Patternable polymer block brush layers

Patent metadata

Field	Value
Publication number	US-9388268-B2
Application number	US-201113270044-A
Country	US
Kind code	B2
Filing date	Oct 10, 2011
Priority date	Oct 11, 2010
Publication date	Jul 12, 2016
Grant date	Jul 12, 2016

Abstract

Provided are novel polymer brushes that may be used in underlying buffer or imaging layers for block copolymer lithography. The novel polymer brushes include X-A-b-B and X-A-b-C block copolymer brushes, with X an anchoring group, the A block a lithographically sensitive polymer, and the C block a random copolymer. According to various embodiments, polymer block brushes for neutral and preferential layers are provided; the neutral layers non-preferential to the overlying block copolymer and the preferential layers preferential to a block of the overlying block copolymer. Also provided are novel methods of patterning polymer block brush layers as well as polymer block brush buffer and imaging layers that are directly patternable by e-beam, deep UV, extreme UV, X-ray or other lithographic methods.

First claim

What is claimed is:

1. An X-A-b-B block copolymer comprising a terminal B block; a methacrylate-containing A block, and a terminal anchoring group X, wherein the number average molecular weight of the block copolymer is less than about 30 kg/mol and the B block mole fraction in the block copolymer is between about 0.15 and 0.4, wherein the block copolymer is attached via the anchoring group to a substrate.

2. The block copolymer of claim 1 wherein the B block is selected from the group consisting of PS, P2VP, PV4P, PEO, and PDMS.

3. The block copolymer of claim 1 wherein the A block is selected from the group consisting of PMMA, PHEMA, PHEMA-TMS, PIBMA, PNPMA and PTFEMA.

4. The block copolymer of claim 1 wherein the number average molecular weight of the block copolymer is less than about 25 kg/mol.

5. The block copolymer of claim 1 wherein the number average molecular weight of the block copolymer is less than about 20 kg/mol.

6. The block copolymer of claim 1 wherein the number average molecular weight of the block copolymer is less than about 15 kg/mol.

7. The block copolymer of claim 1 wherein the anchoring group is selected from the group consisting of a hydroxyl group, a thiol group, an azide group, a carboxylic acid group, an amide group, an amine group, an epoxide group, a vinyl group, and a trichlorosilane group.

8. The block copolymer of claim 1 wherein the B block mole fraction is less than about 0.35.

9. The block copolymer of claim 1 wherein the B block mole fraction is less than about 0.3.

10. The block copolymer of claim 1 wherein the B block mole fraction is less than about 0.25.

11. The block copolymer of claim 1 wherein the B block mole fraction is less than about 0.2.

12. An X-A-b-B block copolymer comprising a terminal B block; a methacrylate-containing A block, and a terminal anchoring group X, wherein the number average molecular weight of the block copolymer is between about 10 and 80 kg/mol and the B block mole fraction in the block copolymer is between about 0.3 and 0.9 and wherein the B block is a homopolymer, wherein the block copolymer is attached via the anchoring group to a substrate.

13. The block copolymer of claim 12 wherein the B block is selected from the group consisting of PS, P2VP, PV4P, PEO, and PDMS.

14. The block copolymer of claim 12 wherein the A block is selected from the group consisting of PMMA, PHEMA, PHEMA-TMS, PIBMA, PNPMA and PTFEMA.

15. The block copolymer of claim 12 wherein the number average molecular weight of the block copolymer is less than about 30 kg/mol.

16. The block copolymer of claim 12 wherein the number average molecular weight of the block copolymer is less than about 25 kg/mol.

17. The block copolymer of claim 12 wherein B block mole fraction in the block copolymer is between about 0.3 and 0.75.

18. The block copolymer of claim 12 wherein the number average molecular weight of the block copolymer is greater than about 30 kg/mol.

19. The block copolymer of claim 12 wherein the number average molecular weight of the block copolymer is greater than about 40 kg/mol.

20. The block copolymer of claim 12 wherein the anchoring group is selected from the group consisting of a hydroxyl group, a thiol group, an azide group, a carboxylic acid group, an amide group, an epoxide group, a vinyl group, and a trichlorosilane group.

21. An X-A-b-C block copolymer comprising a terminal C block; a methacrylate-containing A block, and a terminal anchoring group X, wherein the A block is a homopolymer, wherein the C block is a B-r-D random copolymer, and wherein the number average molecular weight of the block copolymer is between about 10 and 80 kg/mol, the C block mole fraction in the block copolymer is between about 0.4 and 0.9 and the B mole fraction in the C block is between about 0.1 and 0.9, wherein the block copolymer is attached via the anchoring group to a substrate.

22. An X-A-b-C block copolymer comprising a terminal C block; a methacrylate-containing A block, and a terminal anchoring group X, wherein the A block is a homopolymer, wherein the C block is a B-r-D random copolymer, and wherein the number average molecular weight of the block copolymer is between about 10 and 80 kg/mol, the C block mole fraction in the block copolymer is between about 0.4 and 0.9 and the B mole fraction in the C block is between about 0.1 and 0.9, wherein the C block is selected from the group consisting of PS-r-PMMA, PS-r-P2VP, PS-r-P4VP, PS-r-PEO, and PS-r-PDMS.

23. The block copolymer of claim 22 wherein the block copolymer is attached via the anchoring group to a substrate.

Assignees

• Gopalan Padma
• Han Eungnak
• Wisconsin Alumni Res Found

Inventors

• Gopalan Padma
• Han Eungnak

Classifications

• G03F7/26

  Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title

• G03F7/165

  Monolayers, e.g. Langmuir-Blodgett · CPC title

• C08F2438/01

  Atom Transfer Radical Polymerization [ATRP] or reverse ATRP · CPC title

• C08F293/005 Primary

  using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title