Solid-state structures with volatile sintering aids, and methods for fabrication and use thereof
US-2024429439-A1 · Dec 26, 2024 · US
US9362482B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9362482-B2 |
| Application number | US-201213707897-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 7, 2012 |
| Priority date | Mar 12, 2009 |
| Publication date | Jun 7, 2016 |
| Grant date | Jun 7, 2016 |
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Provided are a bismuth-based piezoelectric material whose insulation property is improved while its performance as a piezoelectric body is not impaired and a piezoelectric device using the piezoelectric material. The piezoelectric material includes a perovskite-type metal oxide represented by the following general formula (1): Bi x (Fe 1-y Co y )O 3 (1) where 0.95≦x≦1.25 and 0≦y≦0.30, and a root mean square roughness Rq (nm) of a surface of the piezoelectric material satisfies a relationship of 0<Rq≦25y+2 (0≦y≦0.30).
Opening claim text (preview).
What is claimed is: 1. A method of producing a piezoelectric device comprising a substrate bearing a piezoelectric material and a pair of electrodes provided to contact the piezoelectric material, the method comprising: subjecting a raw material comprising Bi, Fe and Co to a heat treatment at 430° C. or lower under an atmosphere comprising at least 25 vol % oxygen to obtain a piezoelectric material formed of a perovskite-type metal oxide represented by formula (1): Bi x (Fe 1-y Co y )O 3 (1) where 0.95≦x≦1.25 and 0.10≦y≦0.30. 2. The method of producing a piezoelectric device according to claim 1 , wherein the piezoelectric material is formed by a chemical solution deposition method. 3. The method of producing a piezoelectric device according to claim 1 , wherein the atmosphere comprises ozone. 4. The method of producing a piezoelectric device according to claim 2 , wherein the chemical solution deposition method is performed by multi-layer coating at a coating thickness per layer of from 8 nm to 30 nm. 5. The method of producing a piezoelectric device according to claim 1 , wherein the substrate comprises a single crystal substrate oriented toward one of a (100) plane and a (111) plane. 6. The method of producing a piezoelectric device according to claim 2 , wherein a precursor solution used in the chemical solution deposition method comprises bismuth 2-ethylhexanoate, tris(acetylacetonato)iron, and tris(acetylacetonato)cobalt. 7. The method of producing a piezoelectric device according to claim 6 , wherein a difference between a total content of Fe and Co in the precursor solution and a content of Bi in the solution is 1 mol % or less. 8. The method of producing a piezoelectric device according to claim 1 , wherein the electrodes each comprise either (i) M1RuO 3 where M1 represents at least one member selected from the group consisting of Sr, Ba, and Ca or (ii) Sr (1-z) M2 z CoO 3 where M2 represents at least one member selected from the group consisting of La, Pr, Sm, and Nd, and z satisfies a relationship of 0≦z<1.
Perovskite structure ABO3 · CPC title
Bismuth oxides, bismuthates or oxide forming salts thereof, e.g. zinc bismuthate · CPC title
Cobalt oxides, cobaltates or cobaltites or oxide forming salts thereof, e.g. bismuth cobaltate, zinc cobaltite · CPC title
based on oxide ceramics · CPC title
Atmosphere during thermal treatment · CPC title
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