Devices including a gas barrier layer

Patent metadata

Field	Value
Publication number	US-9412402-B2
Application number	US-201514879107-A
Country	US
Kind code	B2
Filing date	Oct 9, 2015
Priority date	Jun 24, 2013
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

Devices that include a near field transducer (NFT); a gas barrier layer positioned on at least a portion of the NFT; and a wear resistance layer positioned on at least a portion of the gas barrier layer wherein the gas barrier layer includes tantalum oxide (TaO), titanium oxide (TiO), chromium oxide (CrO), silicon oxide (SiO), aluminum oxide (AlO), titanium oxide (TiO), zirconium oxide (ZrO), yttrium oxide (YO), magnesium oxide (MgO), beryllium oxide (BeO), niobium oxide (NbO), hafnium oxide (HfO), vanadium oxide (VO), strontium oxide (SrO), or combinations thereof; silicon nitride (SiN), aluminum nitride (Al), boron nitride (BN), titanium nitride (TiN), zirconium nitride (ZrN), niobioum nitride (NbN), hafnium nitride (HfN), chromium nitride (CrN), or combinations thereof; silicon carbide (SiC), titanium carbide (TiC), zirconium carbide (ZrC), niobioum carbide (NbC), chromium carbide (CrC), vanadium carbide (VC), boron carbide (BC), or combinations thereof; or combinations thereof.

First claim

What is claimed is:

1. A device comprising:
a near field transducer (NFT);
a gas barrier layer positioned on at least a portion of the NFT; and
a wear resistance layer positioned on at least a portion of the gas barrier layer,
the gas barrier layer comprising:
a first gas barrier bilayer; and
a second gas barrier bilayer, where the second gas barrier bilayer is positioned on the first gas barrier bilayer, the first gas barrier bilayer is positioned adjacent the NFT and the second gas barrier bilayer is positioned adjacent the wear resistant layer.

2. The device according to claim 1 , wherein the first and second gas barrier bilayers are made of the same material.

3. The device according to claim 1 , wherein the first and second gas barrier bilayers are made of different materials.

4. The device according to claim 1 , wherein the first and second gas barrier bilayers independently comprise:
(a) tantalum oxide (TaO), titanium oxide (TiO), chromium oxide (CrO), silicon oxide (SiO), aluminum oxide (AlO), titanium oxide (TiO), zirconium oxide (ZrO), yttrium oxide (YO), magnesium oxide (MgO), beryllium oxide (BeO), niobium oxide (NbO), hafnium oxide (Hf), vanadium oxide (VO), strontium oxide (SrO), or combinations thereof;
(b) silicon nitride (SiN), aluminum nitride (Al), boron nitride (BN), titanium nitride (TiN), zirconium nitride (ZrN), niobioum nitride (NbN), hafnium nitride (HfN), chromium nitride (CrN), or combinations thereof;
(c) silicon carbide (SiC), titanium carbide (TiC), zirconium carbide (ZrC), niobioum carbide (NbC), chromium carbide (CrC), vanadium carbide (VC), boron carbide (BC), or combinations thereof; or
(d) combinations of (a), (b) and (c).

5. The device according to claim 1 , wherein the first gas barrier bilayer comprises AlO, MgO, BeO or combinations thereof; and the second gas barrier bilayer comprises SiO, YO, CrO, NbO, TaO, HfO, TiO, ZrO, AlSiO, CrAlO, CrSiO, TiSiO, NbSiO, HfSiO, NbSiO, SiON, TiSiON, SiAlO, TiSiO, TiAlO, CrON, CrAlO, CrSiO, CrAlON, CrSiON, SiN, TiN, ZrN, CrN, NbN, TaN, HfN, or combinations thereof.

6. The device according to claim 1 , wherein the gas barrier layer further comprises at least three sets of first and second gas barrier bilayers.

7. The device according to claim 1 , further comprising at least one adhesion layer.

8. The device according to claim 7 , wherein the at least one adhesion layer is disposed between the gas barrier layer and the NFT.

9. The device according to claim 7 , wherein the at least one adhesion layer is disposed between the gas barrier layer and the wear resistance layer.

10. The device according to claim 1 further comprising a NFT adhesion layer and a wear resistance adhesion layer, wherein the NFT adhesion layer is positioned between the NFT and the gas barrier layer and the wear resistance adhesion layer is positioned between the gas barrier layer and the wear resistance layer.

11. A device comprising:
a near field transducer (NFT);
a gas barrier layer positioned on at least a portion of the NFT; and
a wear resistance layer positioned on at least a portion of the gas barrier layer,
the gas barrier layer comprising at least one set of:
a first gas barrier bilayer; and
a second gas barrier bilayer,

wherein each of the first and second gas barrier bilayers independently comprise:
(a) tantalum oxide (TaO), titanium oxide (TiO), chromium oxide (CrO), silicon oxide (SiO), aluminum oxide (AlO), titanium oxide (TiO), zirconium oxide (ZrO), yttrium oxide (YO), magnesium oxide (MgO), beryllium oxide (BeO), niobium oxide (NbO), hafnium oxide (Hf), vanadium oxide (VO), strontium oxide (SrO), or combinations thereof;
(b) silicon nitride (SiN), aluminum nitride (Al), boron nitride (BN), titanium nitride (TiN), zirconium nitride (ZrN), niobioum nitride (NbN), hafnium nitride (HfN), chromium nitride (CrN), or combinations thereof;
(c) silicon carbide (SiC), titanium carbide (TiC), zirconium carbide (ZrC), niobioum carbide (NbC), chromium carbide (CrC), vanadium carbide (VC), boron carbide (BC), or combinations thereof; or
(d) combinations of (a), (b) and (c).

12. The device according to claim 11 , wherein the gas barrier bilayer comprises at least three sets of first and second gas barrier bilayers.

13. The device according to claim 11 , wherein the gas barrier bilayer comprises at least eight sets of first and second gas barrier bilayers.

14. The device according to claim 11 , wherein the first and second gas barrier bilayers are made of different materials.

15. The device according to claim 11 , wherein each of the first gas barrier bilayers independently comprise AlO, MgO, BeO or combinations thereof; and each of the second gas barrier bilayers independently comprise SiO, YO, CrO, NbO, TaO, HfO, TiO, ZrO, AlSiO, CrAlO, CrSiO, TiSiO, NbSiO, HfSiO, NbSiO, SiON, TiSiON, SiAlO, TiSiO, TiAlO, CrON, CrAlO, CrSiO, CrAlON, CrSiON, SiN, TiN, ZrN, CrN, NbN, TaN, HfN, or combinations thereof.

16. The device according to claim 11 , wherein each of the first gas barrier bilayers are made of a first material and each of the second gas barrier bilayers are made of a second material.

17. The device according to claim 11 further comprising at least one adhesion layer.

18. A method comprising:
forming a near field transducer (NFT);
forming a gas barrier layer on the NFT by depositing a metal layer and subsequently oxidizing at least part of the metal layer, the metal layer comprising: tantalum (Ta), titanium (Ti), chromium (Cr), silicon (Si), zirconium (Zr), yttrium (Y), magnesium (Mg), beryllium (Be), niobium (Nb), hafnium (Hf), aluminum (Al), or combinations thereof; and
forming a wear resistance layer on the gas barrier layer.

19. The method according to claim 17 , wherein oxidizing the metal layer comprises utilizing thermal oxidation, plasma oxidation, or combinations thereof.

20. The method according to claim 17 , wherein the gas barrier layer has a thickness from about 0.5 mm to about 5 mm.

Assignees

• Seagate Technology Llc

Inventors

• Cheng Yuhang
• Franzen Scott
• Rejda Ed F
• Wierman Kurt W
• Seigler Michael Allen

Classifications

• G11B5/4866 Primary

  the arm comprising an optical waveguide, e.g. for thermally-assisted recording · CPC title

• G11B2005/0021

  Thermally assisted recording using an auxiliary energy source for heating the recording layer locally to assist the magnetization reversal · CPC title

• G11B5/3136

  for reducing the pole-tip-protrusion at the head transducing surface, e.g. caused by thermal expansion of dissimilar materials · CPC title

• G11B5/3106

  where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination (G11B5/3133 takes precedence) · CPC title

• G11B5/3163

  Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers · CPC title