Semiconductor device and display device

US9349750B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9349750-B2
Application numberUS-201314077390-A
CountryUS
Kind codeB2
Filing dateNov 12, 2013
Priority dateNov 16, 2012
Publication dateMay 24, 2016
Grant dateMay 24, 2016

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor device includes: a transistor including a gate electrode, a gate insulating film over the gate electrode, a semiconductor layer over the gate insulating film, and a source electrode and a drain electrode over the semiconductor layer; a first insulating film comprising an inorganic material over the transistor; a second insulating film comprising an organic material over the first insulating film; a first conductive film over the second insulating film and in a region overlapping with the semiconductor layer; a third insulating film comprising an inorganic material over the first conductive film; and a second conductive film over the third insulating film and in a region overlapping with the first conductive film. The absolute value of a first potential applied to the first conductive film is greater than the absolute value of a second potential applied to the second conductive film.

First claim

Opening claim text (preview).

What is claimed is: 1. A display device comprising: a transistor comprising: a gate electrode; a gate insulating film over the gate electrode; a semiconductor layer over the gate insulating film; and a source electrode and a drain electrode over the semiconductor layer; a first insulating film comprising an inorganic material over the transistor; a second insulating film comprising an organic material over the first insulating film; a first conductive film located over the second insulating film and overlapping with the semiconductor layer; a pixel electrode over the second insulating film, the pixel electrode electrically connected to the first conductive film; a third insulating film comprising an inorganic material over the first conductive film and the pixel electrode; a second conductive film located over the third insulating film and overlapping with the first conductive film; a common electrode over the third insulating film, the common electrode electrically connected to the second conductive film; an electrode electrically connected to the common electrode through an opening provided in the gate insulating film, the first insulating film, and the second insulating film; and a liquid crystal layer over the second conductive film and the common electrode. 2. The display device according to claim 1 , wherein the semiconductor layer is an oxide semiconductor layer. 3. The display device according to claim 1 , wherein the transistor is provided in a driver circuit portion of the display device. 4. The display device according to claim 2 , wherein the oxide semiconductor layer comprises at least one oxide selected from the group consisting of indium oxide, tin oxide, and zinc oxide. 5. The display device according to claim 2 , wherein the oxide semiconductor layer is an In—Ga—Zn-based oxide semiconductor layer. 6. The display device according to claim 2 , wherein the oxide semiconductor layer comprises a crystal part, and wherein a c-axis of the crystal part is parallel to a normal vector of a surface where the oxide semiconductor layer is formed.

Assignees

Inventors

Classifications

  • having gate electrodes arranged on both top and bottom sides of the channel, e.g. dual-gate TFTs · CPC title

  • Interconnections, e.g. scanning lines · CPC title

  • H10D86/423Primary

    comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO · CPC title

  • H10D86/60Primary

    wherein the TFTs are in active matrices · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9349750B2 cover?
A semiconductor device includes: a transistor including a gate electrode, a gate insulating film over the gate electrode, a semiconductor layer over the gate insulating film, and a source electrode and a drain electrode over the semiconductor layer; a first insulating film comprising an inorganic material over the transistor; a second insulating film comprising an organic material over the firs…
Who is the assignee on this patent?
Miyake Hiroyuki, Yamazaki Shunpei, Tanada Yoshifumi, and 10 more
What technology area does this patent fall under?
Primary CPC classification H10D86/423. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 24 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).