Capacitively coupled electrodeless plasma apparatus and a method using capacitively coupled electrodeless plasma for processing a silicon substrate
US-2015372167-A1 · Dec 24, 2015 · US
US9356183B1 · US · B1
| Field | Value |
|---|---|
| Publication number | US-9356183-B1 |
| Application number | US-201213528721-A |
| Country | US |
| Kind code | B1 |
| Filing date | Jun 20, 2012 |
| Priority date | Jun 20, 2011 |
| Publication date | May 31, 2016 |
| Grant date | May 31, 2016 |
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A compound III/V optoelectronic device and method associated with such a device is disclosed. In one aspect, a method for an improved III/V compound optoelectronic device is disclosed. The method comprises applying a sulfur surfactant on the III/V compound optoelectronic device to improve passivation of the III/V compound optoelectronic device. In a second aspect, a III/V compound optoelectronic device is disclosed. The III/V compound optoelectronic device comprises a thin film device with a III/V compound semiconductor absorbing material, and a sulfur surfactant on the III/V compound thin film device to improve passivation of the III/V compound optoelectronic device.
Opening claim text (preview).
What is claimed is: 1. A method for an improved III/V optoelectronic device comprising: applying a sulfur surfactant to exposed edges of the III/V optoelectronic device to improve passivation of the III/V optoelectronic device; wherein the exposed edges are created by cracks in, or intentional fracturing of, the III/V optoelectronic device. 2. The method of claim 1 wherein the sulfur surfactant comprises an inert, transparent and insulating viscous liquid with sulfur in a −2 oxidation state. 3. The method of claim 1 , wherein the sulfur surfactant is applied to the front and/or rear surfaces of the III/V optoelectronic device. 4. The method of claim 1 , wherein the cracks are formed after the surfactant is applied. 5. The method of claim 1 , wherein the surfactant is trioctylphosphine sulfide (TOP:S), SP(C 8 H 17 ) 3 .
Coatings (arrangements for preventing damage to photovoltaic cells caused by corpuscular radiation H10F77/80) · CPC title
for photovoltaic cells · CPC title
Manufacture or treatment of devices covered by this subclass (patterning processes to connect thin photovoltaic cells in integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/33; manufacture or treatment of encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/80; manufacture or treatment of integrated devices, or assemblies of multiple devices, comprising at least one element in which radiation controls the flow of current H10F39/00) · CPC title
comprising thin-film photovoltaic cells · CPC title
comprising only Group III-V materials, e.g. GaAs/AlGaAs or InP/GaInAs photovoltaic cells · CPC title
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