LaNiO3 thin film-forming composition and method of forming LaNiO3 thin film using the same

Patent metadata

Field	Value
Publication number	US-9412485-B2
Application number	US-201414173049-A
Country	US
Kind code	B2
Filing date	Feb 5, 2014
Priority date	Feb 13, 2013
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

A LaNiO 3 thin film having extremely few voids is uniformly formed. Provided is a LaNiO 3 thin film-forming composition for forming a LaNiO 3 thin film. It includes: a LaNiO 3 precursor; a first organic solvent; a stabilizer; and a second organic solvent. The first organic solvent includes carboxylic acids, alcohols, esters, ketones, ethers, cycloalkanes, aromatic compounds, or tetrahydrofuran. The stabilizer includes β-diketones, β-ketones, β-keto esters, oxyacids, diols, triols, carboxylic acids, alkanolamines, or polyvalent amines. The second organic solvent has a boiling point of 150° C. to 300° C. and a surface tension of 20 to 50 dyn/cm. The LaNiO 3 precursor content is 1 to 20 mass % with respect to 100 mass % of the composition. The stabilizer content is 0 to 10 mol with respect to 1 mol of a total amount of the LaNiO 3 precursors. The second organic solvent content is 5 to 20 mass % with respect to the composition.

First claim

What is claimed is:

1. A LaNiO 3 thin film-forming composition for forming a LaNiO 3 thin film, the composition comprising:
LaNiO 3 precursors;
one or more first organic solvents selected from the group consisting of carboxylic acids, alcohols, esters, ketones, ethers, cycloalkanes, aromatic compounds, and tetrahydrofuran;
one or more stabilizers selected from the group consisting of β-diketones, β-ketones, β-keto esters, oxyacids, diols, triols, carboxylic acids, alkanolamines, and polyvalent amines; and
a second organic solvent having a boiling point of 150° C. to 300° C. and a surface tension of 20 dyn/cm to 50 dyn/cm,
wherein a ratio of the LaNiO 3 precursors is 1 mass % to 20 mass % in terms of oxides with respect to 100 mass % of the composition,
a ratio of the stabilizer is greater than 0 mol and less than or equal to 10 mol with respect to 1 mol of a total amount of the LaNiO 3 precursors in the composition, and
a ratio of the second organic solvent is 5 mass % to 20 mass % with respect to 100 mass % of the composition.

2. The LaNiO 3 thin film-forming composition according to claim 1 ,
wherein each of the LaNiO 3 precursors is a metal carboxylate, a metal nitrate, a metal alkoxide, a metal diol complex, a metal triol complex, a metal β-diketonate complex, a metal β-diketoester complex, a metal β-iminoketo complex, or a metal amino complex.

3. The LaNiO 3 thin film-forming composition according to claim 2 ,
wherein at least either a LaNiO 3 precursor as a La source or a LaNiO 3 precursor as a Ni source among the LaNiO 3 precursors is an acetate, a nitrate, or an octylate.

4. The LaNiO 3 thin film-forming composition according to claim 1 ,
wherein the second organic solvent is at least one of N,N-dimethylformamide, N,N-dimethylacetamide, N-methylformamide, 4-butyrolactone, N-methylpyrrolidone, and propylene carbonate.

5. A method of forming a LaNiO 3 thin film,
wherein the LaNiO 3 thin film-forming composition according to claim 1 is used.

6. A method of forming a LaNiO 3 thin film, comprising:
forming a coating film on a heat-resistant substrate by coating the LaNiO 3 thin film-forming composition according to claim 1 on the heat-resistant substrate;
pre-baking the substrate including the coating film in an oxidation atmosphere or in a water vapor-containing atmosphere under atmospheric pressure to obtain a film, or
repeating the formation of the coating film and the pre-baking of the substrate 2 times or more until a film having a predetermined thickness is obtained; and
baking the film at a crystallization temperature or higher.

Assignees

• Mitsubishi Materials Corp

Inventors

• Fujii Jun
• Sakurai Hideaki
• Soyama Nobuyuki

Classifications

• C04B2235/441

  Alkoxides, e.g. methoxide, tert-butoxide · CPC title

• C23C18/1279

  performed under reactive atmosphere, e.g. oxidising or reducing atmospheres · CPC title

• C04B35/62625

  Wet mixtures · CPC title

• C04B35/01

  based on oxide ceramics · CPC title

• C04B2235/449

  Organic acids, e.g. EDTA, citrate, acetate, oxalate · CPC title