Polymer pen lithography

Patent metadata

Field	Value
Publication number	US-9372397-B2
Application number	US-98927909-A
Country	US
Kind code	B2
Filing date	Apr 25, 2009
Priority date	Apr 25, 2008
Publication date	Jun 21, 2016
Grant date	Jun 21, 2016

Abstract

The disclosure relates to methods of printing indicia on a substrate using a tip array comprised of elastomeric, compressible polymers. The tip array can be prepared using conventional photolithographic methods and can be tailored to have any desired number and/or arrangement of tips. Numerous copies (e.g., greater than 15,000, or greater than 11 million) of a pattern can be made in a parallel fashion in as little as 40 minutes.

First claim

What is claimed is:

1. A method for sub-micron scale printing of indicia on a substrate surface, comprising:
coating a tip array with a patterning composition, the tip array comprising a compressible elastomeric polymer comprising a plurality of non-cantilevered tips each having a radius of curvature of less than about 1 μm and a common substrate comprising a compressible elastomeric polymer, the tip array and the common substrate mounted onto a rigid support and the tip array, common substrate, and rigid support together being at least translucent;
contacting the substrate surface for a first contacting period of time and at a first contacting pressure with all or substantially all of the coated tips of the array to deposit the patterning composition onto the substrate surface and form substantially uniform indicia with all or substantially all of said coated tips, the indicia having a dot size (or line width) of less than 1 μm.

2. The method of claim 1 , wherein the tip array comprises a plurality of tips arranged in a regular periodic pattern.

3. The method of claim 1 , wherein each tip has a radius of curvature of less than about 0.2 μm.

4. The method of claim 1 , wherein the polymer has a compression modulus of about 10 MPa to about 300 MPa.

5. The method of claim 1 , wherein the polymer is crosslinked.

6. The method of claim 1 , wherein the polymer comprises polydimethylsiloxane (PDMS).

7. The method of claim 6 , wherein the PDMS comprises a trimethylsiloxy terminated vinylmethylsiloxane-dimethysiloxane copolymer, a methylhydrosiloxane-dimethylsiloxane copolymer, or a mixture thereof.

8. The method of claim 1 , wherein each tip of the tip array is identically-shaped.

9. The method of claim 8 , wherein the tip shape is pyramidal.

10. The method of claim 1 , wherein the coating comprises adsorbing or absorbing the patterning composition onto the tip array.

11. The method of claim 1 , further comprising moving the tip array, the substrate surface, or both and repeating the contacting step for a second contacting period of time and at a second contacting pressure.

12. The method of claim 11 , wherein the first contacting period of time and the second contacting period of time are equal.

13. The method of claim 11 , wherein the first contacting period of time and the second contacting period of time are different.

14. The method of claim 11 , wherein the first contacting pressure and the second contacting pressure are the same.

15. The method of claim 11 , wherein the first contacting pressure and the second contacting pressure are different.

16. The method of claim 11 , comprising moving the tip array and holding the substrate surface stationary.

17. The method of claim 11 , comprising holding the tip array stationary and moving the substrate surface.

18. The method of claim 11 , comprising moving both the tip array and the substrate surface.

19. The method of claim 1 , further comprising controlling a z-piezo of a piezo scanner upon which the substrate or the tip array is mounted to control the contacting pressure.

20. The method of claim 1 , comprising limiting lateral movement between the tip array and the substrate to form indicia comprising dots.

21. The method of claim 20 , comprising controlling the contacting period of time, the contacting pressure, or both to form the dots with a diameter in a range of about 10 nm to about 500 μm.

22. The method of claim 1 , comprising controlling lateral movement between the tip array and the substrate surface during contacting and/or between one or more sets of contacting and depositing steps to form indicia comprising one or more of lines and a preselected pattern.

23. The method of claim 1 , comprising selecting for the tip array a compressible polymer which is Hookean under pressures of 10 MPa to 300 MPa.

24. The method of claim 1 , comprising contacting each tip of the tip array with the substrate surface.

25. The method of claim 1 , wherein the indicia have a dot size (or line width) of less than 900 nm.

26. The method of claim 1 , wherein the indicia have a dot size (or line width) of less than 100 nm.

27. The method of claim 1 , further comprising leveling the tips of the tip array with respect to the substrate surface by
backlighting the tip array with incident light to cause internal reflection of the incident light from the internal surfaces of the tips;
bringing the tips of the tip array and the substrate surface together along a z-axis up to a point of contact between a subset of the tips with the substrate surface, contact indicated by increased intensity of reflected light from the subset of tips in contact with the substrate surface, whereas no change in the intensity of reflected light from other tips indicates non-contacting tips; and
tilting one or both of the tip array and the substrate surface with respect to the other in response to differences in intensity of the reflected light from the internal surfaces of the tips, to achieve contact between the substrate surface and non-contacting tips, wherein said tilting is performed one or more times along x-, y-, and/or z-axes.

28. The method of claim 1 , further comprising leveling the tips of the tip array with respect to the substrate surface by
backlighting the tip array with incident light to cause internal reflection of the incident light from the internal surfaces of the tips;
bringing the tips of the tip array and the substrate surface together along a z-axis to cause contact between the tips of the tip array and the substrate surface;
further moving one or both of the tip array and the substrate towards the other along the z-axis to compress a subset of the tips, whereby the intensity of the reflected light from the tips increases as a function of the degree of compression of the tips against the substrate surface; and
tilting one or both of the tip array and the substrate surface with respect to the other in response to differences in intensity of the reflected light from internal surfaces of the tips, to achieve substantially uniform contact between the substrate surface and tips, wherein said tilting is performed one or more times along x-, y- and/or z-axes.

29. The method of claim 1 , wherein the tip array has a pen density of 100/cm 2 to 250,000/cm 2 .

30. The method of claim 1 , wherein the tip array has 1000 tips to 15 million tips.

31. The method of claim 30 , wherein the tip array has greater than 1 million tips.

32. The method of claim 1 , wherein the indicia have a dot size (or line width) of less than 600 nm.

Assignees

• Mirkin Chad A
• Huo Fengwei
• Zheng Zijian
• Zheng Gengfeng
• Univ Northwestern

Inventors

• Mirkin Chad A
• Huo Fengwei
• Zheng Zijian
• Zheng Gengfeng

Classifications

• Y10S977/874

  Probe tip array · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• Y10S977/888

  Shaping or removal of materials, e.g. etching · CPC title

• Y10S977/856

  including etching/cutting · CPC title

• Y10S977/887

  Nanoimprint lithography, i.e. nanostamp · CPC title