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Zinc oxide sintered compact, sputtering target, and zinc oxide thin film
US9396830B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9396830-B2 |
| Application number | US-201113879506-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 25, 2011 |
| Priority date | Dec 6, 2010 |
| Publication date | Jul 19, 2016 |
| Grant date | Jul 19, 2016 |
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- Title
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Abstract
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There is provided a zinc oxide sintered compact with a zirconium content of 10 to 1000 ppm, and a sputtering target containing the zinc oxide sintered compact. There is also provided a zinc oxide thin-film having a zirconium content of 10 to 2000 ppm and a resistivity of 10 Ω·cm or greater.
First claim
Opening claim text (preview).
The invention claimed is: 1. A sintered compact consisting of zinc oxide; 10 to 1000 ppm zirconium; and optionally, alumina. 2. The sintered compact according to claim 1 , wherein the resistivity is no greater than 10 5 Ω·cm. 3. A sputtering target comprising the sintered compact according to claim 2 . 4. The sintered compact according to claim 1 , which is cylindrical. 5. A sputtering target comprising the sintered compact according to claim 4 . 6. A sputtering target comprising the sintered compact according to claim 1 . 7. The sintered compact according to claim 1 , having a relative density of 97% or greater. 8. A thin-film consisting of zinc oxide; 10 to 2000 ppm zirconium; and optionally, alumina; wherein a resistivity of the thin-film is 10 Ω·cm or greater. 9. The thin-film according to claim 8 , wherein the zirconium content is 10 to 1000 ppm. 10. The thin-film according to claim 9 , wherein the transmittance at a wavelength of 500 nm is 75% or greater when a film thickness is 100 nm. 11. The thin-film according to claim 8 , wherein the transmittance at a wavelength of 500 nm is 75% or greater when a film thickness is 100 nm.
Assignees
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Classifications
Transition metal elements; Rare earth elements · CPC title
Oxides · CPC title
using physical deposition, e.g. vacuum deposition or sputtering · CPC title
Refractory metals · CPC title
Density · CPC title
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Frequently asked questions
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- What does patent US9396830B2 cover?
- There is provided a zinc oxide sintered compact with a zirconium content of 10 to 1000 ppm, and a sputtering target containing the zinc oxide sintered compact. There is also provided a zinc oxide thin-film having a zirconium content of 10 to 2000 ppm and a resistivity of 10 Ω·cm or greater.
- Who is the assignee on this patent?
- Mesuda Masami, Kuramochi Hideto, Iigusa Hitoshi, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification C04B35/453. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jul 19 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).