Annealing for damage free laser processing for high efficiency solar cells
US-9214585-B2 · Dec 15, 2015 · US
US9412888B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9412888-B2 |
| Application number | US-201313886813-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 3, 2013 |
| Priority date | May 7, 2012 |
| Publication date | Aug 9, 2016 |
| Grant date | Aug 9, 2016 |
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A solar cell includes a semiconductor substrate having a first conductivity type, an emitter layer on a surface of the semiconductor substrate, the emitter layer having a second conductivity type different from the first conductivity type, and electrodes including a first electrode electrically connected to the emitter layer, and a second electrode electrically connected to the semiconductor substrate. The emitter layer includes a high-concentration doping portion adjacent to the first electrode, and a low-concentration doping portion in a region that does not include the high-concentration doping portion. The low-concentration doping portion has a higher resistance than the high-concentration doping portion. The high-concentration doping portion includes a first region having a first resistance, and a second region having a second resistance higher than the first resistance.
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What is claimed is: 1. A solar cell comprising: a semiconductor substrate having a first conductivity type; an emitter layer at or adjacent to a first surface of the semiconductor substrate, the emitter layer having a second conductivity type different from the first conductivity type; electrodes comprising a first electrode electrically connected to the emitter layer, and a second electrode electrically connected to the semiconductor substrate, wherein the emitter layer comprises a high-concentration doping portion adjacent to the first electrode, and a low-concentration doping portion in a region that does not include the high-concentration doping portion, the low-concentration doping portion having a higher sheet resistance than the high-concentration doping portion, wherein the high-concentration doping portion comprises a first region having a first sheet resistance, and a second region having a second sheet resistance higher than the first sheet resistance, wherein the first sheet resistance of the first region is 30 to 70 Ω/square (ohms/square), and the second sheet resistance of the second region is 80 to 90 Ω/square, wherein the sheet resistance of the low-concentration doping portion is uniform throughout the low-concentration doping portion and in the range of 100 to 120 Ω/square, wherein a ratio of a width of the second region to a width of the first region is 0.5 to 1.5, and wherein the low-concentration doping portion is wider than the high-concentration portion. 2. The solar cell according to claim 1 , wherein the second region is outside of the first region. 3. The solar cell according to claim 1 , wherein at least a portion of the first electrode contacts the first region. 4. The solar cell according to claim 1 , wherein the second region has a shallower doping depth than the first region. 5. The solar cell according to claim 1 , wherein a ratio of a width of the first region to a width of the first electrode is 0.8 to 1.2. 6. A solar cell comprising: a semiconductor substrate having a first conductivity type; an emitter layer at or adjacent to a first surface of the semiconductor substrate, the emitter layer having a second conductivity type different from the first conductivity type; a back surface field layer on a second surface of the semiconductor substrate, the back surface field layer having the first conductivity type; and electrodes comprising a first electrode electrically connected to the emitter layer, and a second electrode electrically connected to the back surface field layer, wherein the emitter layer comprises a first high-concentration doping portion adjacent to the first electrode, and a first low-concentration doping portion in a region that does not include the first high-concentration doping portion, the first low-concentration doping portion having a higher sheet resistance than the first high-concentration doping portion, wherein the first high-concentration doping portion comprises a first region having a first sheet resistance, and a second region having a second sheet resistance higher than the first sheet resistance, wherein the first sheet resistance of the first region is 30 to 70 Ω/square (ohms/square), and the second sheet resistance of the second region is 80 to 90 Ω/square, wherein the sheet resistance of the first low-concentration doping portion is uniform throughout the first low-concentration doping portion and in the range of 100 to 120 Ω/square, wherein a ratio of a width of the second region to a width of the first region is 0.5 to 1.5, wherein the first low-concentration doping portion is wider than the first high-concentration portion, wherein the back surface field layer comprises a second high-concentration doping portion adjacent to the second electrode, and a second low-concentration doping portion in a region that does not include the second high-concentration doping portion, the second low-concentration doping portion having a higher sheet resistance than the second high-concentration doping portion, wherein the second high-concentration doping portion comprises a third region having a third sheet resistance, and a fourth region having a fourth sheet resistance higher than the third sheet resistance, and wherein the second low-concentration doping portion includes a dopant of the first conductivity type with a doping concentration higher than the semiconductor substrate. 7. The solar cell according to claim 6 , wherein the third region is outside of the fourth region.
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