Method of producing graphene using surfactant

US9388049B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9388049-B2
Application numberUS-201414299320-A
CountryUS
Kind codeB2
Filing dateJun 9, 2014
Priority dateJun 12, 2013
Publication dateJul 12, 2016
Grant dateJul 12, 2016

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Abstract

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A method of producing reduced graphene oxide and reduce graphene oxide produced by the method are provided. The method of producing reduced graphene oxide involves forming a graphene oxide-dispersed solution comprising graphene oxide and a surfactant that comprises at least two aromatic functional groups, reducing the graphene oxide-dispersed solution to obtain a layered structure of reduced graphene oxide comprising the at least two aromatic functional groups, and dispersing the layered structure of reduced graphene oxide in a solvent to produce a multi-layered reduced graphene oxide.

First claim

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I claim: 1. A method of producing reduced graphene oxide, the method comprising: forming a graphene oxide-dispersed solution comprising graphene oxide and a surfactant that comprises at least two aromatic functional groups; reducing the graphene oxide-dispersed solution to obtain a layered structure of reduced graphene oxide comprising the at least two aromatic functional groups; and dispersing the layered structure of reduced graphene oxide in a solvent to produce a multi-layered reduced graphene oxide. 2. The method of claim 1 , wherein the at least two aromatic functional groups each comprise a member selected from the group consisting of a naphthyl group, an anthracenyl group, a pyrenyl group, a tetrahydropyrenyl group and combinations thereof. 3. The method of claim 1 , wherein the surfactant comprises a 1,1′-bi-2-naphthol, a binol salt or a binol derivative. 4. The method of claim 1 , wherein the reducing of the graphene oxide-dispersed solution is performed by adding a reducing agent to the graphene oxide-dispersed solution. 5. The method of claim 4 , wherein the reducing agent comprises a member selected from the group consisting of sodium hydroxide, calcium hydroxide, ammonium hydroxide, sodium borohydride, hydrazine, hydrogen iodide, hydrogen sulfide, dimethyl hydrazine, hydroquinone, sulfuric acid, aluminum powder and combinations thereof. 6. The method of claim 1 , further comprising: after the dispersing of the layered structure of reduced graphene oxide in the solvent, washing and drying the layered structure of reduced graphene oxide by using an aqueous solvent, an organic solvent or a combination thereof. 7. The method of claim 6 , wherein the organic solvent comprises a member selected from the group consisting of acetone, methylethylketone, methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, ethylene glycol, poly ethylene glycol, tetrahydrofuran, dimethyl sulfoxide, dimethyl formamide, dimethyl acetamide, N-methyl pyrrolidone, hexane, cyclohexane, toluene, xylene, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, dichloromethane, acetonitrile, octadecylamine, aniline and combinations thereof. 8. A method of producing reduced graphene oxide, the method comprising: forming a reaction mixture comprising graphene oxide, a reducing agent and a surfactant comprising at least two aromatic functional groups in its molecular structure; reducing the graphene oxide dispersed in the reaction mixture to obtain reduced graphene oxide comprising the surfactant; removing the surfactant from the obtained reduced graphene oxide to obtain a multi-layered reduced graphene oxide. 9. The method of claim 8 , wherein the surfactant comprises a member selected from the group consisting of a naphthyl group, an anthracenyl group, a pyrenyl group, a tetrahydropyrenyl group and combinations thereof in its molecular structure. 10. The method of claim 8 , wherein the surfactant comprises a 1,1′-bi-2-naphthol, a binol salt or a binol derivative. 11. The method of claim 8 , wherein the reducing of the graphene oxide comprises adding a reducing agent to the reaction mixture and heating the reaction mixture to a temperature greater than 40° C. 12. The method of claim 11 , wherein the reducing agent comprises a member selected from the group consisting of sodium hydroxide, calcium hydroxide, ammonium hydroxide, sodium borohydride, hydrazine, hydrogen iodide, hydrogen sulfide, dimethyl hydrazine, hydroquinone, sulfuric acid, aluminum powder and combinations thereof. 13. The method of claim 8 , wherein the removing of the surfactant comprises dispersing a layered structure of reduced graphene oxide comprising the surfactant in an aqueous solvent, washing and drying the layered structure of reduced graphene oxide to remove the surfactant. 14. The method of claim 13 , wherein the layered reduced graphene oxide comprising the surfactant has an average interlayer distance between 13 to 15 Å before the removing of the surfactant. 15. The method of claim 13 , wherein the washing is performed using a solvent comprising a member selected from the group consisting of acetone, methylethylketone, methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, ethylene glycol, poly ethylene glycol, tetrahydrofuran, dimethyl sulfoxide, dimethyl formamide, dimethyl acetamide, N-methyl pyrrolidone, hexane, cyclohexane, toluene, xylene, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, dichloromethane, acetonitrile, octadecylamine, aniline and combinations thereof. 16. The method of claim 8 , wherein the multi-layered reduced graphene oxide has a C/O ratio of 13 or greater and an average interlayer distance between 3 to 4 Å.

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What does patent US9388049B2 cover?
A method of producing reduced graphene oxide and reduce graphene oxide produced by the method are provided. The method of producing reduced graphene oxide involves forming a graphene oxide-dispersed solution comprising graphene oxide and a surfactant that comprises at least two aromatic functional groups, reducing the graphene oxide-dispersed solution to obtain a layered structure of reduced gr…
Who is the assignee on this patent?
Univ Sungkyunkwan Res & Bus
What technology area does this patent fall under?
Primary CPC classification C01B31/043. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).