Thermal barrier material exhibiting manufacturability, high toughness and low thermal conductivity
US-2024174574-A1 · May 30, 2024 · US
US9376744B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9376744-B2 |
| Application number | US-201213468388-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 10, 2012 |
| Priority date | May 16, 2011 |
| Publication date | Jun 28, 2016 |
| Grant date | Jun 28, 2016 |
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A phase difference element has a transparent substrate and a birefringent film with tantalum oxide and titanium oxide obliquely deposited on one surface of the transparent substrate. The birefringent film has a first photorefractive film and a second photorefractive film laminated to each other and having different oblique deposition directions. The ratio of titanium atoms to the total of titanium atoms and tantalum atoms in the birefringent film is 4.0 atomic % or higher to 30 atomic % or lower.
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The invention claimed is: 1. A phase difference element, comprising a transparent substrate and a birefringent film in which tantalum oxide and titanium oxide are obliquely deposited on one surface of the transparent substrate, wherein: the birefringent film comprises a plurality of first photorefractive films and second photorefractive films that are directly and alternately laminated to each other and have different oblique deposition directions, a ratio of titanium atoms to a total of titanium atoms and tantalum atoms in the birefringent film is 4.0 atomic % or higher and 30 atomic % or lower, the transparent substrate comprises a plurality of parallel grooves formed in the surface on which the tantalum oxide and titanium oxide are obliquely deposited, each of the first photorefractive films and each of the second photorefractive films comprises tantalum oxide and titanium oxide, and each of the first photorefractive films is a single layer and each of the second photoreflective films is a single layer. 2. A phase difference element, comprising a transparent substrate and a birefringent film, the birefringent film including a plurality of first photorefractive films and second photorefractive films that are directly and alternately laminated to each other, each of the plurality of first photorefractive films being grown on the transparent substrate or one of the second photorefractive films along a first oblique direction from which a material vapor enters, the material vapor being emitted from a deposition material containing Ta 2 O 5 and TiO 2 and going straight ahead, and each of the plurality of second photorefractive films being grown on one of the first photorefractive films along a second oblique direction from which the material vapor enters, the second oblique direction being different from the first oblique direction, wherein: each of the first photorefractive films and each of the second photorefractive films comprises tantalum oxide and titanium oxide, a ratio of Ti to a total of Ta and Ti, (Ti/(Ta+Ti)), of the first and the second photorefractive films is 4.0 atomic % or higher and 30 atomic % or lower, the transparent substrate comprises a plurality of parallel grooves formed in the surface on which the tantalum oxide and titanium oxide are obliquely deposited, and each of the first photoreflective films is a single layer and each of the second photoreflective films is a single layer. 3. A method for producing a phase difference element, comprising: obliquely depositing Ta 2 O 5 and TiO 2 on a transparent substrate in a first oblique direction to form a first photorefractive film, and obliquely depositing Ta 2 O 5 and TiO 2 on the first photorefractive film in a second oblique direction to form a second photorefractive film, the second oblique direction being different from the first oblique direction, and forming a birefringent film comprising a plurality of first photorefractive films and second photorefractive films that are directly and alternately laminated to each other, wherein: Ta 2 O 5 and TiO 2 are obliquely deposited such that a ratio of titanium atoms to a total of titanium atoms and tantalum atoms in the birefringent film is 4.0 atomic % or higher to 30 atomic % or lower, the transparent substrate comprises a plurality of parallel grooves formed in the surface on which the Ta 2 O 5 and TiO 2 are obliquely deposited, each of the first photorefractive films and each of the second photorefractive films comprises tantalum oxide and titanium oxide, and each of the first photorefractive films is a single layer and each of the second photorefractive films is a single layer. 4. The phase difference element according to claim 1 , wherein the ratio of titanium atoms to the total of titanium atoms and tantalum atoms in the birefringent film is 10 atomic % or higher and 20 atomic % or lower. 5. The phase difference element according to claim 1 , wherein the transparent substrate is a quartz glass substrate. 6. The phase difference element according to claim 1 , wherein a component parallel to a front surface of the transparent substrate in the first oblique direction and a component parallel to the front surface of the transparent substrate in the second oblique direction are directed to respective directions opposite to each other. 7. A display device comprising: the phase difference element according to claim 1 ; and a liquid crystal, wherein light passing through the liquid crystal and the phase difference element is emitted outside. 8. The phase difference element according to claim 2 , wherein the ratio of Ti to the total of Ta and Ti, (Ti/(Ta+Ti)), of the first and the second photorefractive films is 10 atomic % or higher and 20 atomic % or lower. 9. The method for producing a phase difference element according to claim 3 , comprising, after forming the birefringent film, performing an annealing treatment.
Opto-optical modulation, i.e. control of one light beam by another light beam, not otherwise provided for in this subclass · CPC title
photorefractive · CPC title
of refractory metals or yttrium · CPC title
Mechanical treatment (involving removal of material C23C14/588) · CPC title
Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001) · CPC title
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