Method for providing patterns of functional materials

US9346239B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9346239-B2
Application numberUS-201213627163-A
CountryUS
Kind codeB2
Filing dateSep 26, 2012
Priority dateSep 26, 2012
Publication dateMay 24, 2016
Grant dateMay 24, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method is used to provide a pattern of a functional material for example on a receiving element. To provide this pattern, a laser-engraveable patternable element is imagewise exposed with laser-engraving radiation. This element has a laser-engraveable layer comprising a thermoplastic elastomeric interpolymer alloy. This interpolymer alloy comprises a non-crosslinked halogenated polymer, a partially crosslinked polyolefin, and a polyester. A laser-engraved patterned element is formed that has a relief image in the laser-engraveable layer, and this relief image can be contacted with a suitable functional material that is then transferred to the receiving element to provide the desired pattern.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for providing a pattern of a functional material, the method comprising: imagewise exposing a laser-engraveable patternable element that comprises at least one laser-engravable layer comprising a thermoplastic elastomeric interpolymer alloy that comprises: a non-crosslinked halogenated polymer, a partially crosslinked polyolefin, and a polyester, to laser-engraving radiation to provide a directly laser-engraved patterned element having a relief image in the laser-engraveable layer, and using the directly laser-engraved patterned element to print a pattern of a functional material. 2. The method of claim 1 , wherein the laser-engraveable patternable element is a flexographic printing precursor and the relief image in the laser-engraveable layer has a minimum relief image depth of at least 30 μm. 3. The method of claim 1 , wherein the laser-engraveable patternable element is a gravure or intaglio printing precursor and the relief image is the laser-engraveable layer has a minimum relief image depth of at least 10 μm. 4. The method of claim 1 , comprising imagewise exposing using one or more near-infrared radiation emitting lasers and the laser-engraveable layer further comprises a near-infrared radiation absorber in an amount of at least 0.5 weight %. 5. The method of claim 1 , comprising: applying a functional material to a raised surface of the directly laser-engraved patterned element having a relief image that has a minimum relief image depth of at least 10 μm, to form a film of the functional material on the raised surface of the relief image, and contacting the film of the functional material with a receiver element to form a pattern of the functional material on the receiver element that corresponds to the relief image. 6. The method of claim 1 , comprising: using the laser-engraved patterned element to print a pattern with a functional material comprising nanoparticles of an electrically conductive material selected from the group consisting of silver, gold, copper, palladium, indium-tin oxide, and combinations thereof. 7. The method of claim 1 , wherein the functional material is selected from the group consisting of electrically conductive materials, semi-conductive materials, dielectric materials, small molecule materials, polymeric materials, bio-based materials, and combinations thereof. 8. The method of claim 1 , wherein the non-crosslinked halogenated polymer is present in the laser-engraveable layer in an amount of at least 5 weight % and up to and including 75 weight %, based on the total dry weight of the laser-engraveable layer. 9. The method of claim 1 , wherein the partially crosslinked polyolefin is present in the laser-engraveable layer in an amount of at least 5 weight % and up to and including 90 weight %, based on the total dry weight of the laser-engraveable layer. 10. The method of claim 1 , wherein the polyester is present in the laser-engraveable layer in an amount of at least 5 weight % and up to and including 90 weight %, based on the total dry weight of the laser-engraveable layer. 11. The method of claim 1 , wherein the thermoplastic elastomeric interpolymer alloy has a softening temperature of less than or equal to 10° C. 12. The method of claim 1 , wherein the laser-engraveable layer further comprises a near-infrared radiation absorber in an amount of at least 0.5 weight %, which near-infrared radiation absorber is a carbon black, carbon nanotubes, an inorganic or organic pigment, an organic dye having at least one absorption peak wavelength of at least 700 nm to and including 1400 nm, or a combination of any of these materials. 13. The method of claim 1 , wherein the laser-engraveable patternable element comprises multiple layers including at least one laser-engraveable layer. 14. The method of claim 1 , wherein the laser-engraveable patternable element further comprises a substrate over which the laser-engraveable layer is disposed. 15. The method of claim 1 for providing a pattern comprising lines having an average line width of less than 20 μm. 16. The method of claim 1 for providing a pattern of functional material that comprises a seed material for a subsequent plating process. 17. The method of claim 1 for providing a pattern of functional material that is formulated to protect an underlying uniform metal film during a subsequent etching process. 18. The method of claim 1 , comprising using the directly laser-engraved patterned element to print a pattern of a functional material onto a substrate or a layer on a substrate. 19. The method of claim 18 , wherein the pattern of a functional material is printed onto a primer layer, adhesive layer, charge injection layer, charge transporting layer, or semiconducting layer on a substrate.

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What does patent US9346239B2 cover?
A method is used to provide a pattern of a functional material for example on a receiving element. To provide this pattern, a laser-engraveable patternable element is imagewise exposed with laser-engraving radiation. This element has a laser-engraveable layer comprising a thermoplastic elastomeric interpolymer alloy. This interpolymer alloy comprises a non-crosslinked halogenated polymer, a par…
Who is the assignee on this patent?
Eastman Kodak Co
What technology area does this patent fall under?
Primary CPC classification B32B3/30. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 24 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).