Transparent glass substrate and process for manufacturing such a substrate

Patent metadata

Field	Value
Publication number	US-9340453-B2
Application number	US-201013145379-A
Country	US
Kind code	B2
Filing date	Jan 22, 2010
Priority date	Jan 23, 2009
Publication date	May 17, 2016
Grant date	May 17, 2016

Abstract

This transparent glass substrate has at least one face which is provided with a texturing formed by a plurality of geometric features in relief relative to a general plane of the face, this texturing being adapted in order to ensure a transmission of radiation through the substrate greater than the transmission of radiation through a substrate that is identical but lacks texturing. The face of the substrate is also provided with an antireflection layer having a refractive index between the refractive index of air and the refractive index of the glass. The antireflection layer is an etched out superficial portion of the glass substrate on the side of the face, which comprises a structure based on silica and voids having a characteristic dimension between 0.5 nanometers and 50 nanometers.

First claim

The invention claimed is:

1. A transparent glass substrate, comprising at least one face which comprises a texturing formed by a plurality of geometric features in relief relative to a general plane (π) of said face,
wherein the texturing is adapted in order to ensure a transmission of radiation through the substrate greater than the transmission of radiation through a substrate that is identical but lacks the texturing,
wherein the features in relief are pyramids or cones having non-zero apex half-angles,
wherein any apex half-angle of the features in relief is less than 70°,
wherein, for each feature in relief, a ratio of a thickness to a width of the feature is greater than or equal to 0.1,
wherein the face also comprises an antireflection layer having a refractive index between the refractive index of air and a refractive index of a glass of the substrate, and
wherein the antireflection layer is an etched out superficial portion of the glass substrate on a side of the face, which comprises a structure comprising silica and voids, created by a treatment of said face in an acid solution that is supersaturated with silica.

2. The substrate of claim 1 , wherein the refractive index of the antireflection layer at a wavelength of 600 nm is less than 1.3.

3. The substrate of claim 1 , wherein a thickness of each feature in relief is greater than 10 micrometers.

4. The substrate of claim 1 , wherein a thickness of the antireflection layer is between 30 nanometers and 1 micrometer.

5. The substrate of claim 1 , wherein the features in relief are contiguous.

6. The substrate of claim 1 , wherein a base of each feature in relief is inscribed within a circle having a diameter of less than or equal to 5 millimeters.

7. A module, comprising the substrate of claim 1 as the front substrate of the module,
wherein the face of the substrate, which is provided with features in relief and the antireflection layer, is the front face of the module,
wherein the module is suitable for collecting energy originating from radiation incident on the module.

8. The substrate of claim 1 , wherein the refractive index of the antireflection layer at a wavelength of 600 nm is 1.22 to 1.23.

9. The substrate of claim 1 , wherein a thickness of each feature in relief is greater than 100 micrometers.

10. The substrate of claim 1 , wherein a thickness of the antireflection layer is between 80 nanometers and 200 nanometers.

11. The substrate of claim 1 , wherein any apex half-angle of the features in relief is between 25° and 70°.

12. The substrate of claim 1 , wherein any apex half-angle of the features in relief is between 25° and 50°.

13. The substrate of claim 1 , wherein, for each feature in relief, a ratio of a thickness to a width of the feature is greater than or equal to 0.25.

14. A process for manufacturing a transparent glass substrate, comprising:
forming, on at least one face of a transparent glass plate, a texturing comprising a plurality of geometric features in relief relative to a general plane (π) of the face,
wherein the features in relief are pyramids or cones having non-zero apex half-angles,
wherein any apex half-angle of the features in relief is less than 70°,
wherein, for each feature in relief, a ratio of a thickness to a width of the feature is greater than or equal to 0.1, and
wherein the texturing is adapted in order to ensure a transmission of radiation through the plate that is greater than the transmission of radiation through a plate that is identical but that lacks texturing; and
immersing the glass plate, at least on the side of the face comprising the features in relief, in an acid solution that is supersaturated with silica, so as to create an antireflection layer which is an etched out superficial portion of the glass substrate on the side of the face, which comprises a structure comprising silica and voids and which has a refractive index between the refractive index of air and the refractive index of a glass of the substrate.

15. The process of claim 14 , wherein the features in relief on the face are formed by rolling of the glass plate.

16. The process of claim 14 , wherein the solution in which the glass plate is immersed is a fluosilicic acid solution which is supersaturated with silica in a proportion between around 0 and 3 millimoles per liter above the silica saturation point.

Assignees

• Schiavoni Michele
• Neander Marcus
• Roemgens Pascal
• Saint Gobain

Inventors

• Schiavoni Michele
• Neander Marcus
• Roemgens Pascal

Classifications

• H10F77/1694

  the films including Group I-III-VI materials, e.g. CIS or CIGS · CPC title

• H10F77/707

  of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate · CPC title

• H10F77/169

  Thin semiconductor films on metallic or insulating substrates · CPC title

• H10F77/70

  Surface textures, e.g. pyramid structures · CPC title

• C03C2204/08

  Glass having a rough surface · CPC title