Multi-zone EC windows

US9341912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9341912-B2
Application numberUS-201314137644-A
CountryUS
Kind codeB2
Filing dateDec 20, 2013
Priority dateMar 13, 2012
Publication dateMay 17, 2016
Grant dateMay 17, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Thin-film devices, for example, multi-zone electrochromic windows, and methods of manufacturing are described. In certain cases, a multi-zone electrochromic window comprises a monolithic EC device on a transparent substrate and two or more tinting zones, wherein the tinting zones are configured for independent operation.

First claim

Opening claim text (preview).

We claim: 1. An electrochromic window lite comprising: (i) a monolithic EC device on a transparent substrate, the monolithic EC device comprising first and second transparent conducting layers and an electrochromic stack between the first and second conducting layers; and (ii) a resistive zone between each of two or more tinting zones in the monolithic EC device, each of said two or more tinting zones configured for operation independent of the others; wherein the resistive zone has higher electrical resistivity than the remaining portions of the monolithic EC device and is configured to tint. 2. The electrochromic window lite of claim 1 , wherein each of the two or more tinting zones has an associated pair of bus bars located at opposing edges. 3. The electrochromic window lite of claim 1 , wherein the electrochromic window lite is incorporated into an insulated glass unit. 4. The electrochromic window lite of claim 3 , wherein the IGU has a mate lite that is not an electrochromic lite. 5. The electrochromic window lite of claim 3 , wherein the IGU has a mate lite that is a monolithic electrochromic lite with a single tinting zone. 6. The electrochromic window lite of claim 3 , wherein the IGU has a mate lite that is a monolithic electrochromic lite with two or more tinting zones. 7. The electrochromic window lite of claim 6 , wherein the tinting zones of the mate lite are aligned with those of the electrochromic window lite. 8. The electrochromic window lite of claim 3 , wherein the IGU has a mate lite that is an electrochromic lite with three or more tinting zones. 9. The electrochromic window lite of claim 1 , wherein at least one of the two or more tinting zones is configured to tint to <1% T. 10. The electrochromic window lite of claim 1 , wherein the resistive zone substantially spans across the length or width of the monolithic EC device. 11. The electrochromic window lite of claim 1 , wherein the resistive zone is between about 1 nm wide and about 10 nm wide. 12. The electrochromic window lite of claim 11 , wherein the resistive zone is formed by removing between about 10% and about 90% of the uppermost material in the second conducting layer along the resistive zone. 13. The electrochromic window lite of claim 12 , wherein the resistive zone is formed by laser irradiation of at least one of the conducting layers. 14. The electrochromic lite of claim 13 , wherein each of said two or more tinting zones associated bus bars are formed by laser irradiation during formation of the resistive zone by cutting through a single bus bar. 15. A method of forming a monolithic EC device comprising two tinting zones, the method comprising: a) forming the monolithic EC device comprising first and second transparent conductive oxide (TCO) layers and an electrochromic stack between the first and second TCO layers; b) applying a single bus bar to the second TCO of the monolithic EC device; c) cutting through the single bus bar along its width; and d) forming a resistive zone between the two tinting zones in the monolithic EC device, wherein the resistive zone formed has higher electrical resistivity than the remaining portions of the monolithic EC device and is configured to tint; wherein c) forms separate bus bars for each of the two tinting zones from the single bus bar. 16. The method of claim 15 , wherein forming the resistive zone between the two tinting zones in c) comprises cutting a portion of the depth of the second TCO layer and c) and d) are performed in a single cutting step. 17. The method of claim 15 , wherein the resistive zone substantially spans the width of the monolithic EC device. 18. The method of claim 15 , wherein the resistive zone is between about 1 nm wide and about 10 nm wide. 19. The method of claim 15 , wherein the resistive zone is formed by removing between about 10% and about 90% of the uppermost material in the second TCO layer along the resistive zone. 20. The method of claim 19 , wherein the resistive zone is formed by laser irradiation of the second TCO layer. 21. The electrochromic window lite of claim 1 , wherein the resistive zone is formed by modification of the electrochromic stack and/or one or both of the first and second transparent conducting layers. 22. The method of claim 15 , wherein the resistive zone is formed by modification of the electrochromic stack and/or one or both of the first and second transparent conducting layers. 23. The electrochromic window lite of claim 1 , wherein the resistive zone is between about 1 μm wide and about 1000 μm wide. 24. The electrochromic window lite of claim 1 , wherein the resistive zone is between about 1 mm wide and about 10 mm wide. 25. The electrochromic window lite of claim 21 , wherein the resistive zone is formed by a thermal/laser irradiation treatment after the electrochromic stack and first and second conducting layers are deposited on the transparent substrate.

Assignees

Inventors

Classifications

  • G02F1/153Primary

    Constructional details · CPC title

  • Electrical device making · CPC title

  • G09F19/227Primary

    on windows · CPC title

  • Screens or other constructions affording protection against light, especially against sunshine; Similar screens for privacy or appearance; {Slat blinds}(operating, guiding or securing devices or arrangements for roll-type closures E06B9/56; free-hanging flexible screens A47H23/00) · CPC title

  • with adjustable passage of light · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9341912B2 cover?
Thin-film devices, for example, multi-zone electrochromic windows, and methods of manufacturing are described. In certain cases, a multi-zone electrochromic window comprises a monolithic EC device on a transparent substrate and two or more tinting zones, wherein the tinting zones are configured for independent operation.
Who is the assignee on this patent?
View Inc
What technology area does this patent fall under?
Primary CPC classification G02F1/153. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 17 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).