Methods for manufacturing block copolymers and articles manufactured therefrom
US-2015376454-A1 · Dec 31, 2015 · US
Block copolymer and pattern forming method using the same
US9354522B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9354522-B2 |
| Application number | US-201414466735-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 22, 2014 |
| Priority date | Feb 3, 2014 |
| Publication date | May 31, 2016 |
| Grant date | May 31, 2016 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
First claim
Opening claim text (preview).
What is claimed is: 1. A block copolymer comprising: a first block; and a second block copolymerized with the first block, wherein the second block includes a silyl group including a ring-type functional group, wherein the first block and the second block are compounds expressed in Formula 2: (wherein TPS is a triphenyl silyl group, n and m are 0-99, and r is 1-99).…
Assignees
Inventors
Classifications
Electricity · mapped topic
- C08F293/00Primary
Chemistry & Metallurgy · mapped topic
- G03F7/40Primary
Physics · mapped topic
Electricity · mapped topic
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9354522B2 cover?
- A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
- Who is the assignee on this patent?
- Samsung Display Co Ltd, Univ Sogang Res Foundation
- What technology area does this patent fall under?
- Primary CPC classification C08F293/00. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 31 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).