Mask for depositing a thin film and a thin film deposition method using the same

Patent metadata

Field	Value
Publication number	US-9375752-B2
Application number	US-201414151211-A
Country	US
Kind code	B2
Filing date	Jan 9, 2014
Priority date	Jun 14, 2013
Publication date	Jun 28, 2016
Grant date	Jun 28, 2016

Abstract

A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern pars to a plurality of positions to modify the deposition pattern.

First claim

What is claimed is:

1. A deposition mask, comprising
a frame;
pattern bars disposed on the frame, the pattern bars configured to form a deposition pattern, wherein each end of each pattern bar is coupled to a rotational support part, wherein each rotational support part is connected to one pattern bar of the pattern bars, wherein each rotational support part is configured to rotate the one pattern bar independently of all other pattern bars, and wherein each rotational support part is disposed in an internal surface of the frame facing an opening in a center of the frame; and
wherein the pattern bars comprise first pattern bars disposed in a first direction; and second pattern bars disposed in a second direction crossing the first direction; and
a pattern modification mechanism configured to move the pattern bars to modify the deposition pattern.

2. The mask of claim 1 , wherein the pattern modification mechanism comprises:
an actuator configured to rotate each of the pattern bars.

3. The mask of claim 2 , wherein the actuator comprises a micro electromechanical system (MEMS).

4. The mask of claim 2 , wherein a space between the pattern bars is square.

5. A deposition mask, comprising:
a frame including pattern bars configured to be adjusted for a plurality of deposition patterns, wherein each end of each pattern bar is coupled to a rotational support part, wherein each rotational support part is connected to one pattern bar of the pattern bars, wherein each rotational support part is configured to move the one pattern bar independently of all other patterns bars, and wherein each rotational support part is disposed in an internal surface of the frame facing an opening in a center of the frame; and
wherein the pattern bars comprise first pattern bars disposed in a first direction; and second pattern bars disposed in a second direction, the second direction crosses the first direction; and
a pattern modification mechanism configured to adjust the position of the pattern bars to form the plurality of deposition patterns.

6. The deposition mask of claim 5 , wherein the pattern modification mechanism comprises an actuator configured to rotate the pattern bars.

7. The deposition mask of claim 6 , wherein the actuator comprises a micro electromechanical system (MEMS).

8. The deposition mask of claim 5 , wherein the rotational support parts enable the pattern bars to be rotated.

9. The deposition mask of claim 5 , wherein the pattern modification mechanism is configured to adjust a plurality of the pattern bars simultaneously.

10. The deposition mask of claim 5 , wherein the pattern modification mechanism is configured to adjust a plurality of the pattern bars individually.

Assignees

• Samsung Display Co Ltd

Inventors

• Kim Woong-Sik

Classifications

• C23C14/042 Primary

  using masks · CPC title

• B05B12/29 Primary

  with adjustable size · CPC title

• B05D1/32 Primary

  using means for protecting parts of a surface not to be coated, e.g. using stencils, resists · CPC title

• B05B15/0481

  Operations & Transport · mapped topic

• H05B33/10 Primary

  Apparatus or processes specially adapted to the manufacture of electroluminescent light sources · CPC title