Processable self-organizing nanoparticle

Patent metadata

Field	Value
Publication number	US-9410020-B2
Application number	US-201314373553-A
Country	US
Kind code	B2
Filing date	Jan 28, 2013
Priority date	Jan 27, 2012
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

A method of forming a composition includes adding together a plurality of particle brush systems wherein each of the particle brush systems includes a particle and a polymer brush including a plurality of polymer chains attached to the particle. The plurality of polymer chains of the polymer brush exhibit two chain conformations as the degree of polymerization of the polymer chains increases so that the polymer brush includes a concentrated polymer brush region with stretched polymer chains and a semi-dilute polymer brush region with relaxed chains that is radially outside of the concentrated polymer brush region. The degree of polymerization of the polymer brush is no less than 10% less than a critical degree of polymerization and no more than 20% greater than the critical degree of polymerization. The critical degree of polymerization is defined as the degree of polymerization required to achieve a transition from the concentrated polymer brush region to the semi-dilute polymer brush region.

First claim

What is claimed is:

1. A method of forming a composition comprising adding together a plurality of particle brush systems wherein each of the particle brush systems comprises a particle and a polymer brush comprising a plurality of polymer chains attached to the particle, wherein the plurality of polymer chains of the polymer brush exhibit modeled variable chain conformations as the degree of polymerization of the polymer chains increases so that the polymer brush comprises a concentrated polymer brush region with stretched polymer chains and a semi-dilute polymer brush region with relaxed chains that is radially outside of the concentrated polymer brush region, wherein the degree of polymerization of the polymer brush is no less than 10% less than a critical degree of polymerization and no more than 20% greater than the critical degree of polymerization, wherein the critical degree of polymerization is defined as the degree of polymerization required to achieve a transition from the concentrated polymer brush region to the semi-dilute polymer brush region.

2. The method of claim 1 further comprising determining the critical degree of polymerization using a scaling model to determine a change in a scaling factor in a log-log plot of polymer brush height versus degree of polymerization.

3. The method of claim 1 , wherein the composition comprises greater than 50% by mass of the particle brush systems.

4. The method of claim 1 , wherein the composition comprises greater than 90% by mass of the particle brush systems.

5. The method of claim 1 , wherein the composition exhibits a degree of toughness exceeding a toughness of a free polymeric material formed from a polymer having the same composition as the polymer brush and having a degree of polymerization within 5% of the degree of polymerization of the polymer brush.

6. The method of claim 1 , wherein the polymer brush systems self organize to form a colloidal crystal.

7. The method of claim 6 , wherein the degree of order of the colloidal crystal is sufficient so that the composition exhibits a reflectivity exceeding 0.3.

8. The method of claim 1 , wherein the composition is two-dimensional or a three-dimensional (3D) periodic superlattice structures formed by self-assembly of the polymer brush systems.

9. The method of claim 1 , wherein parameters of the composition are controlled via selection of polymer composition, particle size, polymer dispersity (M w /M n ) and graft density.

10. The method of claim 9 , wherein the polymer dispersity is no Greater than 2.

11. The method of claim 9 , wherein the polymer dispersity is no greater than 1.5.

12. The method of claim 1 , wherein the degree of polymerization of the polymer brushes is between 10 and 1,000,000.

13. The method of claim 1 where the radius of the particles is in the range of approximately 0.05 nm and 500 nm.

14. The method of claim 1 where the size dispersity of the particles is in the range of 1.01 to 2.0.

15. The method of claim 1 where the size dispersity of the particles is less than 1.25.

16. The method of claim 1 , wherein graft density is in the range of approximately 001 to 1, chain/nm 2 .

17. The method of claim 1 wherein the particle brush systems of the composition self assembles to provide a center-to-center interparticle distance that varies by no more than 30%.

18. The method of claim 1 wherein the particle brush systems of the composition self assembles to provide a center-to-center interparticle distance that varies by no more than 5%.

19. The method of claim 1 wherein the composition forms a photonic crystal system or an organized quantum dot system.

20. The method of claim 1 wherein the degree of polymerization of the polymer brush is no less than 5% less than the critical degree of polymerization and no more than 10% greater than the critical degree of polymerization.

21. The method of claim 2 further comprising determining the critical degree of polymerization N c using the equation r c −R 0 =αN c x wherein r c is the critical chain length associated with the transition, R 0 is the particle radius, α is the length of a repeat unit of the polymer, and x is the scaling factor in the concentrated polymer brush regime, and wherein r c =R 0 (ρ s *) 1/2 (v*) −1 , wherein ρ s *=ρ s α 2 , wherein ρ s is the grafting density, and v*=v/(4π) 1/2 , wherein v is the excluded volume parameter.

22. A method of forming a composition comprising adding together a plurality of particle brush systems wherein each of the particle brush systems comprises a particle and a polymer brush comprising a plurality of polymer chains attached to the particle, wherein the plurality of polymer chains of the polymer brush exhibit modeled variable chain conformations as the degree of polymerization of the polymer chains increases so that the polymer brush has a concentrated polymer brush region with stretched polymer chains and a semi-dilute polymer brush region with relaxed chains that is radially outside of the concentrated polymer brush region, wherein the volume fraction of polymer chains in the semi-dilute polymer brush region does not exceed the available void space of a close packed regular structure formed by adjacent polymer brush systems by greater than 20%.

23. A composition comprising a plurality of particle brush systems wherein each of the particle brush systems comprises a particle and a polymer brush comprising a plurality of polymer chains attached to the particle, wherein the plurality of polymer chains of the polymer brush exhibit modeled variable chain conformations as the degree of polymerization of the polymer chains increases so that the polymer brush comprises a concentrated polymer brush region with stretched polymer chains and a semi-dilute polymer brush region with relaxed chains that is radially outside of the concentrated polymer brush region, wherein the degree of polymerization of the polymer brush is no less than 10% less than a critical degree of polymerization and no more than 20% greater than the critical degree of polymerization, wherein the critical degree of polymerization is defined as the degree of polymerization required to achieve a transition from the concentrated polymer brush region to the semi-dilute polymer brush region.

24. The composition of claim 23 , wherein the composition comprises greater than 90% by mass of the particle brush systems and the polymer chains have a polymer dispersity no greater than 1.5.

Assignees

• Univ Carnegie Mellon

Inventors

• Matyjaszewski Krzysztof
• Bockstaller Michael

Classifications

• C08L33/12

  Homopolymers or copolymers of methyl methacrylate · CPC title

• C08L25/06

  Polystyrene · CPC title

• C08J2333/12

  Homopolymers or copolymers of methyl methacrylate · CPC title

• C08J2325/06

  Polystyrene · CPC title

• B81C2201/0149

  Forming nanoscale microstructures using auto-arranging or self-assembling material · CPC title