Waveguide, Wave Beam Adjusting Device, Wave Beam Adjusting Method and Manufacturing Method
US-2024387973-A1 · Nov 21, 2024 · US
US9400402B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9400402-B2 |
| Application number | US-201514590296-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 6, 2015 |
| Priority date | Jan 7, 2014 |
| Publication date | Jul 26, 2016 |
| Grant date | Jul 26, 2016 |
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Disclosed is a technology related to an optical waveguide which is insensitive to an ambient temperature and is capable of adjusting a wavelength error due to a manufacturing processing deviation. The optical waveguide includes: a clad layer positioned on a substrate; a core layer positioned between the substrate and the clad layer, and including patterns positioned in a first region and a second region; and a wavelength adjusting unit positioned in the first region between the substrate and the clad layer, and configured to adjust a wavelength of an optical signal propagated through patterns passing through the first region based on received electric energy, in which the clad layer includes a material having a Thermo-Optic Coefficient (TOC) with an opposite sign to that of a material included in the core layer.
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What is claimed is: 1. An optical waveguide, comprising: a core layer positioned on a substrate, and including patterns positioned in a first region and a second region, the core layer having a lower side which faces the substrate and an upper side opposite to the lower side; a clad layer positioned on the upper side of the core layer; and a wavelength adjusting unit positioned in the first region between the substrate and the clad layer, and configured to adjust a wavelength of an optical signal propagated through patterns passing through the first region based on received electric energy, wherein the clad layer includes a material having a Thermo-Optic Coefficient (TOC) with an opposite sign to that of a material included in the core layer, wherein the core layer includes a silicon material having a positive TOC, and wherein the clad layer includes: a first clad layer positioned on the upper side of the core layer in the first region, and including a material having a smaller TOC than that of the silicon material included in the core layer; and a second clad layer positioned on the upper side of the core layer in the second region and including a material having a negative TOC. 2. The optical waveguide of claim 1 , wherein the first region is smaller than the second region. 3. The optical waveguide of claim 1 , wherein the wavelength adjusting unit generates heat based on the received electric energy, and provides the generated heat to the patterns passing through the first region to adjust a wavelength of an optical signal propagated through the patterns passing through the first region. 4. The optical waveguide of claim 1 , further comprising: a slap waveguide positioned between the substrate and the core layer. 5. The optical wavelength of claim 4 , wherein the wavelength adjusting unit includes a first wavelength adjusting unit on one side of the patterns in the first region and a second wavelength adjusting unit on the other side of the patterns in the first region, and the first and second wavelength adjusting units have a height greater than a thickness of the slap waveguide. 6. The optical waveguide of claim 1 , wherein the optical waveguide is used in an optical device based on the optical waveguide. 7. The optical waveguide of claim 1 , wherein the wavelength adjusting unit includes a first wavelength adjusting unit on one side of the patterns in the first region and a second wavelength adjusting unit on the other side of the patterns in the first region, and the first and second wavelength adjusting units are formed of a same material. 8. An optical device based on an optical waveguide, comprising: a substrate; and a ring resonator positioned on the substrate, wherein the ring resonator includes: a core layer positioned on the substrate, and including at least one ring waveguide positioned in a first region and a second region, the core layer having a lower side which faces the substrate and an upper side opposite to the lower side; a clad layer positioned on the upper side of the core layer; and a wavelength adjusting unit positioned in the first region between the substrate and the clad layer, and configured to adjust a wavelength of an optical signal propagated through a ring waveguide passing through the first region based on received electric energy, wherein the clad layer includes a material having a Thermo-Optic Coefficient (TOC) with an opposite sign to that of a material included in the core layer, wherein the core layer includes a silicon material having a positive TOC, and wherein the clad layer includes: a first clad layer positioned on the upper side of the core layer in the first region, and including a material having a smaller TOC than that of the silicon material included in the core layer; and a second clad layer positioned on the upper side of the core layer in the second region and including a material having a negative TOC. 9. The optical device of claim 8 , wherein the first region is smaller than the second region. 10. The optical device of claim 8 , wherein the wavelength adjusting unit generates heat based on the received electric energy, and provides the generated heat to the ring waveguide passing through the first region to adjust a wavelength of an optical signal propagated through the ring waveguide passing through the first region. 11. The optical device of claim 8 , further comprising: a slap waveguide positioned between the substrate and the core layer. 12. The optical device of claim 11 , wherein the wavelength adjusting unit includes a first wavelength adjusting unit on one side of the patterns in the first region and a second wavelength adjusting unit on the other side of the patterns in the first region, and the first and second wavelength adjusting units have a height greater than a thickness of the slap waveguide. 13. The optical device of claim 8 , wherein the wavelength adjusting unit includes a first wavelength adjusting unit on one side of the patterns in the first region and a second wavelength adjusting unit on the other side of the patterns in the first region, and the first and second wavelength adjusting units are formed of a same material. 14. The optical device of claim 8 , when taken from a plan view, the first region is a region corresponding to a range of a predetermined acute center angle relative to a center of a circle formed by the at least one ring waveguide. 15. The optical device of claim 14 , when taken from a plan view, the wavelength adjusting unit extends in the first region along the at least one ring waveguide and forms a center angle relative to the center of the circle not greater than the predetermined acute center angle of the first region.
Temperature independent · CPC title
in an optical waveguide structure (G02F1/017, {G02F1/2257} take precedence) · CPC title
in optical waveguides, not otherwise provided for in this subclass · CPC title
wavelength independent · CPC title
based on thermo-optic effects (G02F1/132 takes precedence) · CPC title
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