Plasma generating device

US9358519B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9358519-B2
Application numberUS-201214369036-A
CountryUS
Kind codeB2
Filing dateDec 26, 2012
Priority dateDec 28, 2011
Publication dateJun 7, 2016
Grant dateJun 7, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention aims to provide a plasma generation device including: a plasma generation part which generates plasma; diluent gas supply means which supplies a diluent gas for diluting the plasma generated by the plasma generation part; and a spray port through which a plasma gas resulting from the dilution of the plasma with the diluent gas is sprayed, in which the characteristics of the plasma gas are changed and controlled so as to enlarge the plasma gas and enhance the activity of the plasma gas, without controlling the power input from a power source to the plasma generation part. The plasma generation device of the present invention includes an electromagnetic wave production device which irradiates at least one of a region where the plasma is generated and a region where the plasma gas passes with an electromagnetic wave from an antenna.

First claim

Opening claim text (preview).

The invention claimed is: 1. A plasma generation device comprising: a plasma generation part which generates plasma; an air blower configured to blow air to the plasma generation part as a diluent gas for diluting the plasma generated by the plasma generation part; and a spray port through which a plasma gas resulting from the dilution of the plasma with the diluent gas is sprayed, wherein the plasma generation device further comprises an electromagnetic wave production device which irradiates at least one region of (i) a first region where the plasma is generated and (ii) a second region where the plasma gas passes with an electromagnetic wave from an antenna. 2. The plasma generation device according to claim 1 , wherein the spray port is formed in a slit-like shape. 3. The plasma generation device according to claim 2 , wherein an intense electric field is moved along the slit-like spray port. 4. The plasma generation device according to claim 3 , comprising antenna drive means which moves the antenna of the electromagnetic wave production device along the slit-like spray port, wherein the antenna drive means moves the strong electric field along the spray port by moving the antenna. 5. The plasma generation device according to claim 1 , wherein the electromagnetic wave production device includes a transmission path for transmitting a high-frequency wave; and a plurality of antennas which radiate the high-frequency wave as an electromagnetic wave into a space, and the transmission path includes a main line; a plurality of branch lines branching off from the main line; and a distributor which is provided between the branch lines and the main line and which turns on and off the high-frequency wave from the main line to each of the branch lines. 6. The plasma generation device according to claim 1 , wherein the electromagnetic wave production device includes frequency changing means which can change the frequency of the electromagnetic wave emitted from the antenna to a plurality of predetermined frequencies, the antenna includes a main line and a plurality of branch lines branching off from the main line, and the lengths of the branch lines are set such that changing the frequency of the electromagnetic wave to a predetermined frequency by the frequency changing means causes the amplitude of the electromagnetic wave to become larger in a certain branch line according to the predetermined frequency. 7. The plasma generation device according to claim 1 , wherein the spray port is formed as an end opening of a tube.

Assignees

Inventors

Classifications

  • using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes · CPC title

  • B01J19/087Primary

    employing electric or magnetic energy · CPC title

  • Electricity · mapped topic

  • creating magnetic fields · CPC title

  • Processes carried out in the presence of a plasma · CPC title

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Frequently asked questions

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What does patent US9358519B2 cover?
The present invention aims to provide a plasma generation device including: a plasma generation part which generates plasma; diluent gas supply means which supplies a diluent gas for diluting the plasma generated by the plasma generation part; and a spray port through which a plasma gas resulting from the dilution of the plasma with the diluent gas is sprayed, in which the characteristics of th…
Who is the assignee on this patent?
Imagineering Inc
What technology area does this patent fall under?
Primary CPC classification B01J19/087. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).