Method for forming fine patterns on a substrate with a disposable cliche

Patent metadata

Field	Value
Publication number	US-9365025-B2
Application number	US-59568308-A
Country	US
Kind code	B2
Filing date	Apr 14, 2008
Priority date	Apr 13, 2007
Publication date	Jun 14, 2016
Grant date	Jun 14, 2016

Abstract

A method for forming fine patterns includes (S 1 ) closely contacting a cliche-forming film to a hard mold concavely patterned, thereby making a disposable cliche; (S 2 ) coating an elastic blanket cylinder with ink or resin; (S 3 ) compressing the elastic blanket cylinder to the disposable cliche to remove ink or resin on a surface of the elastic blanket cylinder at a portion contacting with a relatively protruded embossed portion of the disposable cliche; and (S 4 ) transcribing ink or resin remaining on the surface of the elastic blanket cylinder to a substrate. This method allows simple and fast works and greatly reduces costs by adopting a disposable cliche that may be easily installed and removed. Also, this method may be effectively utilized to form a fine pattern of an electronic device or a display device such as color filter and electrode.

First claim

What is claimed is:

1. A method for forming a fine pattern, comprising:
(S 1 ) contacting a cliche-forming film to a patterned hard mold, to make a disposable cliche;
(S 2 ) coating an elastic blanket cylinder with ink or resin;
(S 3 ) compressing the elastic blanket cylinder to the disposable cliche to remove ink or resin on a surface of the elastic blanket cylinder at a portion contacting with a relatively protruded embossed portion of the disposable cliche; and
(S 4 ) transcribing ink or resin remaining on the surface of the elastic blanket cylinder to a substrate,
wherein the cliche-forming film has a thickness of 70 μm or less,
wherein the cliche-forming film has a surface energy greater than that of the ink,
wherein the step (S 1 ) further comprises placing the cliche-forming film between the hard mold and a complementary hard mold, compressing the hard mold and the complementary hard mold to fit with each other, and taking off the complementary hard mold, and wherein the cliche-forming film is selected from the group consisting of a polyethylene film and a polyethylene terephthalate film.

2. The method for forming a fine pattern according to claim 1 , wherein the hard mold is made of a material selected from the group consisting of glass, metal, metal oxide and plastic.

3. The method for forming a fine pattern according to claim 1 , wherein the hard mold is concavely patterned.

4. The method for forming a fine pattern according to claim 3 , wherein the hard mold is concavely patterned by using a method selected from the group consisting of wet etching, dry etching, photography and laser forming.

5. The method for forming a fine pattern according to claim 1 , wherein the elastic blanket cylinder is made by coating a cylindrical roll with an elastic rubber.

6. The method for forming a fine pattern according to claim 1 , wherein the elastic blanket cylinder is made by mounting a flat plate pad with an elastic rubber to an outside of a cylindrical roll.

7. The method for forming a fine pattern according to claim 5 , wherein the elastic rubber is a silicon rubber.

8. The method for forming a fine pattern according to claim 6 , wherein the elastic rubber is a silicon rubber.

9. The method for forming a fine pattern according to claim 1 , wherein the ink is a thermosetting or photo-curing ink.

10. The method for forming a fine pattern according to claim 1 , wherein the resin is a thermosetting or photo-curing resin.

11. The method for forming a fine pattern according to claim 1 , wherein the cliché-forming film is contacted to the patterned hard mold to make a disposable cliche.

12. The method for forming a fine pattern according to claim 1 , further comprising taking off the complementary hard mold to make the disposable cliché in step (S 1 ).

Assignees

• Seong Jie-Hyun
• Lee Seung-Heon
• Hong Young-Jun
• Kim Ji-Su
• Lg Chemical Ltd

Inventors

• Seong Jie-Hyun
• Lee Seung-Heon
• Hong Young-Jun
• Kim Ji-Su

Classifications

• B41F35/00

  Cleaning arrangements or devices {(in manifolding apparatus or the like B41L41/00)} · CPC title

• G02F1/133516

  Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

• B41N3/003

  of intaglio formes, e.g. application of a wear-resistant coating, such as chrome, on the already-engraved plate or cylinder; Preparing for reuse, e.g. removing of the Ballard shell; Correction of the engraving · CPC title

• B41F3/36

  for intaglio or heliogravure printing (proof-print presses B41F3/28) · CPC title

• G03F7/2018

  Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing · CPC title