Monolayer, composite, gas separation material, filter, gas separation device and method for manufacturing composite
US-12128366-B2 · Oct 29, 2024 · US
US9387444B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9387444-B2 |
| Application number | US-201414543298-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 17, 2014 |
| Priority date | Nov 22, 2013 |
| Publication date | Jul 12, 2016 |
| Grant date | Jul 12, 2016 |
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A pressure-based chemical etch method is used to shape polymer nanopores into cones. By varying the pressure, the pore tip diameter can be controlled, while the pore base diameter is largely unaffected. The method provides an easy, low-cost approach for conically etching high density nanopores.
Opening claim text (preview).
We claim: 1. A method to fabricate a nanoporous membrane, comprising: providing a membrane having a plurality of nanopores; placing the membrane between a first solution and a second solution, wherein the membrane material has a different etch rate for the first and second solutions; and applying a differential pressure across the membrane, thereby regulating the flow of the first or second solution through the nanopores and thereby producing asymmetric etching in each of the nanopores. 2. The method of claim 1 , wherein the membrane comprises a polymer membrane. 3. The method of claim 2 , wherein the polymer comprises a polycarbonate or poly(ethylene terephthalate). 4. The method of claim 2 , wherein the polymer comprises cellulose acetate, nitrocellulose, nylon, polyethersulfone, polyester, polypropylene, or polytetrafluoroethylene. 5. The method of claim 1 , wherein the membrane comprises a metal membrane. 6. The method of claim 1 , wherein the membrane comprises a silicon membrane. 7. The method of claim 3 , wherein the first solution comprises a basic solution and the second solution comprises an acidic solution, and wherein the polymer has a higher etch rate in the basic solution. 8. The method of claim 7 , wherein the acidic solution comprises formic acid and the basic solution comprises sodium hydroxide. 9. The method of claim 1 , wherein the pressure is higher on the side of the membrane having the slower etching solution, thereby regulating flow of the slower etching solution through the nanopores and producing etched nanopores having a narrow pore tip toward the slower etching solution side and a wider pore base toward the faster etching solution side. 10. The method of claim 9 , wherein the starting nanopores are cylindrical and the etched nanopores are conical. 11. The method of claim 1 , wherein the differential pressure comprises a differential hydrostatic pressure. 12. The method of claim 1 , further comprising functionalizing the walls of the etched nanopores by elf-assembly of an aryldiazonium layer from an aryldiazonium salt. 13. The method of claim 12 , wherein the aryldiazonium salt comprises a nitrophenyl diazonium salt, 1,4-methoxybenzene-terminated diazonium salt, or trimethyl lock diazonium salt. 14. The method of claim 12 , wherein the functionalizing comprises depositing a metal or semiconductor layer on the walls of the etched nanopores, wherein the aryldiazonium layer is self-assembled on the deposited metal or semiconductor layer.
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