Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices

Patent metadata

Field	Value
Publication number	US-9365802-B2
Application number	US-201313780544-A
Country	US
Kind code	B2
Filing date	Feb 28, 2013
Priority date	Aug 31, 2010
Publication date	Jun 14, 2016
Grant date	Jun 14, 2016

Abstract

The invention relates to a cleaning liquid for semiconductor device substrates comprising the following components (A) to (D) and a method of cleaning semiconductor device substrates:
(A) at least either one of a polycarboxylic acid and a hydroxycarboxylic acid; (B) a sulfonic acid type anionic surfactant; (C) a carboxylic acid type anionic surfactant; and (D) water.

First claim

The invention claimed is:

1. A cleaning liquid, comprising components (A) to (D):
(A) at least one of a polycarboxylic acid and a hydroxycarboxylic acid;
(B) a sulfonic acid type anionic surfactant;
(C) a carboxylic acid type anionic surfactant; and
(D) water;
wherein:
component (C) is a compound of formula (1) or a salt thereof:
R—O-(AO) m —(CH 2 ) n —COOH  (1)

R is a linear or branched alkyl group having 5 to 20 carbon atoms;
AO is at least one of an oxyethylene group and an oxypropylene group;
m is 3 to 30; and
n is 1 to 6.

2. The cleaning liquid according to claim 1 , wherein component (A) is a compound that has two or more carboxyl groups and one or more hydroxy groups.

3. The cleaning liquid according to claim 1 , wherein component (A) is a compound having 2 to 10 carbon atoms.

4. The cleaning liquid according to claim 1 , wherein component (A) is at least one member selected from the group consisting of citric acid, tartaric acid, malic acid, and lactic acid.

5. The cleaning liquid according to claim 1 , wherein component (B) is at least one member selected from the group consisting of an alkylsulfonic acid, a salt of an alkylsulfonic acid, an alkylbenzenesulfonic acid, a salt of an alkylbenzenesulfonic acid, an alkyldiphenyl ether disulfonic acid, a salt of an alkyldiphenyl ether disulfonic acid, an alkylmethyltauric acid, a salt of an alkylmethyltauric acid, a sulfosuccinic acid diester, and a salt of a sulfosuccinic acid diester.

6. The cleaning liquid according to claim 1 , wherein:
a content of component (A) is 5 to 30% by mass;
a content of component (B) is 0.01 to 10% by mass; and
a content of component (C) is 0.01 to 10% by mass.

7. The cleaning liquid according to claim 1 , wherein:
a content of component (A) is 0.03 to 3% by mass;
a content of component (B) is 0.0001 to 1% by mass; and
a content of component (C) is 0.0001 to 1% by mass.

8. The cleaning liquid according to claim 1 , wherein a mass ratio of component (B) to component (C) [component (B)/component (C)] is in a range of 1/15 to 1.5/1.

9. The cleaning liquid according to claim 1 , wherein, when colloidal silica having a primary-particle diameter of 80 nm is added to the cleaning liquid and the cleaning liquid is diluted to a water/cleaning liquid ratio of 40 by mass, the cleaning liquid has a zeta potential of −30 my or lower.

10. A method of cleaning a substrate for a semiconductor device, comprising:
applying the cleaning liquid according to claim 1 to the substrate.

11. The method of cleaning a substrate for a semiconductor device according to claim 10 , wherein:
the substrate comprises Cu wiring and a low-dielectric constant insulating film on a substrate surface; and
the substrate is a substrate that has been subjected to chemical mechanical polishing.

12. The cleaning liquid according to claim 1 , wherein the compound of general formula (1) is a polyoxyethylene alkyl ether acetic acid.

Assignees

• Mitsubishi Chem Corp

Inventors

• Harada Ken
• Ito Atsushi
• Suzuki Toshiyuki

Classifications

• H10P70/277

  the processing being a planarisation of conductive layers · CPC title

• C11D1/37 Primary

  Mixtures of compounds all of which are anionic · CPC title

• C11D1/04 Primary

  Carboxylic acids or salts thereof (soap C11D9/00) · CPC title

• C11D3/3765

  in liquid compositions · CPC title

• C11D3/2086

  Hydroxy carboxylic acids-salts thereof · CPC title