US9376322B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9376322-B2 |
| Application number | US-201514851863-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 11, 2015 |
| Priority date | Feb 12, 2008 |
| Publication date | Jun 28, 2016 |
| Grant date | Jun 28, 2016 |
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There is provided colloidal silica particles comprising at least one polyvalent metal element M selected from a group consisting of iron, aluminum, zinc, zirconium, titanium, tin, and lead in an average content of 0.001 to 0.02 in terms of an M/Si molar ratio, and having an average primary particle diameter of 5 to 40 nm, wherein the content of the polyvalent metal element M present in an outermost layer of the colloidal particles is 0 to 0.003 atom per square nanometer (nm 2 ) of a surface area of the colloidal particles; and a silica sol that the colloidal silica particles are dispersed in an organic solvent, a silica sol that the colloidal silica particles are dispersed in a polymerizable compound, and a silica sol that the colloidal silica particles are dispersed in a dicarboxylic anhydride.
Opening claim text (preview).
The invention claimed is: 1. A process for producing colloidal silica particles, the process comprising (I) and (II): (I): adding an acid to a silica sol including colloidal silica particles so that the silica sol has a pH of 0 to 2.0, the colloidal silica particles including at least one polyvalent metal element M selected from a group consisting of iron, aluminum, zinc, zirconium, titanium, tin, and lead in an average content of 0.001 to 0.02 in terms of an M/Si molar ratio, and having an average primary particle diameter of 5 to 40 nm; and aging the sol at 0 to 40° C. for 0.5 to 100 hours; and (II): contacting the acidic silica sol obtained in (I) with a strongly acidic cation-exchange resin in the hydrogen form at a pH of 0 to 2.0, and further contacting the sol with a strongly basic anion-exchange resin in the hydroxy form, wherein the content of the polyvalent metal element M present in an outermost layer of the colloidal silica particles is 0 to 0.003 atom per square nanometer (nm 2 ) of a surface area of the colloidal particles. 2. The process according to claim 1 , wherein the content of the polyvalent metal element M present in an outermost layer of the colloidal silica particles is 0 to less than 0.001 atom per square nanometer (nm 2 ) of a surface area of the colloidal particles. 3. The process according to claim 1 , wherein the colloidal silica particles are non-porous.
Colloidal silica, e.g. dispersions, gels, sols · CPC title
After-treatment of sols ({preparation of hydrosols or aqueous dispersions from hydroorganosols, organosols or dispersions in an organic medium C01B33/141}; preparation of hydroorganosols, organosols or dispersions in an organic medium from hydrosols {or aqueous dispersions} C01B33/145) · CPC title
Nanometer sized, i.e. from 1-100 nanometer · CPC title
Preparation of hydroorganosols, organosols or dispersions in an organic medium · CPC title
Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title
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