Mold and process for production of mold

US9405043B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9405043-B2
Application numberUS-201113643632-A
CountryUS
Kind codeB2
Filing dateApr 1, 2011
Priority dateApr 28, 2010
Publication dateAug 2, 2016
Grant dateAug 2, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mold manufacturing method of an embodiment of the present invention includes the steps of: (a) providing a mold base; (b) partially anodizing the aluminum layer to form a porous alumina layer, the porous alumina layer having a porous layer which defines a plurality of minute recessed portions and a barrier layer which is provided at a bottom of each of the plurality of minute recessed portions; and (c) after step (b), performing etching, thereby enlarging the plurality of minute recessed portions of the porous alumina layer, wherein in step (c) the etching is performed such that an average depth of the plurality of minute recessed portions increases but does not exceed a 1/7 of an average thickness of the barrier layer before the etching.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for manufacturing a mold which has an inverted moth-eye structure over its surface, the inverted moth-eye structure having a plurality of recessed portions whose two-dimensional size viewed in a direction normal to its surface is not less than 10 nm and less than 500 nm, the method comprising the steps of: (a) providing a mold base, the mold base including a base, an inorganic underlayer, made of an inorganic oxide or an inorganic nitride, provided on the base, a buffer layer, containing aluminum and either of oxygen or nitrogen, provided on the inorganic underlayer, and an aluminum layer provided on the buffer layer; (b) partially anodizing the aluminum layer to form a porous alumina layer, the porous alumina layer having a porous layer which defines a plurality of minute recessed portions and a barrier layer which is provided at a bottom of each of the plurality of minute recessed portions; and (c) after step (b), bringing the porous alumina layer into contact with an etching solution to perform etching, thereby enlarging the plurality of minute recessed portions of the porous alumina layer, wherein in step (c) the etching is performed such that an average depth of the plurality of minute recessed portions increases but does not exceed a 1/7 of an average thickness of the barrier layer before the etching. 2. The method of claim 1 , wherein in step (c) the average thickness of the barrier layer before the etching is not less than 5 nm and not more than 250 nm. 3. The method of claim 2 , wherein in step (c) the average thickness of the barrier layer before the etching is not less than 5 nm and not more than 180 nm. 4. The method of claim 3 , wherein in step (c) the average thickness of the barrier layer before the etching is not less than 85 nm and not more than 95 nm. 5. The method of claim 4 , wherein in step (c) an increase of the average depth is not less than 5 nm and not more than 12 nm. 6. The method of claim 1 , further comprising the step of: (d) after step (c), further anodizing the aluminum layer to grow the plurality of minute recessed portions. 7. The method of any of claim 1 , wherein in step (c) a phosphoric acid aqueous solution is used as the etching solution. 8. The method of claim 1 , wherein in step (a) the buffer layer includes an aluminum oxide layer. 9. The method of claim 8 , wherein the aluminum oxide layer is formed by sputtering of aluminum in an oxygen atmosphere. 10. A mold which is manufactured according to the manufacturing method as set forth in claim 1 , wherein the porous alumina layer has the inverted moth-eye structure over its surface. 11. An antireflection film which is produced using the mold as set forth in claim 10 , the antireflection film having a surface which is provided with a moth-eye structure.

Assignees

Inventors

Classifications

  • Coatings {, e.g. enameled or galvanised}; Releasing, lubricating or separating agents {(in-mould coating B29C37/0028; using or applying separating agents B29C37/0067)} · CPC title

  • Moulds for lenses (moulds for plastic articles in general B29C33/00) · CPC title

  • Chemical after-treatment · CPC title

  • Moulding surfaces provided with means for marking or patterning (for injection moulding B29C45/372) · CPC title

  • Chemical milling · CPC title

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What does patent US9405043B2 cover?
A mold manufacturing method of an embodiment of the present invention includes the steps of: (a) providing a mold base; (b) partially anodizing the aluminum layer to form a porous alumina layer, the porous alumina layer having a porous layer which defines a plurality of minute recessed portions and a barrier layer which is provided at a bottom of each of the plurality of minute recessed portion…
Who is the assignee on this patent?
Isurugi Akinobu, Minoura Kiyoshi, Hayashi Hidekazu, and 2 more
What technology area does this patent fall under?
Primary CPC classification G02B1/118. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).