Covalently patterned graphene surfaces by a force accelerated cycloaddition reaction

US9422237B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9422237-B2
Application numberUS-201314417733-A
CountryUS
Kind codeB2
Filing dateJun 6, 2013
Priority dateJul 31, 2012
Publication dateAug 23, 2016
Grant dateAug 23, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention relates generally to molecular printing techniques for use in sensors, arrays, and integrated optics and electronics. The invention features described give rise to the ability to immobilize biological probes by force-induced patterning, while still maintaining the conductivity of the graphene substrate. Most particularly, the present invention relates to covalent patterning of graphene surface using a force-accelerated reaction.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of covalently patterning soft matter onto the basal plane of a graphene surface, said basal plane comprising a first reactive element and said method comprising the steps of: (a) coating an elastomeric tip array with an ink mixture comprising a second reactive element consisting of or bound to the soft matter (b) inducing a localized force-accelerated reaction between the first reactive element and the second reactive element by mechanical application of the elastomeric tip array to the graphene surface, resulting in a covalent bond between the first and second reactive elements; and (c) rinsing the graphene surface to remove unbound ink. 2. The method of claim 1 , wherein the force-accelerated reaction is a cycloaddition. 3. The method of claim 2 , wherein the cycloaddition is selected from the group consisting of Diels-Alder, a 1-3 dipolar cycloaddition, a [4+2] cycloaddition of cations and anions, a cycloaddition involving more than six electrons, a photochemical cycloaddition, and a stepwise cycloaddition. 4. The method of claim 1 , wherein the first reactive element is a dienophile. 5. The method of claim 4 , wherein the dienophile is graphene. 6. The method of claim 1 , wherein the second reactive element is a diene. 7. The method of claim 6 , wherein the diene is rhodamine cyclopentadiene or ferrocene cyclopentadiene. 8. The method of claim 1 , wherein the reaction results in a cyclohexene formation covalently bonding the first and second reactive element, thereby providing the covalently patterned soft matter. 9. The method of claim 1 , wherein ambient temperature during manufacture is between 25° C. and 60° C. 10. The method of claim 1 , wherein the reaction time is three hours or less. 11. The method of claim 1 , wherein the ink mixture further comprises polyethylene glycol (PEG), polytetramethylene glycol (PTMG), polytetramethylene ether glycol (PTMEG), or agarose. 12. The method of claim 1 , wherein the soft matter is selected from the group consisting of nanoparticles, organics, biologicals, polymers, proteins, sugars, oligonucleotides, peptides, and antibodies.

Assignees

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Classifications

  • After-treatment · CPC title

  • Of biomolecule property · CPC title

  • Surface modifications, e.g. functionalization, coating · CPC title

  • Single layer graphene · CPC title

  • Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc. · CPC title

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What does patent US9422237B2 cover?
The present invention relates generally to molecular printing techniques for use in sensors, arrays, and integrated optics and electronics. The invention features described give rise to the ability to immobilize biological probes by force-induced patterning, while still maintaining the conductivity of the graphene substrate. Most particularly, the present invention relates to covalent patternin…
Who is the assignee on this patent?
Univ New York
What technology area does this patent fall under?
Primary CPC classification C07D209/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 23 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).