Light Emitting Diode Epitaxial Structure and Light Emitting Diode
US-2024297271-A1 · Sep 5, 2024 · US
US9406836B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9406836-B2 |
| Application number | US-201314413233-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 3, 2013 |
| Priority date | Jul 11, 2012 |
| Publication date | Aug 2, 2016 |
| Grant date | Aug 2, 2016 |
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Embodiments of the invention include a III-nitride light emitting layer disposed between an n-type region and a p-type region, a III-nitride layer including a nanopipe defect, and a nanopipe terminating layer disposed between the III-nitride light emitting layer and the III-nitride layer comprising a nanopipe defect. The nanopipe terminates in the nanopipe terminating layer.
Opening claim text (preview).
The invention claimed is: 1. A device comprising: a III-nitride light emitting layer disposed between an n-type region and a p-type region; a III-nitride layer comprising GaN islands coalesced into a smooth film, and a nanopipe defect disposed at a boundary between two GaN islands; and a nanopipe terminating layer disposed between the III-nitride light emitting layer and the III-nitride layer comprising a nanopipe defect, wherein the nanopipe terminates in the nanopipe terminating layer. 2. The device of claim 1 wherein the nanopipe terminating layer comprises aluminum. 3. The device of claim 2 wherein the nanopipe terminating layer contains magnesium. 4. The device of claim 1 wherein the nanopipe terminating layer comprises a superlattice, the superlattice comprising a plurality of alternating first and second layers. 5. The device of claim 4 wherein the first layers are GaN and the second layers are Al x Ga 1-x N where 0<x≦1. 6. The device of claim 4 wherein the first layers are Al b Ga 1-b N and the second layers are Al c Ga 1-c N, wherein b≠c. 7. The device of claim 1 wherein the III-nitride light emitting layer is spaced at least 1 micron from the nanopipe terminating layer. 8. The device of claim 1 wherein the nanopipe terminating layer is electrically connected in common with the n-type layer. 9. The device of claim 1 wherein the nanopipe terminating layer comprises part of an electrostatic discharge protection circuit.
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