Touch device and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-9411473-B2
Application number	US-201213454067-A
Country	US
Kind code	B2
Filing date	Apr 23, 2012
Priority date	Oct 13, 2011
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

The present disclosure relates to a touch technology, especially to a touch device and a manufacturing method thereof. The touch device comprises a sensing electrode structure, a shielding layer, a plurality of peripheral connection wires and a grounding wire. The shielding layer surrounds the periphery of the sensing electrode structure. The plurality of peripheral connection wires are located under the shielding layer and electrically connected to the sensing electrode structure. The grounding wire is electrically connected to the shielding layer. Thus, in accordance with the present disclosure, the touch device can shield external interference, and the reliability for operation of the touch circuit can be improved.

First claim

What is claimed is:

1. A touch device having a touch area and a surrounding area, comprising:
a sensing electrode structure formed on the touch area;
a shielding layer formed on the surrounding area, wherein the shielding layer surrounds the sensing electrode structure;
a first insulation element formed on the surrounding area, wherein the first insulation element is only formed along two adjacent sides of the touch area so that the first insulation element is geometrically shaped in a manner that partially covers the shielding layer;
a plurality of peripheral connection wires formed on the surrounding area and corresponding to the first insulation element, wherein the first insulation element is formed between the peripheral connection wires and the shielding layer, and the peripheral connection wires are electrically insulated from the shielding layer and are electrically connected to the sensing electrode structure; and
a grounding wire formed on the surrounding area and electrically connected to the shielding layer;
wherein the touch area has a plurality of sides, the shielding layer surrounds all of the sides of the touch area, the first insulation element is formed continuously along the two adjacent sides of the sides of the touch area so that the first insulation element partially covers the shielding layer, the peripheral connection wires are substantially formed on the first insulation element in a manner such that the peripheral connection wires are only formed along the two adjacent sides of the sides of the touch area, and the grounding wire surrounds a periphery of the peripheral connection wires.

2. The touch device of claim 1 , further comprising:
a substrate, wherein the sensing electrode structure is located on a lower surface of the substrate, and the shielding layer is entirely formed on the lower surface of the substrate.

3. The touch device of claim 2 , further comprising:
a black mask layer located on the lower surface of the substrate and sandwiched between the substrate and the shielding layer, wherein the black mask layer is formed on the surrounding area and surrounds the touch area.

4. The touch device of claim 1 , further comprising:
an insulating protection layer covering surfaces of the sensing electrode structure, the peripheral connection wires, and the grounding wire.

5. The touch device of claim 1 , wherein the sensing electrode structure comprises an electrode pattern layer, a second insulation element, and a plurality of conductive jumpers, and wherein the second insulation element is sandwiched between the electrode pattern layer and the conductive jumpers.

6. The touch device of claim 5 , wherein the electrode pattern layer comprises a plurality of independent first-axis conductive cells and a plurality of second-axis conductive cells connected along a second axis so as to form a plurality of second-axis sensing structures, and wherein the independent first-axis conductive cells are connected by the conductive jumpers along a first axis to form a plurality of first-axis sensing structures, and wherein the peripheral connection wires comprise a plurality of first-axis peripheral connection wires and a plurality of second-axis peripheral connection wires, and wherein each of the first-axis peripheral connection wires connects to one end of a corresponding first-axis sensing structure, and each of the second-axis peripheral connection wires connects to one end of a corresponding second-axis sensing structure.

7. The touch device of claim 1 , wherein the sensing electrode structure comprises a first-axis electrode pattern layer, a second insulation element, and a second-axis electrode pattern layer, wherein the second insulation element entirely covers the first-axis electrode pattern layer such that the first-axis electrode pattern layer is electrically insulated from the second-axis electrode pattern layer.

8. The touch device of claim 7 , wherein the first-axis electrode pattern layer comprises a plurality of first electrodes extending along a first axis to form a plurality of first-axis sensing structures and the second-axis electrode pattern layer comprises a plurality of second electrodes extending along a second axis to form a plurality of second-axis sensing structures, and wherein the peripheral connection wires comprise a plurality of first-axis peripheral connection wires and a plurality of second-axis peripheral connection wires, and wherein each of the first-axis peripheral connection wires connects to one end of a corresponding first-axis sensing structure, and each of the second-axis peripheral connection wires connects to one end of a corresponding second-axis sensing structure.

9. A method of manufacturing a touch device having a touch area and a surrounding area, comprising:
forming a sensing electrode structure on the touch area;
forming a shielding layer on the surrounding area, wherein the shielding layer surrounds the sensing electrode structure;
forming a first insulation element on the surrounding area, wherein the first insulation element is only formed along two adjacent sides of the touch area so that the first insulation element is geometrically shaped in a manner that partially covers the shielding layer;
forming a plurality of peripheral connection wires on the surrounding area and corresponding to the first insulation element, wherein the first insulation element is formed between the peripheral connection wires and the shielding layer, and the peripheral connection wires are electrically insulated from the shielding layer and are electrically connected to the sensing electrode structure; and
forming a grounding wire on the surrounding area and electrically connected to the shielding layer;
wherein the peripheral connection wires and the grounding wire are formed simultaneously, and wherein the touch area has a plurality of sides, the shielding layer surrounds all of the sides of the touch area, the first insulation element is formed continuously along the two adjacent sides of the sides of the touch area so that the first insulation element partially covers the shielding layer, the peripheral connection wires are substantially formed on the first insulation element only along the two adjacent sides of the sides of the touch area, and the grounding wire surrounds a periphery of the peripheral connection wires.

10. The method of manufacturing a touch device of claim 9 , further comprising:
a substrate, wherein the sensing electrode structure is formed on a lower surface of the substrate, and the shielding layer is entirely formed on the lower surface of the substrate.

11. The method of manufacturing a touch device of claim 10 , further comprising:
forming a black mask layer on the lower surface of the substrate, wherein the black mask layer is sandwiched between the substrate and the shielding layer, and wherein the black mask layer is formed on the surrounding area and surrounds the touch area.

12. The method of manufacturing a touch device of claim 9 , wherein the sensing electrode structure comprises an electrode pattern layer, a second insulation element, and a plurality of conductive jumpers, and wherein the electrode pattern layer and the shielding layer are formed simultaneously, and wherein the second insulation element and the first insulation element are formed simultaneously.

13. The method of manufacturing a touch device of claim 12 , wherein the conductive jumpers, the peripheral connection wires, and the grounding wire are made of a same material and formed simultaneously.

14. The method of manufacturing a touch device of claim 9 , wherein the sensin

Assignees

• Huang Pingping
• Wu Jia
• Cai Zhixiong
• Jiang Yau-Chen
• Tpk Touch Solutions Xiamen Inc

Inventors

• Huang Pingping
• Wu Jia
• Cai Zhixiong
• Jiang Yau-Chen

Classifications

• G06F2203/04107

  Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds · CPC title

• G06F3/044 Primary

  by capacitive means · CPC title

• G06F2203/04103

  Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices · CPC title

• Y10T29/49105

  Switch making · CPC title

• G06F2203/04113

  Peripheral electrode pattern in resistive digitisers, i.e. electrodes at the periphery of the resistive sheet are shaped in patterns enhancing linearity of induced field · CPC title