Continuously producing digital micro-scale patterns on a thin polymer film

US9348231B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9348231-B2
Application numberUS-201313944843-A
CountryUS
Kind codeB2
Filing dateJul 17, 2013
Priority dateJul 17, 2013
Publication dateMay 24, 2016
Grant dateMay 24, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A coating mechanism disposes a liquid (e.g., polymer) thin film onto a conveyor surface (e.g., roller or belt) that is moved by a suitable motor to convey the thin film into a precisely controlled gap (or nip) region where applied potentials generate an electric field that causes the liquid to undergo Electrohydrodynamic (EHD) patterning deformation, whereby the liquid forms patterned micro-scale features. A curing mechanism (e.g., a UV laser) is used to solidify (e.g., cross-link) the patterned liquid features inside or immediately after exiting the gap region, thereby forming micro-scale patterned structures that are either connected by an intervening web as part of a sheet, or separated into discrete micro-scale structures. Nanostructures (e.g., nanotubes or nanowires) disposed in the liquid become vertically oriented during the EHD patterning process. Segmented electrodes and patterned charges are utilized to provide digital patterning control.

First claim

Opening claim text (preview).

The invention claimed is: 1. A system for producing a micro-scale patterned structure, the system comprising: a first conveyor having a first surface constrained to move along a first path; a second conveyor having a second surface constrained to move along a second path, the first and second paths being arranged such that a minimum distance defined between the first and second surfaces occurs in a gap region; means for moving the first and second conveyors at matching speeds such that a first surface region of the first surface passes through said gap region substantially simultaneously with a corresponding second surface region of said second surface; means for disposing a curable liquid thin film on the first surface region such that a first portion of said curable liquid thin film is disposed on the first surface region when the first surface region is located upstream from the gap region; means for generating an electric field between the first conveyor and the second conveyor such that said first portion of the liquid thin film disposed on said first surface region undergoes Electrohydrodynamic (EHD) patterning deformation during passage of said first surface region through the gap region such that the first portion forms a patterned liquid feature having a micro-scale patterned shape; and means for solidifying the patterned liquid feature to form said solid micro-scale patterned structure having said micro-scale patterned shape, wherein said means for disposing said curable liquid thin film comprises means for forming a liquid polymer thin film with nanostructures dispersed with initial orientations within said liquid polymer thin film, and wherein said means for generating an electric field comprises means for aligning the nanostructures in a substantially perpendicular orientation relative to the first surface within the micro-scale patterned structure. 2. The system of claim 1 , wherein said means for disposing the curable liquid thin film on the first surface region comprises one of a slot coating system, a slot die coating system, a slide coating system and a curtain coating system. 3. The system of claim 1 , wherein at least one of the first conveyor and the second conveyor comprise one of an electrically conductive material and a dielectric material. 4. The system of claim 3 , wherein said means for generating said electric field comprises means for applying a first voltage to said one of an electrically conductive material and a dielectric material disposed on the first conveyor, and means for applying a second voltage to said one of an electrically conductive material and a dielectric material disposed on the second conveyor, wherein the first voltage is different from the second voltage such that said first and second voltages generate said electric field. 5. The system of claim 1 , wherein the patterned liquid feature comprises a curable polymer, and wherein said means for solidifying the patterned liquid feature comprises one of an Ultra Violet (UV) curing system, a visible light curing system, and a focused thermal curing system. 6. A system for producing a micro-scale patterned structure, the system comprising: a first conveyor having a first surface constrained to move along a first path; a second conveyor having a second surface constrained to move along a second path, the first and second paths being arranged such that a minimum distance defined between the first and second surfaces occurs in a gap region; means for moving the first and second conveyors at matching speeds such that a first surface region of the first surface passes through said gap region substantially simultaneously with a corresponding second surface region of said second surface; means for disposing a curable liquid thin film on the first surface region such that a first portion of said curable liquid thin film is disposed on the first surface region when the first surface region is located upstream from the gap region; means for generating an electric field between the first conveyor and the second conveyor such that said first portion of the liquid thin film disposed on said first surface region undergoes Electrohydrodynamic (EHD) patterning deformation during passage of said first surface region through the gap region such that the first portion forms a patterned liquid feature having a micro-scale patterned shape; and means for solidifying the patterned liquid feature to form said solid micro-scale patterned structure having said micro-scale patterned shape, wherein said means for generating said electric field comprises means for causing a plurality of said patterned liquid features to separate from each other on said first surface, wherein said means for solidifying the patterned liquid feature comprises means for solidifying said plurality of said patterned liquid features to form a plurality of said solid micro-scale patterned structures disposed in a spaced-apart arrangement on the first surface, and wherein said system further comprises means for separating said plurality of solid micro-scale patterned structures from the first surface. 7. The system of claim 1 , wherein the first and second conveyors and the second conveyor comprise first and second rollers and defining said gap region therebetween. 8. The system of claim 7 , wherein said means for solidifying the patterned liquid feature comprises means for directing energy from one of an Ultra Violet (UV) curing system, a visible light curing system, and a focused thermal curing system onto said patterned liquid feature at a location adjacent to said gap region. 9. The system of claim 1 , wherein the first and second conveyors comprise a first belt conveyor structure and a second belt conveyor structure defining said gap region therebetween. 10. The system of claim 9 , wherein said means for solidifying the patterned liquid polymer feature comprises one of an Ultra Violet (UV) light source, a visible light source and a heat source disposed inside one of said first and second belt conveyor structures. 11. The system of claim 9 , wherein each of said first and second belt conveyor structures further comprises a support structure defining one or more T-shaped grooves, and wherein each of said first and second belt conveyor structures further comprises one or more T-shaped ribs that is slidably received in said one or more T-shaped grooves. 12. The system of claim 1 , wherein the means for generating an electric field comprises a dynamic charge generation mechanism that generates a variable charge pattern on at least one of said first surface and said second surface. 13. The system of claim 12 , wherein said dynamic charge generation mechanism comprises a plurality of segmented electrodes disposed on the second conveyor, and means for individually accessing each of the plurality of segmented electrodes and for transmitting an associated voltage to each of the plurality of segmented electrodes. 14. The system of claim 12 , wherein said second conveyor comprises one of an insulating and semiconducting material layer, and said dynamic charge generation mechanism comprises a charge generating device disposed to apply said variable charge pattern on said layer. 15. A system for producing a plurality of micro-scale patterned structures, the system comprising: a first conveyor having a first surface constrained to move along a first path; a second conveyor having a second surface constrained to move along a second path, the first and second paths being arranged such that a minimum distance defined between the first and second surfaces occurs in an elongated ga

Assignees

Inventors

Classifications

  • G03F7/0002Primary

    Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

  • for laying down a uniform charge, e.g. for sensitising; Corona discharge devices (G03G15/14 takes precedence) · CPC title

  • using a liquid developer {, e.g. liquid suspension} · CPC title

  • Transfer printing apparatus · CPC title

  • the auxiliary operation being performed after the application (B05C9/14 takes precedence) · CPC title

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What does patent US9348231B2 cover?
A coating mechanism disposes a liquid (e.g., polymer) thin film onto a conveyor surface (e.g., roller or belt) that is moved by a suitable motor to convey the thin film into a precisely controlled gap (or nip) region where applied potentials generate an electric field that causes the liquid to undergo Electrohydrodynamic (EHD) patterning deformation, whereby the liquid forms patterned micro-sca…
Who is the assignee on this patent?
Palo Alto Res Ct Inc
What technology area does this patent fall under?
Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 24 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).