MEMS pressure sensor with improved insensitivity to thermo-mechanical stress

US9352955B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9352955-B2
Application numberUS-201414537898-A
CountryUS
Kind codeB2
Filing dateNov 10, 2014
Priority dateMar 27, 2014
Publication dateMay 31, 2016
Grant dateMay 31, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

This invention relates generally to semiconductor manufacturing and packaging and more specifically to semiconductor manufacturing in MEMS (Microelectromechanical systems) inertial sensing products. Embodiments of the present invention improve pressure sensor performance (e.g., absolute and relative accuracy) by increasing pressure insensitivity to changes in thermo-mechanical stress. The pressure insensitivity can be achieved by using the array of pressure sensing membranes, suspended sensing electrodes, and dielectric anchors.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for providing thermo-mechanical insensitivity, comprising: a sealed cavity; an array of membranes acting as pressure sensors within the sealed cavity; a plurality of sensing electrodes, wherein the sensing electrodes are suspended within the sealed cavity; and dielectric anchors coupled to the sensing electrodes and the sensing membranes. 2. The system of claim 1 , wherein the dielectric anchors are made of silicon dioxide. 3. The system of claim 1 , wherein the dielectric anchors are made of silicon nitride. 4. The system of claim 1 , wherein the sensing electrodes are made of poly crystalline silicone. 5. The system of claim 1 , wherein the sensing electrodes are made of mono crystalline silicon. 6. The system of claim 1 , wherein the sensing electrodes are made of aluminum. 7. The system of claim 1 , wherein the suspension is achieved using a membrane with a plurality of pillars that act as anchors to the sensing electrode. 8. The system of claim 1 , wherein the array of pressure sensors is comprised of twenty five membranes. 9. The system of claim 1 , wherein the system is integrated in a single die with inertial sensors. 10. A system for providing thermo-mechanical insensitivity, comprising: a cap wafer; a structural layer; an array of pressure sensing electrodes; a plurality of suspended sensing electrodes; a plurality of dielectric anchors used to suspend the suspended sensing electrodes; and decoupling trenches to provide decoupling between a substrate and the suspended sensing electrodes. 11. The system of claim 10 , wherein the suspended sensing electrode is realized using the structural layer of the sensing electrodes. 12. The system of claim 10 , wherein the dielectric anchors are realized using a residual of sacrificial oxide removed to release the structural layer.

Assignees

Inventors

Classifications

  • Pressure sensors · CPC title

  • Electrodes · CPC title

  • using a semiconductive diaphragm · CPC title

  • Treatments for improving mechanical properties, not provided for in B81C1/00658 - B81C1/0065 · CPC title

  • B81B3/0078Primary

    Constitution or structural means for improving mechanical properties not provided for in B81B3/007 - B81B3/0075 · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9352955B2 cover?
This invention relates generally to semiconductor manufacturing and packaging and more specifically to semiconductor manufacturing in MEMS (Microelectromechanical systems) inertial sensing products. Embodiments of the present invention improve pressure sensor performance (e.g., absolute and relative accuracy) by increasing pressure insensitivity to changes in thermo-mechanical stress. The press…
Who is the assignee on this patent?
Maxim Integrated Products
What technology area does this patent fall under?
Primary CPC classification B81B3/0078. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 31 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).