Photosensitive resin composition and photosensitive film using same

Patent metadata

Field	Value
Publication number	US-9403977-B2
Application number	US-201314651081-A
Country	US
Kind code	B2
Filing date	Dec 5, 2013
Priority date	Dec 12, 2012
Publication date	Aug 2, 2016
Grant date	Aug 2, 2016

Abstract

The present invention relates to a positive-type photosensitive resin composition comprising (A) a modified novolac-type phenol resin having an unsaturated hydrocarbon group, (B) a novolac-type phenol resin obtained from metacresol and paracresol, (C) a novolac-type phenol resin obtained from orthocresol, (D) a compound generating an acid by light, and (E) a polybasic acid or a polybasic acid anhydride, wherein the content of the (E) component is lower than 40 parts by mass per 100 parts by mass of the total amount of the (A) component, the (B) component, the (C) component and the (D) component.

First claim

The invention claimed is:

1. A positive-type photosensitive resin composition, comprising:
(A) a modified novolac-type phenol resin having an unsaturated hydrocarbon group;
(B) a novolac-type phenol resin obtained from metacresol and paracresol;
(C) a novolac-type phenol resin obtained from orthocresol;
(D) a compound generating an acid by light; and
(E) a polybasic acid or a polybasic acid anhydride,
wherein a content of the polybasic acid or a polybasic acid anhydride is lower than 40 parts by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

2. The positive-type photosensitive resin composition according to claim 1 , wherein a weight-average molecular weight of the modified novolac-type phenol resin having an unsaturated hydrocarbon group is 1000 to 15000.

3. The positive-type photosensitive resin composition according to claim 1 , wherein a weight-average molecular weight of the novolac-type phenol resin obtained from metacresol and paracresol is 800 to 50000.

4. The positive-type photosensitive resin composition according to claim 1 , wherein a weight-average molecular weight of the novolac-type phenol resin obtained from orthocresol is 800 to 5000.

5. The positive-type photosensitive resin composition according to claim 1 , wherein a content of the novolac-type phenol resin obtained from orthocresol is 20 to 60 parts by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

6. The positive-type photosensitive resin composition according to claim 1 , wherein the unsaturated hydrocarbon group has 4 to 100 carbon atoms.

7. The positive-type photosensitive resin composition according to claim 1 , further comprising a fluorine-based surfactant.

8. The positive-type photosensitive resin composition according to claim 1 , further comprising an adhesivity-imparting agent.

9. A photosensitive film, comprising: a support film at least one surface of which has been subjected to a release treatment; and a photosensitive layer provided on the surface of the support film which has been subjected to the release treatment, wherein the photosensitive layer is a layer formed of the positive-type photosensitive resin composition according to claim 1 .

10. The positive-type photosensitive resin composition according to claim 1 , wherein the content of the polybasic acid or the polybasic acid anhydride is lower than 35 parts by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

11. The positive-type photosensitive resin composition according to claim 10 , wherein the content of the polybasic acid or the polybasic acid anhydride is higher than 0.1 parts by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

12. The positive-type photosensitive resin composition according to claim 10 , wherein the content of the polybasic acid or the polybasic acid anhydride is higher than 1 part by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

13. The positive-type photosensitive resin composition according to claim 1 , wherein the content of the polybasic acid or the polybasic acid anhydride is lower than 30 parts by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

14. The positive-type photosensitive resin composition according to claim 13 , wherein the content of the polybasic acid or the polybasic acid anhydride is higher than 0.1 parts by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

15. The positive-type photosensitive resin composition according to claim 13 , wherein the content of the polybasic acid or the polybasic acid anhydride is higher than 1 part by mass per 100 parts by mass of a total amount of the modified novolac-type phenol resin having an unsaturated hydrocarbon group, the novolac-type phenol resin obtained from metacresol and paracresol, the novolac-type phenol resin obtained from orthocresol and the compound generating an acid by light.

Assignees

• Hitachi Chemical Co Ltd

Inventors

• Ueda Satoko
• Sawabe Ken

Classifications

• C08J5/18

  Manufacture of films or sheets · CPC title

• G03F7/023

  Macromolecular quinonediazides; Macromolecular additives, e.g. binders {(G03F7/0226 takes precedence)} · CPC title

• C08L2205/03

  containing three or more polymers in a blend · CPC title

• C08L2205/025

  containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure · CPC title

• G03F7/0236

  Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins · CPC title