Exposure apparatus, exposure method, and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9423299-B2
Application number	US-201414529236-A
Country	US
Kind code	B2
Filing date	Oct 31, 2014
Priority date	Nov 5, 2013
Publication date	Aug 23, 2016
Grant date	Aug 23, 2016

Abstract

An exposure apparatus is provided with a light source for emitting pulse light and exposes a substrate via to the pulse light an original. Further, the exposure apparatus comprises a detection unit for detecting the light quantity of the pulse light and a controller for controlling the light source and the detection unit. Here, the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.

First claim

What is claimed is:

1. An exposure apparatus that includes a light source for emitting pulse light and exposes a substrate to the pulse light via an original, the apparatus comprising:
a detector configured to detect a light quantity of the pulse light; and
a controller configured to control the light source and the detector,
wherein the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.

2. The apparatus according to claim 1 , wherein the controller is configured to generate the control input based on the relation.

3. The apparatus according to claim 1 , further comprising:
a projection optical system configured to project light from the original onto the substrate; and
a substrate holder configured to hold the substrate and to be movable,
wherein the second calibration process includes a process for obtaining a reference position of the substrate holder by projecting a pulse light from the light source by the projection optical system.

4. The apparatus according to claim 3 , further comprising:
an original holder including a mark, and configured to hold the original and to be movable,
wherein the second calibration process includes a process for obtaining the reference position by projecting a pulse light from the light source, via the mark and the projection optical system, to a mark included in the substrate holder.

5. The apparatus according to claim 1 , further comprising:
an optical system configured to guide pulse light from the light source to the substrate,
wherein the second calibration process includes a process for obtaining a transmittance of at least a part of an optical path of the optical system using a pulse light from the light source.

6. The apparatus according to claim 1 , wherein the control input corresponds to a voltage applied to the light source.

7. The apparatus according to claim 1 , wherein the light source is an excimer laser light source.

8. An exposure method of performing exposure of a substrate to pulse light emitted from a light source via an original, the method comprising steps of:
executing a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source based on light quantities of a plurality of pulse lights detected by causing the light source to emit the plurality of pulse lights from the light source with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights, and
generating the control input based on the obtained relation to perform the exposure.

9. A method of manufacturing a device, the method comprising steps of:
exposing a substrate to light using an exposure apparatus; and
developing the exposed substrate; and
processing the developed substrate to manufacture the device,
wherein the exposure apparatus includes a light source for emitting pulse light and exposes the substrate to the pulse light via an original, and includes:
a detector configured to detect a light quantity of the pulse light; and
a controller configured to control the light source and the detector,
wherein the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.

Assignees

• Canon Kk

Inventors

• Yamamoto Kazuki
• Asaishi Tadahiro

Classifications

• H01S5/0683

  by monitoring the optical output parameters · CPC title

• G03F7/70041

  by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control · CPC title

• G01J1/429 Primary

  applied to measurement of ultraviolet light (using counting tubes G01T) · CPC title

• G03F9/7092

  Signal processing · CPC title

• G03F7/70558

  Dose control, i.e. achievement of a desired dose · CPC title