Apparatus and Methodology for Reshaping a Laser Beam
US-2024027781-A1 · Jan 25, 2024 · US
US9391424B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9391424-B2 |
| Application number | US-201414469547-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 26, 2014 |
| Priority date | Sep 20, 2001 |
| Publication date | Jul 12, 2016 |
| Grant date | Jul 12, 2016 |
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This disclosure demonstrates successfully using single, polycrystalline, hot pressed ceramic, and thin film Fe doped binary chalcogenides (such as ZnSe and ZnS) as saturable absorbing passive Q-switches. The method of producing polycrystalline ZnSe(S) yields fairly uniform distribution of dopant, large coefficients of absorption (5-50 cm −1 ) and low passive losses while being highly cost effective and easy to reproduce. Using these Fe 2+ :ZnSe crystals, stable Q-switched output was achieved with a low threshold and the best cavity configuration yielded 13 mJ/pulse single mode Q-switched output and 85 mJ in a multipulse regime.
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What is claimed is: 1. A method for producing laser pulses at a laser wavelength around 3 μm based on passive Q switching at room temperature, the method comprising: providing a laser cavity in an Erbium or transition metal doped laser to include a doped laser gain material to produce laser light at a laser wavelength around 3 μm under optical pumping; and using a saturable absorber inside the laser cavity to effectuate passive Q-switching in the laser light that generates laser pulses at the laser wavelength around 3 μm, where the saturable absorber is a single crystalline or polycrystalline material of Fe 2+ :ZnSe or Fe 2+ :ZnS structured to exhibit a saturable absorption at the laser wavelength around 3 μm that effectuates the passive Q-switching at room temperature. 2. The method of claim 1 , wherein the laser wavelength is in the range 2.5 μm to 3.4 μm. 3. The method of claim 1 , wherein the laser wavelength is in the range 2.5 μm to 4 μm. 4. The method of claim 1 , wherein: the single crystalline or polycrystalline material of Fe 2+ :ZnSe or Fe 2+ :ZnS is structured to exhibit an absorption cross section of about 10 −18 cm 2 for saturable absorption at the laser wavelength around 3 μm and at the room temperature. 5. The method of claim 1 , wherein the saturable absorber is formed by: forming a polycrystalline or single crystalline structure of a thickness sufficient for use as a microchip saturable absorber, where the polycrystalline or single crystalline structure is selected from the group consisting of ZnS and ZnSe; depositing a thin film layer of Fe on opposing faces of the polycrystalline or single crystalline structure by a method selected from the group consisting of pulsed laser deposition, cathode arc deposition, thermal evaporation, and plasma sputtering; and annealing the polycrystalline or single crystalline structure sealed in vacuumed ampoules in an oven for a period and at a temperature sufficient to allow crystal doping by Fe diffusion and replacement in selected regions of the polycrystalline or single crystalline structure. 6. The method of claim 1 , wherein the saturable absorber is formed by: forming a polycrystalline or single crystalline structure of a thickness sufficient for use as a microchip saturable absorber, where the polycrystalline or single crystalline structure is selected from the group consisting of ZnS and ZnSe; and annealing the polycrystalline or single crystalline structure sealed in vacuumed ampoules together with iron containing chemical in an oven for a period and at a temperature sufficient to allow crystal doping by Fe diffusion and replacement in selected regions of the polycrystalline or single crystalline structure. 7. The method of claim 1 , wherein the saturable absorber is formed by a thin film of Fe doped ZnS or ZnSe grown by pulsed laser deposition, plasma sputtering, or thermal evaporation on a transparent at lasing wavelength substrate made from similar or dissimilar material. 8. The method of claim 1 , wherein said saturable absorber is fabricated by hot pressing of ZnS or ZnSe powders containing iron. 9. The method of claim 1 , wherein the laser pulses comprise single-mode Q-switch pulses, each pulse having a maximum output power of 13 mJ. 10. The method of claim 1 , wherein the pulses comprise a full width half maximum (FWHM) value in the range 65 to 100 nanoseconds. 11. The method of claim 1 , wherein the laser pulses comprise 85 mJ output pulses in a multi-pulse regime. 12. The method of claim 11 , wherein the multi-pulse regime includes between 5 and 19 pulses. 13. A method for forming a saturable absorber of a 2.5 μm to 4 μm Erbium laser including a Q-switch comprising the saturable absorber selected from the group consisting of Fe doped ZnS or ZnSe that provides saturable optical behavior at a laser wavelength between the 2.5 μm and 4 μm range of the Erbium laser, the method comprising: forming a polycrystalline or single crystalline structure of a thickness sufficient for use as a microchip saturable absorber, where the polycrystalline or single crystalline structure is selected from the group consisting of ZnS and ZnSe; depositing a thin film layer of Fe on opposing faces of the polycrystalline or single crystalline structure by a method selected from the group consisting of pulsed laser deposition, cathode arc deposition, thermal evaporation, and plasma sputtering; and annealing the polycrystalline or single crystalline structure sealed in vacuumed ampoules in an oven for a period and at a temperature sufficient to allow crystal doping by Fe diffusion and replacement in selected regions of the polycrystalline or single crystalline structure.
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erbium · CPC title
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