Method for Forming an Oxide Coated Substrate
US-2015343434-A1 · Dec 3, 2015 · US
US9376332B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9376332-B2 |
| Application number | US-201313840859-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 15, 2013 |
| Priority date | Mar 15, 2013 |
| Publication date | Jun 28, 2016 |
| Grant date | Jun 28, 2016 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Described herein are elements comprising a p-type semiconductor comprising mixed valence oxide compounds and an n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands wherein the semiconductor types are in ionic communication with each other. The elements enhance photocatalytic activity.
Opening claim text (preview).
What is claimed is: 1. An element comprising: at least one p-type semiconductor comprising mixed valence oxide compounds, the compound having p-type conduction bands and p-type valence bands; and at least one n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands, the n-type semiconductor in ionic charge communication with the mixed valence oxide compounds; and wherein the at least one n-type semiconductor is a titanium oxide having a valence band controlled through doping. 2. The element of claim 1 , further comprising a noble metal in ionic charge communication with the mixed valence oxide compounds. 3. The element of claim 2 , wherein the noble metal is selected from rhodium, ruthium, palladium, silver, osmium, platinum and gold. 4. The element of claim 2 , wherein the noble metal is loaded onto the at least one n-type semiconductor. 5. The element of claim 1 , wherein the mixed valence oxide compounds comprise pairs selected from copper(I) and copper(II); cobalt(II) and cobalt (III); Mn(II) and Mn(III); Fe(II) and Fe(III) and Ir(III) and Ir(IV). 6. The element of claim 1 , wherein the at least one p-type semiconductor is loaded onto the at least one n-type semiconductor. 7. The element of claim 1 , wherein the mixed valence oxide compounds are substantially uniformly dispersed onto the at least one n-type semiconductor. 8. The element of claim 1 , wherein the mixed valence oxide compounds have a particle size of 100 nm or less. 9. The element of claim 5 , wherein the copper(I) and copper(II) compound is a Cu x O compound. 10. The element of claim 9 , wherein the Cu x O compound is chemically valence controlled. 11. The element of claim 5 , wherein the ratio of copper(I) and copper(II) is between 10:90 to 90:10. 12. The element of claim 1 , wherein the p-type semiconductor is 0.001 to 10 wt % of the element and the p-type semiconductor is 90 to 99.999 wt % of the element. 13. An element comprising: at least one p-type semiconductor comprising mixed valence oxide compounds, the compound having p-type conduction bands and p-type valence bands; and at least one n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands, the n-type semiconductor in ionic charge communication with the mixed valence oxide compounds; and wherein the at least one n-type semiconductor is Al 2-x In x TiO 5 wherein 0<x<2. 14. An element comprising: at least one p-type semiconductor comprising mixed valence oxide compounds, the compound having p-type conduction bands and p-type valence bands; and at least one n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands, the n-type semiconductor in ionic charge communication with the mixed valence oxide compounds; and wherein the at least one n-type semiconductor is Zr 1-y Ce y TiO 4 wherein 0<y<1. 15. The element of claim 1 , wherein the at least one n-type semiconductor is a titanium oxide doped with an atom selected from N, C or both. 16. An element comprising: at least one p-type semiconductor comprising mixed valence oxide compounds, the compound having p-type conduction bands and p-type valence bands; and at least one n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands, the n-type semiconductor in ionic charge communication with the mixed valence oxide compounds; and wherein the at least one n-type semiconductor is a titanium oxide comprising a compound represented by the formula (Ti 1-r M r )(O 2-s-t C s N t ), wherein: M is selected from the group consisting of Sn, Ni, Sr, Ba, Fe, Bi, V, Mo, W, Zn, Cu, and combinations thereof; r is in the range of 0 to 0.25; s is in the range of 0.001 to 0.1; and t is in the range of 0.001 to 0.1. 17. An element comprising: at least one p-type semiconductor comprising mixed valence oxide compounds, the compound having p-type conduction bands and p-type valence bands; and at least one n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands, the n-type semiconductor in ionic charge communication with the mixed valence oxide compounds; and wherein at least one n-type semiconductor is (Ti 0.99 Sn 0.01 )(O 2-s-t C s N t ), (Ti 0.97 Sn 0.03 )(O 2-s-t C s N t ), (Ti 0.95 Sn 0.05 )(O 2-s-t C s N t ), (Ti 0.90 Sn 0.10 )(O 2-s-t C s N t ), (Ti 0.85 Sn 0.15 )(O 2-s-t C s N t ), (Ti 0.985 Ni 0.015 )(O 2-s-t C s N t ), (Ti 0.98 Ni 0.02 )(O 2-s-t C s N t ), (Ti 0.97 Ni 0.03 )(O 2-s-t C s N t ), (Ti 0.99 Sr 0.01 )(O 2-s-t C s N t ), (Ti 0.97 Sr 0.03 )(O 2-s-t C s N t ), (Ti 0.95 Sr 0.05 )(O 2-s-t C s N t ), (Ti 0.97 Ba 0.03 )(O 2-s-t C s N t ), (Ti 0.95 Ba 0.05 )(O 2-s-t C s N t ), (Ti 0.94 Sn 0.05 Fe 0.01 )(O 2-s-t C s N t ), (Ti 0.94 Sn 0.05 Ni 0.01 )(O 2-s-t C s N t ), (Ti 0.99 Fe 0.01 )(O 2-s-t C s N t ), (Ti 0.95 Zn 0.05 )(O 2-s-t C s N t ), (Ti 0.77 Sn 0.15 Cu 0.08 )(O 2-s-t C s N t ), (Ti 0.85 Zn 0.15 )(O 2-s-t C s N t ), (Ti 0.90 Bi 0.10 )(O 2-s-t C s N t ), (Ti 0.996 V 0.004 )(O 2-s-t C s N t ), (Ti 0.984 V 0.016 )(O 2-s-t C s N t ), (Ti 0.970 V 0.03 )(O 2-s-t C s N t ), (Ti 0.997 Mo 0.003 )(O 2-s-t C s N t ), (Ti 0.98 Mo 0.016 )(O 2-s-t C s N t ), (Ti 0.957 Mo 0.043 )(O 2-s-t C s N t ), (Ti 0.97 W 0.03 )(O 2-s-t C s N t ), (Ti 0.95 W 0.05 )(O 2-s-t C s N t ), (Ti 0.996 V 0.004 )(O 2-s-t C s N t ), (Ti 0.984 V 0.016 )(O 2-s-t C s N t ) or (Ti 0.970 V 0.03 )(O 2-s-t C s N t ). 18. The element of claim 16 , further comprising a noble metal in ionic charge communication with the mixed valence oxide compounds. 19. The element of claim 18 , wherein the noble metal is selected from rhodium, ruthium, palladium, silver, osmium, platinum and gold. 20. The element of claim 18 , wherein the noble metal is loaded onto the at least one n-type semiconductor. 21. The element of claim 16 , wherein the mixed valence oxide compounds comprise pairs selected from copper(I) and copper(II); cobalt(II) and cobalt(III); Mn(II) and Mn(III); Fe(II) and Fe(III) and Ir(III) and Ir(IV). 22. The element of claim 16 , wherein the at least one p-type semiconductor is loaded onto the at least one n-type semiconductor. 23. The element of claim 16 , wherein the mixed valence oxide compounds are substantially uniformly dispersed onto the at least one n-type semiconductor. 24. The element of claim 16 , wherein the mixed valence oxide compounds have a particle size of 100 nm or less. 25. The element of claim 21 , wherein the copper(I) and copper(II) compound is a Cu x O compound. 26. The element of claim 25 , wherein the Cu x O compound is chemically valence controlled. 27. The element of claim 21 , wherein the ratio of copper(I) and copper(II) is between 10:90 to 90:10. 28. The element of claim 16 , wherein the p-type semiconductor is 0.001 to 10 wt % of the element and the p-type semiconductor is 90 to 99.999 wt % of the element. 29. The element of claim 17 , further comprising a noble metal in ionic charge communication with the mixed valence oxide compounds. 30. The element of claim 29 , wherein the noble metal is selected from rhodium, ruthium, palladium, silver, osmium, platinum and gold. 31. The element of claim 29 , wherein the noble metal is loaded onto the at least one n-type semiconductor. 32. The element of claim 17 , wherein the mixed va
Nickel · CPC title
Dyes; Colorants; Fluorescent agents · CPC title
with ultraviolet light · CPC title
Tungsten · CPC title
of germanium, tin or lead · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.