High purity electrolytic sulfonic acid solutions

US9399618B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9399618-B2
Application numberUS-201113069939-A
CountryUS
Kind codeB2
Filing dateMar 23, 2011
Priority dateMay 12, 2003
Publication dateJul 26, 2016
Grant dateJul 26, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  5. First independent claim

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Abstract

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Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and descaling processes.

First claim

Opening claim text (preview).

The invention claimed is: 1. An aqueous solution for use in an electrochemical process, the solution comprising a sulfonic acid, trichloromethyl methyl sulfone and methyl methanethiosulfonate wherein said trichloromethyl methyl sulfone is present in amounts less than about 6 parts per million, and said methyl methanethiosulfonate is present in amounts less than about 0.25 parts per million. 2. The solution of claim 1 for use in electrodeposition, batteries, conductive polymers and descaling processes. 3. The solution of claim 1 wherein the sulfonic acid is derived from an alkyl monosulfonic acid, an alkyl polysulfonic acid or an aryl mono or polysulfonic acid. 4. The solution of claim 1 wherein the sulfonic acid is: wherein a+b±c+y equals 4, R, R′ and R″ are the same or different and each independently are hydrogen, phenyl, Cl, F, Br, I, CF 3 or a lower C 1-9 alkyl group that is unsubstituted or substituted by oxygen, Cl, F, Br, I, CF 3 , or —SO 2 OH. 5. The solution of claim 4 wherein the sulfonic acid is selected from the group consisting of methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, methanedisulfonic acid, monochloromethanedisulfonic acid, dichloromethanedisulfonic acid, 1,1-ethanedisulfonic acid, 2-chloro-1,1-ethanedisulfonic acid, 1,2-dichloro-1,1-ethanedisulfonic, acid, 1,1-propanedisulfonic acid, 3-chloro-1,1-propanedisulfonic acid, 1,2-ethylene disulfonic acid, 1,3-propylene disulfonic acid, trifluormethanesulfonic acid, butanesulfonic acid, perfluorobutanesulfonic acid, pentanesulfonic acid, phenylsulfonic acid, phenolsulfonic acid, para-toulenesulfonic acid, xylenesulfonic acid and mixtures thereof. 6. The solution of claim 4 wherein the sulfonic acid is a free alkanesulfonic acid having a concentration range from 1 to 1480 g/l. 7. The solution of claim 6 , wherein the concentration of the free alkanesulfonic acid is about 10 to about 700 grams per liter of solution. 8. The solution of claim 6 , wherein the concentration of the free alkanesulfonic acid is about 30 to about 500 grams per liter of solution. 9. The solution of claim 1 wherein the pH is between −2 to 13. 10. The solution of claim 1 further comprising inorganic or organic acids in combination with said sulfonic acid. 11. The solution of claim 1 further comprising a metal sulfonate salt or other metal salts and free sulfonic acids. 12. The solution of claim 11 wherein the other metal salts is a salt of an alkyl or aryl sulfonic acid of formula: wherein a+b±c+y equals 4, M is a metal selected from metals in Group 1B, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6B, 7B, 8B, lanthanide metals of the periodic table, of actinide metals of the periodic table, ammonium ion or mixtures thereof, R, R′ and R″ are the same or different and each independently is hydrogen, phenyl, Cl, F, Br, I, CF 3 or a C 1-23 alkyl group that is unsubstituted or substituted by oxygen, Cl, F, Br, I, CF 3 , or —SO 2 OH. 13. The solution of claim 11 wherein the metal sulfonate salt or other metal salts are present at a concentration froth about 1 to about 600 grams per liter of aqueous solution. 14. The solution of claim 11 wherein the free sulfonic acids are selected from the group consisting of methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, trifluoromethanesulfonic acid and mixtures thereof. 15. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is selected from metals in Group 1B, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6B, 7B, 8B, lanthanide or actinide metals of the periodic table and ammonium ion or mixtures thereof. 16. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is zinc methanesulfonate salt. 17. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is copper methanesulfonate salt. 18. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is nickel methanesulfonate salt. 19. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is ferrous methanesulfonate salt. 20. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is an alkali or alkaline earth metal salt. 21. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is a mixture of metal sulfonate salts selected from metals in Group 1B, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6B, 7B, 8B, lanthanide and actinide metals of the periodic table and ammonium ion. 22. The solution of claim 1 further comprising a buffering agent to modulate the pH of the aqueous solution. 23. The solution of claim 22 wherein the buffering agent is boric acid. 24. The solution of claim 1 further comprising an organic monomer selected from aniline or substituted aniline or pyrrole.

Assignees

Inventors

Classifications

  • comprising polymerisation in situ · CPC title

  • Pickling; Descaling · CPC title

  • from solutions (C25D5/34 - C25D5/46 take precedence) · CPC title

  • Sulfuric acid-based · CPC title

  • C07C303/44Primary

    Separation; Purification · CPC title

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What does patent US9399618B2 cover?
Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and descaling processes.
Who is the assignee on this patent?
Martyak Nicholas M, Nosowitz Martin, Smith Gary S, and 3 more
What technology area does this patent fall under?
Primary CPC classification C07C303/44. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).