Thermo-mechanical actuator
US-12117739-B2 · Oct 15, 2024 · US
Arrangement for use in a projection exposure tool for microlithography having a reflective optical element
US9354529B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9354529-B2 |
| Application number | US-201213561502-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 30, 2012 |
| Priority date | Jan 29, 2010 |
| Publication date | May 31, 2016 |
| Grant date | May 31, 2016 |
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Abstract
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An arrangement for use in a projection exposure tool ( 100 ) for microlithography comprises a reflective optical element ( 10; 110 ) and a radiation detector ( 30; 32; 130 ). The reflective optical element ( 10; 110 ) comprises a carrier element ( 12 ) guaranteeing the mechanical strength of the optical element ( 10; 110 ) and a reflective coating ( 18 ) disposed on the carrier element ( 12 ) for reflecting a use radiation ( 20 a ). The carrier element ( 12 ) is made of a material which upon interaction with the use radiation ( 20 a ) emits a secondary radiation ( 24 ) the wavelength of which differs from the wavelength of the use radiation ( 20 a ), and the radiation detector ( 30; 32; 130 ) is configured to detect the secondary radiation ( 24 ).
First claim
Opening claim text (preview).
What is claimed is: 1. An arrangement for use in a projection exposure tool for microlithography, the arrangement comprising: a reflective optical element including a carrier for imparting mechanical strength to said optical element; said reflective optical element further including a reflective coating disposed on said carrier for reflecting use radiation having a first wavelength; more than 50% by volume of said carrier comprising a material which, upon interaction with said…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G03F7/70891Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US9354529B2 cover?
- An arrangement for use in a projection exposure tool ( 100 ) for microlithography comprises a reflective optical element ( 10; 110 ) and a radiation detector ( 30; 32; 130 ). The reflective optical element ( 10; 110 ) comprises a carrier element ( 12 ) guaranteeing the mechanical strength of the optical element ( 10; 110 ) and a reflective coating ( 18 ) disposed on the carrier element ( 12 ) f…
- Who is the assignee on this patent?
- Ehm Dirk Heinrich, Van Kampen Maarten, Schmidt Stefan-Wolfgang, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70891. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue May 31 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).