Quantum dot-fullerene junction based photodetectors

US9349970B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9349970-B2
Application numberUS-201414254631-A
CountryUS
Kind codeB2
Filing dateApr 16, 2014
Priority dateSep 29, 2009
Publication dateMay 24, 2016
Grant dateMay 24, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A photodetector includes one or more photodiodes and a signal processing circuit. Each photodiode includes a transparent first electrode, a second electrode, and a heterojunction interposed between the first electrode and the second electrode. Each heterojunction includes a quantum dot layer and a fullerene layer disposed directly on the quantum dot layer. The signal processing circuit is in signal communication each the second electrode. The photodetector may be responsive to wavelengths in the infrared, visible, and/or ultraviolet ranges. The quantum dot layer may be treated with a chemistry that increases the charge carrier mobility of the quantum dot layer.

First claim

Opening claim text (preview).

What is claimed is: 1. An optoelectronic device, comprising: a first electrode; a quantum dot layer disposed on the first electrode and comprising a plurality of quantum dots; a fullerene layer disposed directly on the quantum dot layer, wherein the quantum dot layer and the fullerene layer form an electronic heterojunction; and a second electrode disposed on the fullerene layer. 2. The optoelectronic device of claim 1 , wherein the first electrode or the second electrode is selected from the group consisting of conductive oxides, metals, metal alloys, metal-inclusive compounds, CNTs, and conductive polymers. 3. The optoelectronic device of claim 1 , wherein the quantum dots are selected from the group consisting of visible light-sensitive quantum dots, infrared-sensitive quantum dots, and ultraviolet-sensitive quantum dots. 4. The optoelectronic device of claim 1 , wherein the quantum dots have a composition selected from the group consisting of Group II-VI, Group I-III-VI, Group III-V, Group IV, Group IV-VI, and Group V-VI materials. 5. The optoelectronic device of claim 1 , wherein the quantum dots are composed of lead sulfide, lead selenide, lead telluride, mercury telluride, or alloys thereof. 6. The optoelectronic device of claim 1 , wherein the quantum dot layer has a thickness ranging from 5 nm to 5 μm. 7. The optoelectronic device of claim 1 , wherein the plurality of quantum dots comprises a plurality of first quantum dots and a plurality of second quantum dots, and the first quantum dots have a first average size and the second quantum dots have a second average size different from the first average size, or the first quantum dots have a first composition and the second quantum dots have a second composition different from the first composition. 8. The optoelectronic device of claim 1 , wherein the fullerenes are selected from the group consisting of C n fullerenes where n is 20 or greater, endohedral fullerenes, fullerene derivatives, and a combination of two or more of the foregoing. 9. The optoelectronic device of claim 1 , wherein the fullerene layer has a thickness ranging from 3 nm to 300 nm. 10. The optoelectronic device of claim 1 , comprising a hole blocking layer disposed on the fullerene layer, wherein the second electrode is disposed on the hole blocking layer. 11. The optoelectronic device of claim 10 , wherein the hole blocking layer has a composition selected from the group consisting of titanium oxides, zinc oxides, BCP, BPhen, NBPhen, metal chelates, and chemical relatives and derivatives of the foregoing. 12. The optoelectronic device of claim 1 , comprising an electron blocking layer disposed between the first electrode and the quantum dot layer. 13. The optoelectronic device of claim 12 , wherein the electron blocking layer has a composition selected from the group consisting of molybdenum oxides, tungsten oxides, copper oxides, nickel oxides, phthalocyanines, m-MTDATA, a-NPD, quantum dots, and chemical relatives and derivatives of the foregoing. 14. The optoelectronic device of claim 12 , wherein the electron blocking layer comprises a discontinuous layer. 15. The optoelectronic device of claim 14 , wherein the electron blocking layer comprises a pattern of electron blocking material. 16. The optoelectronic device of claim 1 , comprising an exciton blocking layer disposed on the fullerene layer or on the first electrode. 17. The optoelectronic device of claim 1 , wherein the quantum dot layer exhibits a charge carrier mobility greater than 1×10 −4 cm 2 /V-sec. 18. The optoelectronic device of claim 1 , wherein the quantum dot layer exhibits a charge carrier mobility ranging from greater than 1×10 −4 cm 2 N-sec to 10 cm 2 /V-sec. 19. The optoelectronic device of claim 1 , wherein the quantum dot layer is a chemically treated quantum dot layer that exhibits increased charge carrier mobility relative to an untreated quantum dot layer. 20. The optoelectronic device of claim 1 , wherein the quantum dot layer exhibits an interparticle spacing of 2 nm or less. 21. The optoelectronic device of claim 1 , wherein the optoelectronic device has a power conversion efficiency of at least 4.5% when illuminated by an incident white light beam of 100 mW/cm2. 22. A method for fabricating an optoelectronic device, the method comprising: depositing a quantum dot layer on an electrode, the quantum dot layer comprising a plurality of quantum dots; and depositing a fullerene layer directly on the quantum dot layer, wherein the quantum dot layer and the fullerene layer form an electronic heterojunction. 23. The method of claim 22 , wherein depositing the quantum dot layer comprises depositing a solution comprising the plurality of quantum dots and a solvent. 24. The method of claim 23 , wherein the solvent is selected from the group consisting of toluene, anisole, alkanes, butylamine, and water. 25. The method of claim 22 , wherein depositing the quantum layer comprises depositing a first quantum dot film on the fullerene layer, followed by depositing one or more additional quantum dot films on the first quantum dot film. 26. The method of claim 22 , comprising, after depositing the quantum dot layer, treating the quantum dot layer with a chemistry that increases a charge carrier mobility of the quantum dot layer. 27. The method of claim 26 , wherein the chemistry comprises a solution or vapor having a composition selected from the group consisting of ethanethiol, alkyl-thiols, alkenyl-thiols, alkynyl-thiols, aryl-thiols, ethanedithiol, benzendithiol, alkyl-polythiols, alkenyl-polythiols, alkynyl-polythiols, aryl-polythiols, carboxlyic acids, formic acid, methanol, toluene, isopropyl alcohol, chloroform, acetonitrile, acetic acid, butyl amine, 1,4 butyl diamine, alkyl-amines, alkenyl-amines, alkynyl-amines, aryl-amines alkyl-polyamines, alkenyl-polyamines, alkynyl-polyamines, aryl-polyamines. 28. The method of claim 22 , comprising depositing a hole blocking layer or an exciton blocking layer on the fullerene layer. 29. The method of claim 22 , comprising depositing an exciton blocking layer on the electrode. 30. The method of claim 22 , comprising depositing an electron blocking layer on the electrode, wherein the quantum dot layer is deposited on the electron blocking layer. 31. The method of claim 30 , comprising subjecting the electron blocking layer to an oxidizing or reducing treatment. 32. The method of claim 22 , comprising treating the quantum dot layer with a chemistry selected from a chemistry that reduces an interparticle spacing between quantum dots, a chemistry that reduces an as-deposited thickness of the quantum dot layer, or a chemistry that both reduces the interparticle spacing and the as-deposited thickness of the quantum dot layer. 33. The method of claim 32 , comprising reducing the interparticle spacing to 2 nm or less, or reducing the as-deposited thickness by 20 to 80%.

Assignees

Inventors

Classifications

  • Photovoltaic [PV] devices · CPC title

  • comprising heterojunctions between organic semiconductors and inorganic semiconductors · CPC title

  • H10K85/211Primary

    Fullerenes, e.g. C60 · CPC title

  • Electricity · mapped topic

  • Organic PV cells · CPC title

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What does patent US9349970B2 cover?
A photodetector includes one or more photodiodes and a signal processing circuit. Each photodiode includes a transparent first electrode, a second electrode, and a heterojunction interposed between the first electrode and the second electrode. Each heterojunction includes a quantum dot layer and a fullerene layer disposed directly on the quantum dot layer. The signal processing circuit is in si…
Who is the assignee on this patent?
Res Triangle Inst
What technology area does this patent fall under?
Primary CPC classification H10K85/211. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 24 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).