Superalloy target
US-11866805-B2 · Jan 9, 2024 · US
Lanthanum target for sputtering
US9347130B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9347130-B2 |
| Application number | US-201013147837-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 17, 2010 |
| Priority date | Mar 27, 2009 |
| Publication date | May 24, 2016 |
| Grant date | May 24, 2016 |
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- Title
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- Abstract
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Abstract
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Provided are a lanthanum target for sputtering which has a Vickers hardness of 60 or more and no spotty macro patterns on the surface, and a method of producing a lanthanum target for sputtering, wherein lanthanum is melted and cast to produce an ingot, the ingot is subject to knead forging at a temperature of 300 to 500° C. and subsequently subject to upset forging at 300 to 500° C. to form the shape into a rough target shape, and this is additionally subject to machining to obtain a target. This invention aims to offer technology for efficiently and stably providing a lanthanum target for sputtering that has no spotty macro patterns on the surface, and a method of producing the same.
First claim
Opening claim text (preview).
The invention claimed is: 1. A lanthanum metal target for sputtering having a purity excluding gas components of 3N or higher, a Vickers hardness of HV60 or more, and a non-recrystallized structure with no spotty macro patterns on a surface of the target. 2. The lanthanum metal target for sputtering according to claim 1 , wherein the target consists of lanthanum metal of a purity excluding gas components of 4N or higher. 3. The lanthanum metal target for sputtering according to claim 1 , further comprising a copper-chromium alloy backing plate diffusion bonded to the lanthanum metal target. 4. A method of producing a lanthanum metal target for sputtering, wherein lanthanum is melted and cast to produce an ingot, the ingot is subject to knead forging at a temperature of 300 to 500° C. and subsequently subject to upset forging at 300 to 500° C. to form the shape into a rough target shape, and this is additionally subject to machining to obtain a target having a purity excluding gas components of 3N or higher, a Vickers hardness of HV60 or more, and a non-recrystallized structure with no spotty macro patterns on a surface of the target.
Assignees
Inventors
Classifications
Casting non-ferrous metals or metallic compounds so far as their metallurgical properties are of importance for the casting procedure; Selection of compositions therefor {(non-ferrous ingots B22D7/005)} · CPC title
of other metals or alloys based thereon · CPC title
Oxides (C23C14/10 takes precedence) · CPC title
- C23C14/3414Primary
Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title
Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00 · CPC title
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- What does patent US9347130B2 cover?
- Provided are a lanthanum target for sputtering which has a Vickers hardness of 60 or more and no spotty macro patterns on the surface, and a method of producing a lanthanum target for sputtering, wherein lanthanum is melted and cast to produce an ingot, the ingot is subject to knead forging at a temperature of 300 to 500° C. and subsequently subject to upset forging at 300 to 500° C. to form th…
- Who is the assignee on this patent?
- Tsukamoto Shiro, Otsuki Tomio, Jx Nippon Mining & Metals Corp
- What technology area does this patent fall under?
- Primary CPC classification C23C14/3414. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 24 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).