Methods for making a trim-rate tolerant self-aligned contact via structure array

Patent metadata

Field	Value
Publication number	US-9397115-B1
Application number	US-201414584179-A
Country	US
Kind code	B1
Filing date	Dec 29, 2014
Priority date	Dec 29, 2014
Publication date	Jul 19, 2016
Grant date	Jul 19, 2016

Abstract

A stack is formed over a substrate, which comprises an alternating plurality of first material layers including a first material and second material layers including a second material. A patterned hard mask is formed, which includes multiple laterally spaced apart strips. A trimming material layer is formed over the hard mask layer. At least one cycle of process steps is subsequent performed, which include etching the first material employing the second material and the trimming material layer as an etch mask, trimming the trimming material layer to expose a strip of the hard mask layer, etching the second material and the exposed strip of the hard mask layer employing the trimming material layer as an etch mask, and trimming the trimming material layer to expose an edge of a next strip of the hard mask layer. Stepped surfaces suitable for formation of contact via array can thus be formed.

First claim

What is claimed is:

1. A method of fabricating a multilevel structure, comprising:
forming a stack comprising an alternating plurality of first material layers and second material layers over a substrate;
forming a hard mask layer over the stack;
patterning the hard mask layer into multiple portions that are laterally spaced apart;
forming and patterning a trimming material layer over the patterned hard mask layer; and
performing at least once a set of processing steps that comprises:
a first processing step of etching at least one physically exposed portion of the first material layers in a first etch process employing a combination of the patterned trimming material layer and the patterned hard mask layer as an etch mask;
a second processing step of trimming the trimming material layer after the first etch process; and
a third processing step of etching at least one physically exposed portion of the second material layers and a physically exposed portion of the patterned hard mask layer in a second etch process employing the trimming material layer as an etch mask.

2. The method of claim 1 , wherein the trimming material layer has a sidewall that adjoins a top surface of a remaining portion among the multiple portions of the hard mask layer during each first processing step.

3. The method of claim 2 , wherein the trimming material layer has a sidewall that is located between, and does not contact, a neighboring pair of portions of the hard mask layer after each second processing step and prior to a subsequent third processing step.

4. The method of claim 1 , wherein the set of processing steps further comprises a fourth processing step of further trimming the trimming material layer after the second etch process.

5. The method of claim 4 , wherein the trimming material layer has a sidewall that adjoins a top surface of a remaining portion among the multiple portions of the hard mask layer after each fourth processing step.

6. The method of claim 4 , wherein each first etch process is an anisotropic etch process that etches a material of the first material layers selective to a material of the second material layers.

7. The method of claim 6 , wherein each second etch process is an anisotropic etch process that etches a material of the second material layers and a material of the hard mask layer selective to a material of the first material layers.

8. The method of claim 7 , wherein the first material layers comprise silicon oxide, and the second material layers and the hard mask layer comprise silicon nitride.

9. The method of claim 4 , wherein:
the second material layers are employed as etch stop layers for each first etch process; and
the first material layers are employed as etch stop layers for each second etch process.

10. The method of claim 4 , wherein:
a sidewall of the trimming material layer is shifted from above a first portion of the hard mask layer to a location between the first portion and a second portion of the hard mask layer that is a neighboring portion of the first portion during each second processing step; and
the first portion of the hard mask layer is removed during a subsequent third processing step.

11. The method of claim 10 , wherein the sidewall of the trimming material layer is further shifted to the second portion of the hard mask layer during a subsequent fourth processing step.

12. The method of claim 1 , wherein the trimming material layer comprises a material selected from a photoresist material, an organic polymer material, and an inorganic polymer material.

13. The method of claim 4 , wherein the trimming material layer is trimmed selective to the materials of the first material layers and the second material layers during each second processing step, and wherein the trimming material layer is trimmed selective to the first material layers and the second material layers during each fourth processing step.

14. The method of claim 1 , wherein:
a topmost layer of the stack is a topmost first material layer; and
the hard mask layer is formed directly on the topmost first material layer.

15. The method of claim 1 , wherein at least one respective physically exposed portion of the second material layers and at least one respective physically exposed portion of the patterned hard mask layer are simultaneously etched in each of the at least one third processing step.

16. The method of claim 5 , wherein the hard mask layer comprises a same material as the second material layers.

17. The method of claim 16 , wherein the hard mask layer and the second material layers comprise silicon nitride.

18. The method of claim 17 , wherein the first material layers comprise silicon oxide.

19. The method of claim 15 , wherein the hard mask layer has a thickness that is the same as or less than a maximum thickness of the second material layers.

20. The method of claim 15 , wherein the hard mask layer has a thickness that is greater than a maximum thickness of the second material layers.

21. The method of claim 1 , wherein:
the set of processing steps is repeatedly performed a plurality of times; and
remaining portion of the first material layers and second material layers constitute a stepped structure having a plurality of steps.

22. The method of claim 21 , wherein:
the patterned multiple portions of the hard mask layer comprises strips having parallel edges; and
a minimum width of each step of the plurality of steps is about a sum of four times a trimming width variation of the trimming material layer and a variance in critical dimension of a lithographic process employed to pattern the hard mask layer.

23. The method of claim 22 , wherein:
a center-to-center distance between each neighboring pair of patterned multiple portions of the hard mask layer is the same; and
the patterned multiple portions of the hard mask layer constitutes a periodic one-dimensional array having a repetition of a unit pattern.

24. The method of claim 22 , wherein:
neighboring pairs of patterned multiple portions of the hard mask layer have at least two different center-to-center distances;
the patterned multiple portions of the hard mask layer have at least two different widths; and
the plurality of steps have at least two different step widths.

25. The method of claim 21 , further comprising forming a retro-stepped dielectric material portion over the steps, wherein a lateral extent of the retro-stepped dielectric material portion increases as a function of a vertical distance from a top surface of the substrate.

26. The method of claim 25 , further comprising forming a plurality of contact via structures having different heights through the retro-stepped dielectric material portion.

27. The method of claim 26 , wherein the plurality of contact via structures have top surfaces located within a same horizontal plane.

28. The method of claim 26 , wherein the second material layers are sacrificial material layers, and the method further comprises replacing the second material layers with electrically conductive layers.

29. The method of claim 28 , wherein each of the plurality of contact via structures is formed directly on a top surface of a respective electrically conductive layer.

30. The method of claim 28 , further comprising forming at least one memory stack structure within the stack

Assignees

• Sandisk Technologies Inc
• Sandisk Technologies Llc

Inventors

• Nozawa Kei

Classifications

• H10P50/73 Primary

  using masks for insulating materials · CPC title

• H01L21/31111

  Electricity · mapped topic

• H01L21/28282

  Electricity · mapped topic

• H01L21/28273

  Electricity · mapped topic

• H01L21/0217

  Electricity · mapped topic