Technique to deposit sidewall passivation for high aspect ratio cylinder etch

Patent metadata

Field	Value
Publication number	US-9384998-B2
Application number	US-201514724574-A
Country	US
Kind code	B2
Filing date	May 28, 2015
Priority date	Dec 4, 2014
Publication date	Jul 5, 2016
Grant date	Jul 5, 2016

Abstract

Various embodiments herein relate to methods, apparatus and systems for forming a recessed feature in dielectric material on a semiconductor substrate. Separate etching and deposition operations are employed in a cyclic manner. Each etching operation partially etches the feature. Each deposition operation forms a protective coating on the sidewalls of the feature to prevent lateral etch of the dielectric material during the etching operations. The protective coating may be deposited using methods that result in formation of the protective coating along substantially the entire length of the sidewalls. The protective coating may be deposited using particular reactants and/or reaction mechanisms that result in substantially complete sidewall coating at relatively low temperatures without the use of plasma. In some cases the protective coating is deposited using molecular layer deposition techniques.

First claim

What is claimed is:

1. A method of forming an etched feature in a stack comprising a dielectric material on a semiconductor substrate, the method comprising:
(a) generating a first plasma comprising an etching reactant, exposing the substrate to the first plasma, and partially etching the feature in the stack;
(b) after (a), depositing a protective film on sidewalls of the feature by
(i) exposing the substrate to a first reactant and allowing the first reactant to adsorb onto the substrate,
(ii) exposing the substrate to a second reactant, wherein the first and second reactants react with one another to form the protective film, and
(iii) repeating (i) and (ii) in a cyclic manner until the protective film reaches a target thickness, wherein the protective film is an organic polymeric film and is deposited along substantially the entire depth of the feature;

(c) repeating (a)-(b) until the feature is etched to a final depth, wherein the protective film deposited in (b) substantially prevents lateral etch of the feature during (a), and wherein the feature has an aspect ratio of about 5 or greater at its final depth.

2. The method of claim 1 , wherein depositing the protective film in (b) is accomplished without exposing the substrate to plasma energy.

3. The method of claim 2 , wherein the first reactant comprises an acyl halide or an acid anhydride, and
wherein the second reactant comprises at least one of a diamine, a diol, a thiol, and a trifunctional compound.

4. The method of claim 3 , wherein the first reactant comprises a diacyl chloride.

5. The method of claim 4 , wherein the first reactant comprises malonyl chloride.

6. The method of claim 3 , wherein the second reactant comprises a diamine.

7. The method of claim 6 , wherein the second reactant comprises ethylenediamine.

8. The method of claim 7 , wherein the first reactant comprises malonyl chloride.

9. The method of claim 3 , wherein the first reactant comprises one or more materials selected from the group consisting of: ethanedioyl dichloride, malonyl chloride, succinyl dichloride, pentanedioyl dichloride, and maleic anhydride; and wherein the second reactant comprises one or more materials selected from the group consisting of: 1,2-ethanediamine, 1,3-propanediamine, 1,4-butanediamine, ethylene glycol, 1,3-propanediol, 1,4-butanediol, 1,2-ethanedithiol, 1,3-propanedithiol, 1,4-butanedithiol, (±)-3-amino-1,2-propanediol, glycerol, bis(hexamethylene)triamine, melamine, diethylenetriamine, (±)-1,2,4-butanetriol, cyanuric chloride, and trim ethyl aluminum.

10. The method of claim 1 , wherein the protective film comprises a polyamide and/or a polyester.

11. The method of claim 1 , wherein depositing the protective film in (b) occurs in a reaction chamber, and wherein depositing the protective film in (b) further comprises purging the reaction chamber at least once during each iteration of operation (b).

12. The method of claim 11 , wherein depositing the protective film in (b) comprises purging the reaction chamber at least twice during each iteration of operation (b), a first purge occurring between delivery of the first reactant in (i) and subsequent delivery of the second reactant in (ii), and a second purge occurring between delivery of the second reactant in (ii) and subsequent delivery of the first reactant in a subsequent iteration of (i).

13. The method of claim 1 , wherein at the final depth the feature has (i) an aspect ratio of about 20 or greater, and (ii) a maximum critical dimension that is no more than about 10% greater than the critical dimension at the bottom of the feature.

14. The method of claim 1 , wherein the feature is formed while forming a VNAND device, and wherein the stack comprises alternating layers of (i) a silicon oxide material, and (ii) a silicon nitride material or polysilicon material.

15. The method of claim 1 , wherein the feature is formed in the context of forming a DRAM device, and wherein the dielectric material comprises silicon oxide.

16. The method of claim 1 , wherein the feature has an aspect ratio of about 50 or greater at its final depth.

17. The method of claim 1 , wherein (a) and (b) are repeated at least one time, wherein (b) may or may not be performed using the same reactants during each iteration.

Assignees

• Lam Res Corp

Inventors

• Hudson Eric A
• Hausmann Dennis M
• Briggs Joseph Scott

Classifications

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P14/687

  the materials being fluorocarbon compounds, e.g. (CHxFy) n or polytetrafluoroethylene · CPC title

• H10P14/683

  carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title

• H10P50/283 Primary

  by chemical means · CPC title

• H10P50/242 Primary

  of Group IV materials · CPC title