Method for measuring reaction rate of reactive mesogen

Patent metadata

Field	Value
Publication number	US-9377410-B2
Application number	US-201414282917-A
Country	US
Kind code	B2
Filing date	May 20, 2014
Priority date	Dec 31, 2013
Publication date	Jun 28, 2016
Grant date	Jun 28, 2016

Abstract

A method for measuring a reaction rate of a reactive mesogen and an alignment layer formed thereby, the method including coating an alignment material on a substrate. The alignment material includes a backbone and a reactive mesogen connected to the backbone. The reactive mesogen includes an unsaturated bond. The alignment material is irradiated with ultraviolet light, or is heated, to form the alignment layer. A marking compound, including a thiol group is coated on the alignment layer and reacts with remaining unreacted reactive mesogen, to form a marked mesogen. An amount of the marked mesogen is detected. A reactive ratio is measured by comparing an amount of the reactive mesogen before irradiating or heating with an amount of the marked mesogen.

First claim

What is claimed is:

1. A method for measuring a reaction rate of a reactive mesogen comprising:
applying an alignment material to a substrate, the alignment material comprising alignment molecules that each comprise a backbone and a reactive mesogen connected to the backbone;
reacting the reactive mesogen to form an alignment layer, by irradiating the alignment material with ultraviolet light having a first intensity, or by heating the alignment material;
applying a marking compound comprising a thiol group to the alignment layer, the marking compound configured to react with any remaining unreacted reactive mesogen, thereby forming a marked mesogen;
detecting an amount of the marked mesogen; and
measuring a first reactive ratio by comparing an initial amount of the reactive mesogen with the detected amount of the marked mesogen.

2. The method of claim 1 , wherein the reactive mesogen comprises a photoreactive group comprising an unsaturated bond.

3. The method of claim 2 , wherein the photoreactive group comprises at least one selected from the group consisting of

4. The method of claim 1 , wherein the thiol group of the marking compound reacts with the unsaturated bond of the reactive mesogen.

5. The method of claim 1 , wherein the marking compound is formed by reacting an alkyl halide with thiourea.

6. The method of claim 1 , wherein the marked mesogen is detected using an ultraviolet-visible (UV-Vis) spectrophotometer or a photoluminescence spectroscopy device.

7. The method of claim 6 , wherein the marked mesogen has a higher fluorescence intensity than the reactive mesogen.

8. The method of claim 7 , wherein the marking compound comprises at least one selected from the group consisting of

9. The method of claim 8 , wherein an absorbance of the marked mesogen is greater than an absorbance of the reactive mesogen at a wavelength of at least 370 nm, or a fluorescence intensity of the marked mesogen is greater than a fluorescence intensity of the reactive mesogen, at a wavelength of at least 410 nm.

10. The method of claim 1 , wherein the marked mesogen is detected using a Fourier transform infrared (FT-IR) spectrometer.

11. The method of claim 10 , wherein an absorption wavelength of the marked mesogen and an absorption wavelength of the reactive mesogen are different from each other.

12. The method of claim 11 , wherein the marking compound comprises

13. The method of claim 12 , wherein a maximum absorption wavelength of the marked mesogen is in a range of about 2,200 cm −1 to about 2,300 cm −1 .

14. The method of claim 1 , wherein the marked mesogen is detected using an X-ray photoelectron spectrometer.

15. The method of claim 14 , wherein a wavelength corresponding to a bonding energy of the marked mesogen and a wavelength corresponding to a bonding energy of the reactive mesogen are different from each other.

16. The method of claim 15 , wherein the marked compound comprises at least one selected from the group consisting of HS—(CH 2 ) n —CF 3 and HS—(CF 2 ) n —CF 3 .

17. The method of claim 16 , wherein the wavelength of the bonding energy of the marked mesogen has a wavelength of a bonding energy in a range of about 690 eV to about 700 eV.

18. The method of claim 1 , further comprising:
applying the alignment material to a second substrate;
irradiating the alignment material on the second substrate with ultraviolet light having a second intensity that is higher than the first intensity, to form a second alignment layer;
applying the marking compounds to the second alignment layer to form second marked mesogens;
detecting an amount of the second marked mesogens;
measuring a second reactive ratio by comparing an amount of the reactive mesogen before the second alignment layer is formed with the detected amount of the second reactive mesogens; and
comparing the reactive ratio and the second reactive ratio, to determine an ultraviolet intensity that results in the highest reactive ratio.

19. The method of claim 1 , wherein the initial amount of the reactive mesogen is determined by:
applying an equal amount of the alignment material to a second substrate;
reacting the alignment material on the second substrate with the marking compound to form a beginning marked mesogen; and
detecting an amount of the beginning marked mesogen to determine the initial amount of the reactive mesogen.

Assignees

• Samsung Display Co Ltd

Inventors

• Lim Ho
• Kim Tae-Min

Classifications

• G01N2021/6439

  with indicators, stains, dyes, tags, labels, marks · CPC title

• G01N21/643

  non-biological material · CPC title

• G01N21/77 Primary

  by observing the effect on a chemical indicator · CPC title

• G01N2021/755

  Comparing readings with/without reagents, or before/after reaction · CPC title

• G01N21/75 Primary

  Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated (systems in which material is burnt in a flame or plasma G01N21/72, G01N21/73) · CPC title