Electric/magnetic field guided acid profile control in a photoresist layer

Patent metadata

Field	Value
Publication number	US-9366966-B2
Application number	US-201414478403-A
Country	US
Kind code	B2
Filing date	Sep 5, 2014
Priority date	Jul 10, 2014
Publication date	Jun 14, 2016
Grant date	Jun 14, 2016

Abstract

Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. In one example, a method of processing a substrate, the method includes applying a photoresist layer comprising a photoacid generator to a substrate, exposing a first portion of the photoresist layer unprotected by a photomask to a radiation light in a lithographic exposure process, and applying an electric field or a magnetic field to alter movement of photoacid generated from the photoacid generator substantially in a vertical direction.

First claim

What is claimed is:

1. A method of processing a substrate, the method comprising:
applying a photoresist layer comprising a photoacid generator to a substrate;
exposing a first portion of the photoresist layer unprotected by a photomask to a radiation light in a lithographic exposure process; and
applying an electric field and a magnetic field to alter movement of photoacid generated from the photoacid generator substantially in a vertical direction.

2. The method of claim 1 , wherein the electric field and the magnetic field is applied to the photoresist layer during the lithographic exposure process.

3. The method of claim 1 , wherein applying the photoresist layer further comprises:
performing a pre-exposure baking process to the photoresist layer disposed on the substrate, wherein the electric field and the magnetic field is applied to the photoresist layer during the pre-exposure baking process.

4. The method of claim 1 , wherein exposing portions of the photoresist layer further comprises:
performing a post-exposure baking process to the photoresist layer disposed on the substrate after the lithographic exposure process, wherein the electric field and the magnetic field is applied to the photoresist layer during the post-exposure baking process.

5. The method of claim 1 , wherein applying the electric field and the magnetic field further comprises:
simultaneously applying electric field and the magnetic field to the photoresist layer.

6. The method of claim 1 , wherein applying the electric field and the magnetic field further comprises:
controlling photoacid generated in the first portion of the photoresist layer in a horizontal direction defined in a horizontal plane interfaced with a second portion of the photoresist layer protected by the photomask during the lithographic exposure process.

7. The method of claim 1 , wherein applying the electric field and the magnetic field further comprises:
controlling photoacid generated in the first portion of the photoresist layer in a circular direction defined in a plane parallel with a planar surface of the substrate.

8. The method of claim 1 , the electric field applied at the photoresist layer has a strength between about 0.1 MV/m and about 100 MV/m.

9. The method of claim 1 , the magnetic field applied at the photoresist layer has a strength between about 0.1 Tesla (T) and 10 Tesla (T).

10. The method of claim 1 , wherein applying the electric field and the magnetic field further comprises:
distributing photoacid in the photoresist layer in a direction to form a tapered profile in a patterned photoresist layer after a development process is performed to remove the first portion of the photoresist layer.

11. The method of claim 1 , wherein the photoresist layer includes a first, a second and a third mask layer, wherein the first mask is an organic layer, and the second mask layer and the third mask layer are both dielectric layers.

12. The method of claim 11 , wherein the second mask layer is a silicon oxynitride layer or an amorphous carbon layer and the third layer is a silicon oxide layer.

13. The method of claim 11 , wherein a first opening formed in the first mask layer has substantially a vertical straight profile with a first dimension.

14. The method of claim 13 , wherein a second opening formed in the second mask layer has a tapered profile with a second dimension smaller than the first dimension of the first opening.

15. The method of claim 14 , wherein a third opening formed in the third mask layer has a tapered profile with a third dimension smaller than the second dimension of the second opening.

16. The method of claim 15 , wherein the tapered profile formed in the third mask layer has a slope greater than a slope formed in the tapered profile formed in the second mask layer.

17. A method of processing a substrate, the method comprising:
applying a photoresist layer comprising a photoacid generator to a substrate;
exposing a first portion of the photoresist layer unprotected by a photomask to a radiation light in a lithographic exposure process; and
orienting photoacid formed in the first portion of the photoresist layer by applying an electric field and a magnetic field to the photoresist layer in a vertical direction perpendicular to a planar surface of the substrate.

18. The method of claim 17 , wherein orienting photoacid further comprising:
directing movement of photoacid in a horizontal direction defined in a plane interfaced with a second portion of the photoresist layer protected by the photomask.

19. A method of processing a substrate, the method comprising:
applying a photoresist layer comprising a photoacid generator to a substrate;
exposing a first portion of the photoresist layer unprotected by a photomask to a radiation light in a lithographic exposure process; and
orienting photoacid formed in the first portion of the photoresist layer by applying an electric field and a magnetic field to the photoresist layer to minimize a lateral movement of photoacid.

Assignees

• Applied Materials Inc

Inventors

• Xie Peng
• Godet Ludovic

Classifications

• G03F7/2051

  Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source (G03F7/70 takes precedence) · CPC title

• G03F7/26 Primary

  Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title

• G03F7/0045

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/091

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/094

  Multilayer resist systems, e.g. planarising layers · CPC title