Thermal ink jet ink composition
US-9249326-B2 · Feb 2, 2016 · US
Method for forming organic thin film
US9416283B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9416283-B2 |
| Application number | US-201414486661-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 15, 2014 |
| Priority date | Nov 13, 2006 |
| Publication date | Aug 16, 2016 |
| Grant date | Aug 16, 2016 |
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Abstract
Official abstract text for this publication.
A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total amount of the solution for forming an organic thin film.
First claim
Opening claim text (preview).
The invention claimed is: 1. A solution for forming an organic thin film, comprising wherein a metal surfactant, a compound (C) that can interact with the metal surfactant, and a hydroxyl group-containing compound that is a hydrolysate of the metal surfactant, wherein the amount of the hydroxyl group-containing compound that is a hydrolysate of the metal surfactant is 20 ppm to 6 wt %, and the amount of the compound (C) that can interact with the metal surfactant is 0.03 ppm to 2 ppm in terms of a metal in compound (C), relative to the total amount of the solution for forming an organic thin film.
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Classifications
- C08K5/04Primary
Oxygen-containing compounds {(C08K5/0091 takes precedence)} · CPC title
Hydrophobic and oleophobic coatings · CPC title
Metallic substrate · CPC title
Glass · CPC title
containing at least one Si—C bond · CPC title
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- What does patent US9416283B2 cover?
- A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total …
- Who is the assignee on this patent?
- Nippon Soda Co
- What technology area does this patent fall under?
- Primary CPC classification C08K5/04. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).