysis processes in a lower level of each process to connect each other. 3. The side channel analysis apparatus of claim 1 , wherein the profile configuration unit displays parameters used in each process, and drives each process by the parameters. 4. The side channel analysis apparatus of claim 3 , wherein the process receives a waveform of a previous process to generate a new waveform, and inputs the new generated waveform to a subsequent process.
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