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Resin composition for photoimprinting, pattern forming process and etching mask
US9399693B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9399693-B2 |
| Application number | US-201113979527-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 2, 2011 |
| Priority date | Jan 13, 2011 |
| Publication date | Jul 26, 2016 |
| Grant date | Jul 26, 2016 |
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Abstract
Official abstract text for this publication.
A resin composition for photoimprinting, a cured product of the resin composition which is excellent in etching and heat resistance, and a pattern forming process using the resin composition are provided. The resin composition contains photocurable monomer (A) containing at least one carbazole compound of formula (I): a photocurable monomer (B) containing at least one compound of the following formulae (II), (III), and (IV): and a photopolymerization initiator (C). The weight ratio of the photocurable monomer (A) to the photocurable monomer (B) is from 30/70 to 87/13.
First claim
Opening claim text (preview).
The invention claimed is: 1. A resin composition, comprising: a photocurable monomer (A), a photocurable monomer (B), a photopolymerization initiator (C), and a viscosity-adjusting agent (D) of a polymer comprising a carbazole skeleton, wherein the photocurable monomer (A) comprises a carbazole compound of formula (I), the photocurable monomer (B) comprises at least one member selected from the group consisting of a compound of formula (II), a compound of formula (III)…
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Electricity · mapped topic
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
Operations & Transport · mapped topic
- G03F7/0002Primary
Physics · mapped topic
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Frequently asked questions
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- What does patent US9399693B2 cover?
- A resin composition for photoimprinting, a cured product of the resin composition which is excellent in etching and heat resistance, and a pattern forming process using the resin composition are provided. The resin composition contains photocurable monomer (A) containing at least one carbazole compound of formula (I): a photocurable monomer (B) containing at least one…
- Who is the assignee on this patent?
- Hayashida Yoshihisa, Satsuka Takuro, Ikeda Teruyo, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jul 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).