Polarizer with variable inter-wire distance

Patent metadata

Field	Value
Publication number	US-9348076-B2
Application number	US-201414470566-A
Country	US
Kind code	B2
Filing date	Aug 27, 2014
Priority date	Oct 24, 2013
Publication date	May 24, 2016
Grant date	May 24, 2016

Abstract

A wire grid polarizer comprising an array of parallel, elongated nano-structures disposed over a surface of a substrate. Each of the nano-structures can include a pair of parallel, elongated wires (or top ribs), each oriented laterally with respect to one another. There can be a first gap disposed between the pair of wires (or top ribs). Each of the nano-structures can be separated from an adjacent nano-structure by a second gap disposed between adjacent nanostructures, and thus between adjacent pairs of wires. A first gap width of the first gap can be different than a second gap width of the second gap. Also included are methods of making wire grid polarizers.

First claim

What is claimed is:

1. A wire grid polarizer comprising:
an array of parallel, elongated nano-structures disposed over a surface of a transmissive substrate, each of the nano-structures including:
a pair of parallel, elongated wires, each oriented laterally with respect to one another;
each wire of the pair of wires includes a top rib disposed over a bottom rib; and
a first gap disposed between the pair of wires, the first gap extending between adjacent top ribs and adjacent bottom ribs;

each of the nano-structures separated from an adjacent nano-structure by a second gap disposed between adjacent nanostructures, and thus between adjacent pairs of wires; and
a first gap width of the first gap being different than a second gap width of the second gap.

2. The wire grid polarizer of claim 1 , wherein:
one of the top rib or the bottom rib is absorptive in order to substantially absorb one polarization state of incoming light; and
the other of the top rib or the bottom rib is reflective in order to substantially polarize incoming light.

3. The wire grid polarizer of claim 1 , wherein a larger of the first gap width or the second gap width divided by a smaller of the first gap width or the second gap width is greater than or equal to 1.1 and less than or equal to 1.3.

4. The wire grid polarizer of claim 1 , wherein a larger of the first gap width or the second gap width divided by a smaller of the first gap width or the second gap width is greater than or equal to 1.3 and less than or equal to 1.5.

5. The wire grid polarizer of claim 1 , wherein a difference between the first gap width and the second gap width is between 5 nanometers and 20 nanometers.

6. The wire grid polarizer of claim 1 , wherein a difference between the first gap width and the second gap width is between 19 nanometers and 40 nanometers.

7. The wire grid polarizer of claim 1 , wherein a difference between the first gap width and the second gap width is at least 10 nanometers.

8. The wire grid polarizer of claim 1 , wherein the first gap and the second gap extend from a base of the nanostructures to a top of the nanostructures.

9. The wire grid polarizer of claim 1 , wherein a base of the nanostructures substantially terminates in a common plane and a top of the nanostructures substantially terminates in a common plane.

10. The wire grid polarizer of claim 1 , wherein a top of the nanostructures substantially terminates in a common plane, a base of the nanostructures substantially terminates in a common plane, and a base of the top ribs substantially terminates in a common plane.

11. The wire grid polarizer of claim 1 , further comprising a solid second fill material disposed in the first gaps and in the second gaps.

12. The wire grid polarizer of claim 11 , wherein the second fill material extends above a top of the nanostructures and the second fill material is substantially transmissive to incoming light.

13. The wire grid polarizer of claim 11 , wherein the second fill material terminates at or below a top of the nanostructures, and the nanostructures separate the second fill material in one gap from the second fill material in an adjacent gap, such that the second fill material forms an array of second fill material ribs.

14. The wire grid polarizer of claim 13 , wherein:
at least one of the top ribs, the bottom ribs, or the second fill material ribs is absorptive in order to substantially absorb one polarization state of incoming light; and
at least one of the top ribs, the bottom ribs, or the second fill material ribs is reflective in order to substantially polarize incident light.

15. The wire grid polarizer of claim 1 , wherein the first gaps and the second gaps are air-filled gaps.

16. A wire grid polarizer comprising:
an array of parallel, elongated nano-structures disposed over a surface of a transmissive substrate, each of the nano-structures including:
a pair of parallel, elongated top ribs, each oriented laterally with respect to one another;
the top ribs being reflective in order to substantially polarize incident light; and
a first gap disposed between the pair of top ribs;

each of the nano-structures separated from an adjacent nano-structure by a second gap disposed between adjacent nanostructures, and thus between adjacent pairs of top ribs;
a first gap width of the first gap being different than a second gap width of the second gap;
a larger of the first gap width or the second gap width divided by a smaller of the first gap width or the second gap width is greater than 1.15;
the first gap and the second gap extending from a base of the top ribs to a top of the top ribs; and
a top of the top ribs substantially terminates in a common plane, a top surface of the substrate substantially terminates in a common plane, and a base of the top ribs substantially terminates in the common plane at the top surface of the substrate.

17. The wire grid polarizer of claim 16 , wherein the first gaps and the second gaps are air-filled gaps.

18. A method of making a wire grid polarizer, the method comprising the following steps in order:
providing a substrate having an array of parallel, elongated support ribs disposed over the substrate with solid-material-free support-rib gaps between the support ribs;
conformal coating the substrate and the support ribs with a layer of material while maintaining the support-rib gaps between the support ribs;
etching the layer of material to remove horizontal segments and leaving an array of parallel, elongated top ribs along sides of the support ribs, including a pair of top ribs for each support rib with a top rib disposed along each side of the support rib;
backfilling the support-rib gaps and above tops of the support ribs with a solid first fill material, the first fill material and the support ribs having similar etch properties;
etching the first fill material down to tops of the top ribs and tops of the support ribs;
etching the support ribs and the first fill material in the support-rib gaps down to a base of the top ribs;
using the top ribs as a mask, etching the substrate between top ribs thus forming an array of parallel elongated bottom ribs, with each bottom rib disposed below a top rib, with each top rib and bottom rib together defining a wire, with gaps between adjacent wires.

19. The method of claim 18 , further comprising a subsequent step of backfilling the gaps between the wires and above tops of the wires with second fill material.

20. The method of claim 18 , further comprising etching the second fill material at least down to tops of the wires, forming a second fill material rib in each gap.

Assignees

• Moxtek Inc

Inventors

• Wang Bin
• Wangensteen Ted
• Petrova Rumyana
• Black Mike
• Marks Steven
• Probst Dean

Classifications

• G02B5/3058 Primary

  comprising electrically conductive elements, e.g. wire grids, conductive particles · CPC title

• G02B1/08

  made of polarising materials · CPC title

• G02B1/12

  by surface treatment, e.g. by irradiation · CPC title

• C23F17/00

  Multi-step processes for surface treatment of metallic material involving at least one process provided for in class C23 and at least one process covered by subclass C21D or C22F or class C25 (coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups C23C2/00 - C23C26/00, or by combinations of methods providedfor in subclasses C23C and C25D, C23C28/00) · CPC title