Salt and photoresist composition containing the same

Patent metadata

Field	Value
Publication number	US-9346750-B2
Application number	US-94734910-A
Country	US
Kind code	B2
Filing date	Nov 16, 2010
Priority date	Nov 18, 2009
Publication date	May 24, 2016
Grant date	May 24, 2016

Abstract

A salt represented by the formula (X):

wherein Q 1 and Q 2 each independently represent a fluorine atom etc., L 1 and L 2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W 1 represents a C3-C36 saturated hydrocarbon ring, R 2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z + represents an organic counter ion, and W 10 represents a group represented by the formula (X-1):

wherein ring W 2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH 2 — can be replaced by —O— or —CO—, with the proviso that at least one —CH 2 — in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R 3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2):

wherein ring W 3 represents a C3-C36 saturated hydrocarbon ring, R 4 is independently in each occurrence a hydroxyl group etc., R 5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

First claim

What is claimed is:

1. A salt represented by the formula (X):

wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 represents *—CO—O-L 3 -, *—CO—O-L 4 -O—, *-L 5 -O—CO— or *—CO—O-L 6 -CO—O— wherein L 3 represents a single bond, L 4 , L 5 and L 6 independently each represent a C1-C6 alkylene group and * represents a binding position to —C(Q 1 )(Q 2 )-, L 2 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, ring W 1 represents a C3-C36 saturated hydrocarbon ring, R 2 is independently in each occurrence a hydroxyl group, a C1-C6 alkyl group or a C1-C6 alkoxy group, s represents an integer of 0 to 2, Z + represents an organic counter ion, and W 10 represents a group represented by the formula (X-1):

wherein ring W 2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH 2 — can be replaced by —O— or —CO—, with the proviso that at least one —CH 2 — in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R 3 is independently in each occurrence a C1-C6 alkyl group, a C1-C6 alkoxy group or a C1-C6 alkoxycarbonyl group, and t represents an integer of 0 to 2, or a group represented by the formula (X-2):

wherein ring W 3 represents a C3-C36 saturated hydrocarbon ring, R 4 is independently in each occurrence a hydroxyl group, a C1-C6 hydroxyalkyl group which can have one or more halogen atoms or a C1-C6 hydroxyalkoxy group which can have one or more halogen atoms, R 5 is independently in each occurrence a C1-C6 alkyl group or a C1-C6 alkoxy group, v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

2. The salt according to claim 1 , wherein W 10 is the group represented by the formula (X-1).

3. The salt according to claim 1 , wherein W 10 is the group represented by the formula (X-2).

4. The salt according to claim 1 , wherein L 2 is *—O-L 7 -CO—O—, *—O-L 8 -CO—O-L 9 -O—, *—CO—O-L 10 -CO—O—, *—O—CO-L 11 -O— or *—O-L 12 -O— wherein L 7 , L 8 , L 9 , L 10 , L 11 and L 12 independently each represent a C1-C6 alkylene group and * represents a binding position to ring W 1 .

5. The salt according to claim 1 , wherein ring W 1 is an adamantane ring.

6. The salt according to claim 1 , wherein ring W 2 is a ring represented by the formula (I-Ba) or (I-Bb)

7. The salt according to claim 1 , wherein ring W 3 is an adamantane ring.

8. The salt according to claim 1 , wherein Z + is a triarylsulfonium cation.

9. An acid generator comprising the salt according to claim 1 .

10. A photoresist composition comprising the acid generator according to claim 9 and a resin comprising a structural unit having an acid-labile group, being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

11. The photoresist composition according to claim 10 , which further contains a basic compound.

12. A process for producing a photoresist pattern comprising the following steps (1) to (5):
(1) a step of applying the photoresist composition according to claim 10 or 11 on a substrate,
(2) a step of forming a photoresist film by conducting drying,
(3) a step of exposing the photoresist film to radiation,
(4) a step of baking the exposed photoresist film, and
(5) a step of developing the baked photoresist film with an alkaline developer, thereby forming a photoresist pattern.

Assignees

• Ichikawa Koji
• Ochiai Mitsuyoshi
• Sugihara Masako
• Sumitomo Chemical Co

Inventors

• Ichikawa Koji
• Ochiai Mitsuyoshi
• Sugihara Masako

Classifications

• C07D307/33

  in position 2, the oxygen atom being in its keto or unsubstituted enol form · CPC title

• C07C2103/74

  Chemistry & Metallurgy · mapped topic

• C07D307/93

  condensed with a ring other than six-membered · CPC title

• C07D327/06

  Six-membered rings · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title