Composition including material, methods of depositing material, articles including same and systems for depositing material

Patent metadata

Field	Value
Publication number	US-9390920-B2
Application number	US-201414563571-A
Country	US
Kind code	B2
Filing date	Dec 8, 2014
Priority date	Apr 7, 2006
Publication date	Jul 12, 2016
Grant date	Jul 12, 2016

Abstract

Methods for depositing nanomaterial onto a substrate are disclosed. Also disclosed are compositions useful for depositing nanomaterial, methods of making devices including nanomaterials, and a system and devices useful for depositing nanomaterials.

First claim

What is claimed is:

1. A method for depositing a nanomaterial onto a substrate, the method comprising:
applying a composition comprising the nanomaterial comprising a plurality of semiconductor nanocrystals to an applicator surface;
positioning a mask including a predetermined pattern of apertures comprising a predetermined shape and size on the substrate; and
contacting the applicator surface to the substrate through the apertures to apply a pattern of the nanomaterial to the substrate, wherein the applicator including the composition is dried prior to contacting the substrate.

2. A method
in accordance with claim 1 wherein the composition comprising the nanomaterial comprising a plurality of semiconductor nanocrystals is applied to the applicator surface from a transfer surface.

3. A method for depositing a nanomaterial onto a substrate, the method comprising:
applying a composition comprising the nanomaterial comprising a population of semiconductor nanocrystals to an applicator surface;
positioning a mask including a predetermined pattern of apertures comprising a predetermined shape and size on the substrate; and
contacting the applicator surface to the substrate through the apertures to apply a pattern of the nanomaterial to the substrate, wherein the applicator including the composition is dried prior to contacting the substrate.

4. A method
in accordance with claim 3 wherein the composition comprising the nanomaterial comprising a population of semiconductor nanocrystals is applied to the applicator surface from a transfer surface.

5. A method in accordance with claim 1 wherein the steps are repeated to separately deposit each of one or more additional compositions comprising semiconductor nanocrystals onto the substrate through apertures in the mask.

6. A method in accordance with claim 1 wherein the semiconductor nanocrystals comprise a core/shell structure.

7. A method in accordance with claim 1 wherein the semiconductor nanocrystals comprise a core/shell structure, wherein the core comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.

8. A method in accordance with claim 1 wherein the semiconductor nanocrystals comprise a core/shell structure, wherein the shell comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.

9. A method in accordance with claim 1 wherein the semiconductor nanocrystals include at least one ligand attached to the surface.

10. A method in accordance with claim 1 wherein the mask comprises a polyimide film, a fluorinated polyimide film, or a film including a fluorinated polyimide coating on at least one surface thereof.

11. A method in accordance with claim 3 wherein the applicator including the composition is dried prior to contacting the substrate.

12. A method in accordance with claim 3 wherein the steps are repeated to separately deposit each of one or more additional compositions comprising semiconductor nanocrystals onto the substrate through apertures in the mask.

13. A method in accordance claim 3 wherein the semiconductor nanocrystals comprise a core/shell structure.

14. A method in accordance with claim 3 wherein the semiconductor nanocrystals comprise a core/shell structure, wherein the core comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.

15. A method in accordance with claim 3 the semiconductor nanocrystals comprise a core/shell structure, wherein the shell comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.

16. A method in accordance with claim 3 wherein the semiconductor nanocrystals include at least one ligand attached to the surface.

17. A method in accordance with claim 3 wherein the mask comprises a polyimide film, a fluorinated polyimide film, or a film including a fluorinated polyimide coating on at least one surface thereof.

Assignees

• Qd Vision Inc

Inventors

• Coe-Sullivan Seth
• Anc Maria J
• Kim Leeann
• Ritter John E
• Cox Marshall
• Breen Craig
• Bulovic Vladimir
• Kymissis Ioannis
• Praino Jr Robert F
• Kazlas Peter T

Classifications

• H10P14/271

  characterised by the preparation of substrate for selective deposition · CPC title

• H10P76/20

  of masks comprising organic materials · CPC title

• H10P14/3464

  Nanotubes · CPC title

• H10P14/3462

  Nanowires · CPC title

• H10P14/3461

  Nanoparticles · CPC title