Method of megasonic cleaning of an object

Patent metadata

Field	Value
Publication number	US-9370805-B2
Application number	US-201213618521-A
Country	US
Kind code	B2
Filing date	Sep 14, 2012
Priority date	Jun 3, 2010
Publication date	Jun 21, 2016
Grant date	Jun 21, 2016

Abstract

A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage.

First claim

What is claimed is:

1. An apparatus for megasonic cleaning, comprising:
a bubble generating part configured to generate microcavitation bubbles in a cleaning solution by applying an electromotive force to a cleaning solution using a megasonic energy, the microcavitation bubbles including stable and unstable bubbles, the bubble generating part including a container having an inlet line through which the cleaning solution enters the bubble generating part and an outlet line through which the cleaning solution passes;
a cleaning part configured to receive the cleaning solution including at least some of the stable bubbles from the outlet line, the cleaning part further configured to clean an object using the cleaning solution including the at least some of the stable bubbles; and
a loading part configured to support the object in the cleaning part,
wherein the outlet line of the container extends to an inner part of the cleaning part, and has a length and a diameter such that among the stable and unstable bubbles generated by the bubble generating part, the stable bubbles are predominantly transferred to the inner part of the cleaning part through the outlet line, and
the bubble generating part includes a first piezoelectric transducer, the first piezoelectric transducer configured to generate the microcavitation bubbles, and the cleaning part includes a second piezoelectric transducer, the second piezoelectric transducer configured to oscillate the stable bubbles.

2. The apparatus of claim 1 , wherein the bubble generating part is provided one of within the cleaning part and outside the cleaning part.

3. The apparatus of claim 2 , wherein the bubble generating part is provided in a separate room within the cleaning part and the cleaning part includes a tank including the cleaning solution and a first piezoelectric transducer.

4. The apparatus of claim 3 , wherein the loading part is provided in the cleaning part.

5. The apparatus of claim 1 , wherein the inlet line through which the cleaning solution enters the bubble generating part is extended from an outer portion of the cleaning part to a first inner portion of the container of the bubble generating part, and the outlet line through which the cleaning solution passes is extended from a second inner portion of the container of the bubble generating part to the cleaning part.

6. The apparatus of claim 1 , wherein the first piezoelectric transducer is provided in one of a parallel and perpendicular direction with respect to an extended direction of the inlet line.

7. The apparatus of claim 1 , wherein the second piezoelectric transducer is provided in one of a parallel and perpendicular direction with respect to an extended direction of the outlet line.

8. The apparatus of claim 1 , wherein the loading part makes one of a horizontal rotation and a horizontal and rectilinear movement.

9. The apparatus of claim 1 , wherein the bubble generating part is provided vertically above the cleaning part.

10. An apparatus for megasonic cleaning, comprising:
a bubble generating part configured to generate microcavitation bubbles in a cleaning solution by applying an electromotive force to a cleaning solution using a megasonic energy, the microcavitation bubbles including stable and unstable bubbles, the bubble generating part including a container having an inlet line through which the cleaning solution enters the bubble generating part and an outlet line through which the cleaning solution passes;
a cleaning part configured to receive the cleaning solution including at least some of the stable bubbles from the outlet line, the cleaning part further configured to clean an object using the cleaning solution including the at least some of the stable bubbles; and
a loading part configured to support the object in the cleaning part,
wherein the outlet line of the container extends to an inner part of the cleaning part, and has a length and a diameter such that among the stable and unstable bubbles generated by the bubble generating part, the stable bubbles are predominantly transferred to the inner part of the cleaning part through the outlet line, and
wherein the bubble generating part is provided outside the cleaning part and the cleaning part includes a first piezoelectric transducer between the bubble generating part and the loading part.

11. The apparatus of claim 10 , wherein the first piezoelectric transducer is provided on an outer wall of the bubble generating part that faces the loading part.

12. The apparatus of claim 10 , further comprising:
a particle outlet line configured to drain out the cleaning solution including particles, the particle outlet line being provided along an outer wall of the cleaning part.

13. An apparatus for megasonic cleaning, comprising:
a bubble generating part configured to generate microcavitation bubbles in a cleaning solution by applying an electromotive force to a cleaning solution using a megasonic energy, the microcavitation bubbles including stable and unstable bubbles, the bubble generating part including a container having an inlet line through which the cleaning solution enters the bubble generating part and an outlet line through which the cleaning solution passes;
a cleaning part configured to receive the cleaning solution including at least some of the stable bubbles from the outlet line, the cleaning part further configured to clean an object using the cleaning solution including the at least some of the stable bubbles; and
a loading part configured to support the object in the cleaning part, and
wherein the outlet line of the container extends to an inner part of the cleaning part, and has a length and a diameter such that among the stable and unstable bubbles generated by the bubble generating part, the stable bubbles are predominantly transferred to the inner part of the cleaning part through the outlet line,
wherein the bubble generating part includes a first piezoelectric transducer, the first piezoelectric transducer configured to generate the microcavitation bubbles having the stable and unstable bubbles, and
wherein the cleaning part includes a second piezoelectric transducer and a third piezoelectric transducer, the second piezoelectric transducer on one side of the object, the third piezoelectric transducer on another side of the object, the second and third piezoelectric transducers configured to oscillate the stable bubbles to clean the object.

Assignees

• Choi Jae-Hyuck
• Kim Won-Jung
• Kim Ho-Young
• Ko Hyung-Ho
• Oh Jong-Keun
• Jeon Chan-Uk
• Park Keun-Hwan
• Samsung Electronics Co Ltd

Inventors

• Choi Jae-Hyuck
• Kim Won-Jung
• Kim Ho-Young
• Ko Hyung-Ho
• Oh Jong-Keun
• Jeon Chan-Uk
• Park Keun-Hwan

Classifications

• H10P72/0416

  with the semiconductor substrates being dipped in baths or vessels · CPC title

• H10P70/20

  Cleaning during device manufacture · CPC title

• G03F1/82

  Auxiliary processes, e.g. cleaning or inspecting · CPC title

• B08B3/12 Primary

  by sonic or ultrasonic vibrations · CPC title

• H01L21/67057

  Electricity · mapped topic