Feeder system and method for a vapor transport deposition system

US9359668B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9359668-B2
Application numberUS-201213601512-A
CountryUS
Kind codeB2
Filing dateAug 31, 2012
Priority dateSep 2, 2011
Publication dateJun 7, 2016
Grant dateJun 7, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An improved feeder system and method for a vapor transport deposition system that includes a carrier gas bypass flow line to allow for continuous carrier gas flow to a vaporizer unit when a vibratory unit which supplies powdered material and carrier gas to the vaporizer unit is out of service. A process gas flow line to the vibratory unit may be included when the powdered material contains a powdered dopant in the material mix.

First claim

Opening claim text (preview).

What is claimed as new and desired to be protected by Letters Patent of the United States is: 1. A system comprising: a powder vibratory unit holding a powder material; a carrier gas source; a carrier gas input flow line for directing a carrier gas from the carrier gas source into the powder vibratory unit; an output flow line for directing an powder output of the powder vibratory unit to a vaporizer unit; and a carrier gas bypass flow line including a device for selectively directing a carrier gas from the carrier gas source into the vaporizer unit and bypassing the powder vibratory unit; a particle filter coupled to the carrier gas bypass flow line to prevent powder from flowing from the output flow line into the carrier gas bypass flow line. 2. The system of claim 1 , further comprising a first mass flow controller coupled to the carrier gas input flow line for regulating a flow of carrier gas into the powder vibratory unit; and a second mass flow controller coupled to a carrier gas bypass flow line for regulating a flow of bypass carrier gas into the vaporizer unit. 3. The system of claim 2 , further comprising a flow-valve coupled to the output flow line for regulating the flow of a combination of carrier gas and powder out of the powder vibratory unit. 4. The system of claim 3 , wherein the flow-valve is a shut-off valve for restricting or allowing the flow of a combination of carrier gas and powder out of the powder vibratory unit. 5. The system of claim 2 , further comprising a valve coupled to the output flow line and to the carrier bypass flow line for regulating the flow of carrier gas and/or powder into the vaporizer unit. 6. The system of claim 2 , further comprising an interlock system for controlling the operation of components of the system. 7. The system of claim 6 , wherein the interlock system controls the operation of the first mass flow controller and the second mass flow controller. 8. The system of claim 1 , further comprising a process gas input flow line for directing a process gas into the powder vibratory unit. 9. The system as in claim 8 , further comprising a controller for regulating flow of the process gas into the powder vibratory unit. 10. The system as in claim 8 , further comprising: a first mass flow controller coupled to the carrier gas input flow line for regulating a flow of carrier gas into the powder vibratory unit; a second mass flow controller coupled to the process gas input flow line for regulating a flow of the process gas into the powder vibratory unit; and a third mass flow controller coupled to the carrier gas bypass flow line for regulating a flow of bypass carrier gas into the vaporizer unit. 11. The system as in claim 1 , further comprising a flow-valve coupled to the output flow line for regulating the flow of a combination of carrier gas and powder from the powder vibratory unit. 12. The system as in claim 1 , further comprising a flow-valve coupled to the output flow line and to the carrier bypass flow line for regulating the flow of carrier gas and/or powder into the vaporizer unit. 13. A system comprising: a powder vibratory unit holding a powder material; a carrier gas source; a carrier gas input flow line for directing a carrier gas from the carrier gas source into the powder vibratory unit; an output flow line for directing an output of the powder vibratory unit to a vaporizer unit; a carrier gas bypass flow line including a device for selectively directing a carrier gas from the carrier gas source into the vaporizer unit and bypassing the powder vibratory unit; and a particle filter coupled to the carrier gas bypass flow line to prevent powder from back-streaming from the output flow line into the carrier gas bypass flow line. 14. The system as in claim 10 , further comprising an interlock system for controlling operation of at least one of said powder vibratory unit, first mass flow controller, second mass flow controller and third mass flow controller. 15. The system as in claim 14 , wherein the interlock system further comprises a sensor for sensing whether said first mass flow controller is on or off, wherein when the first mass flow controller is off, the interlock system turns off the second mass flow controller. 16. The system as in claim 14 , wherein the interlock system further comprises a pressure sensor for sensing the pressure in the carrier gas bypass flow line, wherein when the pressure sensor senses a pressure in the carrier gas bypass flow line that exceeds a predetermined value, the interlock system turns off the third mass flow controller. 17. The system as in claim 14 , wherein the interlock system further comprises a sensor for sensing the temperature of the vaporizer unit, wherein when the sensor senses an average temperature of the vaporizer unit that is less than a predetermined value the interlock system turns off the first powder vibratory unit.

Assignees

Inventors

Classifications

  • C23C14/228Primary

    Gas flow assisted PVD deposition · CPC title

  • Gas pressure systems operating with fluidisation of the materials · CPC title

  • C23C14/24Primary

    Vacuum evaporation · CPC title

Patent family

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Frequently asked questions

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What does patent US9359668B2 cover?
An improved feeder system and method for a vapor transport deposition system that includes a carrier gas bypass flow line to allow for continuous carrier gas flow to a vaporizer unit when a vibratory unit which supplies powdered material and carrier gas to the vaporizer unit is out of service. A process gas flow line to the vibratory unit may be included when the powdered material contains a po…
Who is the assignee on this patent?
Xiong Gang, Liao Feng, Powell Rick C, and 1 more
What technology area does this patent fall under?
Primary CPC classification C23C14/228. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).